公开(公告)号：US20240254651A1

公开(公告)日：2024-08-01

申请号：US18290514

申请日：2022-02-09

Applicant: SUMCO Corporation

Inventor： Masami OHARA ,  Hiroshi KISHI ,  Eriko KITAHARA ,  Hideki FUJIWARA

IPC: C30B15/10 ,  C03C17/00 ,  C30B29/06

CPC classification number: C30B15/10 ,  C03C17/004 ,  C30B29/06 ,  C03C2201/02

Abstract: A quartz glass crucible includes a crucible base body including silica glass and a coating film containing a crystallization accelerator and formed on the inner surface of the crucible base body. The average carbon concentration in the coating film, and the crucible base body within a range of 0 μm or more and 300 μm or less in depth from the inner surface of the crucible base body is 1.0×1012 atoms/cc or more and 3.0×1019 atoms/cc or less.

公开(公告)号：US20240217864A1

公开(公告)日：2024-07-04

申请号：US18600865

申请日：2024-03-11

Applicant: AGC Inc.

Inventor： Kazuki KANEHARA ,  Seiji INABA ,  Shuhei OGAWA

IPC: C03C3/097 ,  C03B5/235 ,  C03B19/02 ,  C03B25/02 ,  C03C3/06 ,  C03C3/078 ,  C03C3/087 ,  C03C3/089 ,  C03C3/091 ,  C03C3/095 ,  C03C3/11 ,  C03C3/12 ,  H01L21/683 ,  H01L21/687

CPC classification number: C03C3/097 ,  C03B5/235 ,  C03B19/02 ,  C03B25/02 ,  C03C3/06 ,  C03C3/078 ,  C03C3/087 ,  C03C3/089 ,  C03C3/091 ,  C03C3/095 ,  C03C3/111 ,  C03C3/125 ,  C03C2201/02 ,  H01L21/6833 ,  H01L21/68757

Abstract: The present invention relates to a glass block including: Si; and at least one of Mg and Ca, and satisfying, in terms of mol %, 49.0% or less of B2O3, 11.5% or less of P2O5, 10.0 to 59.5% of a (=SiO2+B2O3+P2O5+GeO2), 66.5% or less of (a+Al2O3), 7.0% or less of Ga2O3, 0.44 or less of b (=Al2O3+Ga2O3+In2O3)/a, 20.0% or more of R2O (R2: alkaline earth metal), 50.0% or less of MgO, MgO≥BaO, CaO≥BaO, SrO≥BaO, MgO≥SrO, CaO≥SrO, 1.2% or less of R12O (R1: alkali metal), 4.8% or less of TiO2 or ZrO2, 9.5% or less of MnO2, 11.8% or less of ZnO, 0.067 or less of Ta2O5/SiO2, 15.0% or less of an impurity element, and 0.20 or less of F/O.

公开(公告)号：US11975996B2

公开(公告)日：2024-05-07

申请号：US16722242

申请日：2019-12-20

Applicant: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION

Inventor： Shigeru Fujino

IPC: C03B19/01 ,  B22F1/10 ,  B33Y10/00 ,  B33Y70/10 ,  C03B19/06 ,  C03C1/02 ,  C03C3/06 ,  C08K3/36

CPC classification number: C03B19/01 ,  B33Y10/00 ,  B33Y70/10 ,  C03B19/06 ,  C03C1/026 ,  C03C3/06 ,  C08K3/36 ,  B22F1/10 ,  C03C2201/02 ,  C03C2203/34 ,  C03C2204/00 ,  B22F2998/10 ,  B22F1/10 ,  B22F10/12 ,  B22F3/1021

Abstract: A resin composition for inorganic molded article production use, which is provided with inorganic particles each containing amorphous SiO2 and a photocurable resin composition, in which the photocurable resin composition contains a photocurable resin precursor and a photopolymerization initiator, the content of the inorganic particles is 60% by mass or more with respect to the total amount of the photocurable resin composition and the inorganic particles and is 60% by mass or more with respect to the entire amount of the resin composition for inorganic molded article production use, and the viscosity of the composition for inorganic molded article production use is 10000 mPa·s or less.

公开(公告)号：US20240132684A1

公开(公告)日：2024-04-25

申请号：US18277696

申请日：2021-10-10

Applicant: ASAHI KASEI KABUSHIKI KAISHA

Inventor： Amane HIROSE ,  Hiroyuki HONMA

IPC: C08J5/24 ,  C03C3/06 ,  C03C13/00 ,  D03D1/00 ,  D03D15/267 ,  D03D15/50 ,  D06M13/513 ,  H05K1/03

CPC classification number: C08J5/248 ,  C03C3/06 ,  C03C13/00 ,  D03D1/0082 ,  D03D15/267 ,  D03D15/50 ,  D06M13/5135 ,  H05K1/0306 ,  H05K1/038 ,  C03C2201/02 ,  C03C2213/00 ,  D06M2101/00

Abstract: Provided is a glass fabric formed by weaving warp and weft glass yarns comprising a plurality of glass filaments, wherein the surface of the glass fabric is subjected to surface treatment with a surface treatment agent, and the total carbon extraction amount when the glass fabric is subjected to extraction with methanol is greater than 0 and not more than 0.25%.

