Abstract:
PROBLEM TO BE SOLVED: To provide a method for introducing a reaction substance into a vacuum chamber while the simultaneous introduction of contaminating materials or substances is suppressed to the minimum or eliminated. SOLUTION: Consequently, contaminating materials or substances which may be generated and interfere with the measurement or other processes can be suppressed to the minimum or eliminated. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
The present invention provides a system for supplying a high-pressure medium gas suitable for processing a semiconductor to be processed by heating under isostatic pressure in a short cycle. The system includes a gas holder containing a high-pressure medium gas, a compressor for pressurizing the high-pressure medium gas supplied from the gas holder, a high-pressure vessel having a heater, an accumulator for storing the high-pressure medium gas pressurized by the compressor, a first evacuation unit for evacuating the inside of a pipeline for the high-pressure medium gas, a vacuum casing for holding the opening of the high-pressure vessel in a vacuum, a second evacuation unit for evacuating the inside of the vacuum casing, and a valve unit for connecting the high-pressure vessel and the accumulator so that series connection and parallel connection can be switched on the outlet side of the compressor.
Abstract:
PURPOSE:To reduce the size over the entire part of a vacuum device by project ing at least two pieces a pair of revolving shafts to the inside and outside of the device body, turning the revolving shafts to move a substrate holder in the device body and positioning the same by means of a sensor. CONSTITUTION:A pair of the revolving shafts 26, 27 are rotated via a chain 35 by driving a motor 32 in the case of moving horizontally the substrate holder from a vacuum chamber 22 of the device body 21 to a preliminary chamber 23. A conveying base 40 carrying the substrate holder is guided by guide roller trains 42, 43 and is moved by the meshing of a pinion 39 and a rack 41 from the chamber 22 side to the chamber 23 side according to the above-mentioned revolution. The rack 41 meshed with the pinion 38 moves further and is detected by a monitor 51 consisting of a light emitting element 51a and a photodetector 51b which feeds a stop signal to a control part to stop the motor 32 and to stop the substrate holder at the set position in the chamber 23. The motor 32 is driven in reverse direction in the case of moving horizontally the substrate holder from the chamber 23 to the chamber 22.
Abstract:
PURPOSE:To supply powder in a satisfactory state under high pressure by providing a piston which forces upward the powder supplied into an inclined tank and a vane for discharging said powder so that the sticking of the powder on the wall surface and the bridging thereof can be prevented. CONSTITUTION:A device is constituted of a tank 5 whch is provided inclinedly, a piston 17 which is provided freely slidably along the axial center direction of the tank and forces upward powder 9, a powder discharging vane 20 which discharges the powder 9, a powder supplying valve 10, a powder discharging valve 14, an steam lines 23, 24 for pressure equalization. A powder supplying pipe 6 and a powder discharging pipe 7 are connected to said tank 5. The lines 23, 24 are connected to the top and bottom ends of the tank 5 and steam for pressure equalization is introduced behind the vane 20 and the piston 17.