公开(公告)号：US20240121894A1

公开(公告)日：2024-04-11

申请号：US18278292

申请日：2021-10-11

Applicant: ASAHI KASEI KABUSHIKI KAISHA

Inventor： Amane HIROSE ,  Hiroyuki HONMA

IPC: H05K1/03 ,  C03C3/06 ,  C03C13/00 ,  C08J5/24 ,  D03D1/00 ,  D03D15/267 ,  D06M13/513

CPC classification number: H05K1/0366 ,  C03C3/06 ,  C03C13/00 ,  C08J5/244 ,  D03D1/0082 ,  D03D15/267 ,  D06M13/513 ,  C03C2201/02 ,  C03C2213/00 ,  D06M2101/00 ,  D10B2505/02

Abstract: Provided is a glass fabric formed by weaving warp and weft glass yarns comprising a plurality of glass filaments, wherein the surface of the glass fabric is subjected to surface treatment with a surface treatment agent, and the difference between the dielectric loss tangent and the bulk dielectric loss tangent of the glass fabric as measured by using a split cylinder resonator is greater than 0 and not more than 1.0×10−3 at 10 GHz.

公开(公告)号：US11878937B2

公开(公告)日：2024-01-23

申请号：US16925944

申请日：2020-07-10

Applicant: Heraeus Quarzglas GmbH & Co. KG ,  Heraeus Conamic UK Limited

Inventor： Ian George Sayce ,  Michael Schindler ,  Fabian Schildt ,  Eduard Visnow

IPC: C03C3/06 ,  C22B59/00 ,  C22B60/02 ,  C22B3/22 ,  B03B5/62 ,  C01B33/12 ,  C03C1/02

CPC classification number: C03C3/06 ,  B03B5/623 ,  C01B33/12 ,  C03C1/022 ,  C22B3/22 ,  C22B59/00 ,  C22B60/0252 ,  C22B60/0291 ,  C01P2004/03 ,  C01P2004/61 ,  C01P2006/80 ,  C03C2201/02

Abstract: Described is a process for the refinement of a quartz powder, comprising the step of separating microparticles of refractory minerals, in particular minerals containing rare earth metal compounds, from the quartz powder by an elutriation step.

公开(公告)号：US20230174423A1

公开(公告)日：2023-06-08

申请号：US18076849

申请日：2022-12-07

Applicant: CORNING INCORPORATED

Inventor： Dorothy Roberta Behan ,  Donald Seton Farquhar ,  Uta-Barbara Goers ,  Tammy Lynn Petriwsky

IPC: C03C23/00 ,  C03C3/06 ,  C03C17/06 ,  C03C17/00

CPC classification number: C03C23/007 ,  C03C3/06 ,  C03C17/06 ,  C03C17/004 ,  C03C2201/02 ,  C03C2203/52 ,  C03C2217/25 ,  C03C2218/32

Abstract: A wafer including a glass substrate is provided. The glass substrate includes a first surface defining a plane and including a surface roughness Ra of approximately 0.3 nm in an outer via region and a second surface. The glass substrate defines a plurality of vias extending from the first surface. The plurality of vias each include an entrance defined by the first surface.

公开(公告)号：US20190062193A1

公开(公告)日：2019-02-28

申请号：US16061929

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Matthias OTTER ,  Walter LEHMANN ,  Michael HÜNERMANN ,  Nils Christian NIELSEN ,  Nigel Robert WHIPPEY ,  Boris GROMANN ,  Abdoul-Gafar KPEBANE ,  Matthias SÖHN

IPC: C03B20/00 ,  C03B17/04 ,  C03B37/012 ,  C03B37/027 ,  C03C3/06 ,  C03C1/02

CPC classification number: C03B20/00 ,  C03B17/04 ,  C03B19/106 ,  C03B19/1095 ,  C03B37/01211 ,  C03B37/027 ,  C03B2201/04 ,  C03C1/022 ,  C03C1/026 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/54 ,  C03C2203/10 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/50

Abstract: The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m2/g, ii.) Making a glass melt out of silicon dioxide granulate in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has at least a first and a further chamber connected to one another via a passage, wherein the temperature in the first chamber is lower than the temperature in the further chambers. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

公开(公告)号：US20180305236A1

公开(公告)日：2018-10-25

申请号：US15959796

申请日：2018-04-23

Applicant: Shin-Etsu Quartz Products Co., Ltd. ,  Heraeus Quarzglas GmbH & Co. KG

Inventor： Manabu UTSUMI

IPC: C03B25/02

CPC classification number: C03B25/02 ,  C03C3/06 ,  C03C23/007 ,  C03C2201/02 ,  C03C2203/52

Abstract: One aspect is a process to producing a synthetic quartz glass, including an annealing treatment that includes: putting a synthetic quartz glass as a parent material into a heat treatment furnace; elevating a temperature in the heat treatment furnace to a prescribed keeping temperature that is equal to or higher than the annealing point; keeping the keeping temperature; annealing the synthetic quartz glass; and taking the synthetic quartz glass out of the heat treatment furnace. The process includes determining an annealing rate v [° C./h] of the annealing step based on a value of S/V [mm2/mm3], wherein S [mm2] is the surface area of the synthetic quartz glass as a parent material and V [mm3] is the volume thereof and a target birefringence Re [nm/cm] for the synthetic quartz glass after the annealing, and the annealing step is performed at the determined annealing rate v.

公开(公告)号：US10005693B2

公开(公告)日：2018-06-26

申请号：US15118368

申请日：2015-02-16

Applicant: TOSOH CORPORATION

Inventor： Satori Hirai ,  Nobusuke Yamada ,  Kazuyoshi Arai

IPC: C03C11/00 ,  C03B19/06 ,  C03B19/08

CPC classification number: C03C11/00 ,  C03B19/066 ,  C03B19/08 ,  C03B2201/03 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2204/06

Abstract: To provide opaque quartz glass having no water absorbing properties and being excellent in infrared light shielding properties, and a method for its production. In the production of opaque quartz glass of the present invention, a fine amorphous silica powder and a pore forming agent are mixed, then molded and heated at a predetermined temperature, to obtain opaque quartz glass wherein contained pores are closed pores, the average pore size of pores is from 5 to 20 μm, and the content density of pores is high, whereby the heat shielding properties are high.