中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

234 records (took 0.038 seconds)

    Flow Apparatus For A Spectrometer System And Method For Operating Same
    161.
    发明申请
    Flow Apparatus For A Spectrometer System And Method For Operating Same 审中-公开
    用于光谱仪系统的流量装置及其操作方法相同

    公开(公告)号：US20160209321A1

    公开(公告)日：2016-07-21

    申请号：US15025483

    申请日：2014-09-24

    Applicant: SIEMENS AKTIENGESELLSCHAFT

    Inventor： Gerit Ebelsberger ,  Artur Jan Pastusiak ,  Remigiusz Pastisiak ,  Kerstin Wiesner

    IPC: G01N21/05 ,  G01N21/25 ,  G01N21/11

    CPC classification number: G01N21/05 ,  G01N21/11 ,  G01N21/255 ,  G01N21/31 ,  G01N2021/115 ,  G01N2201/025 ,  G01N2201/068

    Abstract: A flow apparatus for a spectrometer system includes a first optics element that is optically coupleable to a spectrometer and a second optics element that is optically coupleable to a light source. The first and second optics element may be arranged at a distance from one another in the region of a measurement gap through which a liquid can flow, in the region of which a light beam emerging from the second optics element and propagating into the first optics element is at least partly absorbable. A through-flow amount of the liquid through the measurement gap is controllable by changing the distance between the two optics elements, such that the spectrometer system can be used with various different samples.

    Abstract translation: 用于光谱仪系统的流动装置包括光学耦合到光谱仪的第一光学元件和光学地可耦合到光源的第二光学元件。 第一和第二光学元件可以在液体可以流过的测量间隙的区域中彼此间隔一定距离，在该区域中，从第二光学元件出射并传播到第一光学元件的光束 至少部分可吸收。 通过测量间隙的液体的通过流量可以通过改变两个光学元件之间的距离来控制，使得光谱仪系统可以与各种不同的样品一起使用。

    METROLOGY TARGET INDENTIFICATION, DESIGN AND VERIFICATION
    162.
    发明申请
    METROLOGY TARGET INDENTIFICATION, DESIGN AND VERIFICATION 有权
    计量目标识别，设计和验证

    公开(公告)号：US20150233814A1

    公开(公告)日：2015-08-20

    申请号：US14361610

    申请日：2014-03-28

    Applicant: KLA-Tencor Corporation

    Inventor： Boris Golovanevsky ,  Noam Sapiens

    IPC: G01N21/01 ,  G01N21/95

    CPC classification number: G01N21/01 ,  F16F7/01 ,  F16F9/306 ,  F16F15/02 ,  F16F15/023 ,  F16F15/04 ,  G01N21/9501 ,  G01N2201/025 ,  G10K11/1785 ,  G10K11/17873 ,  G10K2210/10 ,  G10K2210/129

    Abstract: Metrology tools are provided, which comprise both active and passive vibration isolation devices, passive or active isolation systems such as constrained layer dampers, particle impact dampers or liquid impact dampers, and/or noise cancellation transducers, combined in different supporting structures of the metrology tool to dampen and reduce vibrations at a wide range of frequencies and intensities, and to which frequency range spectral analysis and optimization may be applied to determine specific tool configurations according to the provided principles.

    Abstract translation: 提供了计量工具，其包括主动和被动隔振装置，被动或主动隔离系统，例如约束层阻尼器，颗粒撞击阻尼器或液体冲击阻尼器，和/或噪声消除换能器，组合在计量工具的不同支撑结构中 以便在宽范围的频率和强度下抑制和减少振动，并且根据所提供的原理，可以应用哪个频率范围的频谱分析和优化来确定具体的工具配置。

    SYSTEM AND METHOD FOR AUTOMATICALLY CORRECTING FOR ROTATIONAL MISALIGNMENT OF WAFERS ON FILM FRAMES
    163.
    发明申请
    SYSTEM AND METHOD FOR AUTOMATICALLY CORRECTING FOR ROTATIONAL MISALIGNMENT OF WAFERS ON FILM FRAMES 审中-公开
    用于自动校正电影框架上波形旋转偏差的系统和方法

    公开(公告)号：US20150228522A1

    公开(公告)日：2015-08-13

    申请号：US14424427

    申请日：2013-09-02

    Applicant: SEMICONDUCTOR TECHNOLOGIES & INSTRUMENTS PTE LTD

    Inventor： Jing Lin

    IPC: H01L21/68 ,  G01N21/95 ,  G01B11/27

    CPC classification number: H01L21/681 ,  B25J11/0095 ,  B25J15/0616 ,  B25J15/0658 ,  B25J15/0666 ,  G01B11/27 ,  G01N21/9501 ,  G01N2201/025 ,  H01L21/67144 ,  H01L21/67706 ,  H01L21/6838 ,  H01L21/68757 ,  Y10T29/49826

    Abstract: Automatically correcting for rotational misalignment of a wafer improperly mounted on a film frame includes capturing an image of portions of the wafer using an image capture device, prior to initiation of a wafer inspection procedure by an inspection system; digitally determining a rotational misalignment angle and a rotational misalignment direction of the wafer relative to the film frame and/or a set of reference axes of a field of view of the image capture device; and correcting for the rotational misalignment of the wafer by way of a film frame handling apparatus separate from the inspection system, which is configured for rotating the film frame across the rotational misalignment angle in a direction opposite to the rotational misalignment direction. Such film frame rotation can occur prior to placement of the film frame on the wafer table, without decreasing film frame handling throughput or inspection process throughput.

    Abstract translation: 自动校正不正确地安装在胶片框架上的晶片的旋转未对准包括在通过检查系统启动晶片检查过程之前使用图像捕获装置捕获晶片的部分图像; 数字地确定晶片相对于胶片框架的旋转未对准角度和旋转未对准方向和/或图像捕获装置的视场的一组参考轴; 以及通过与检查系统分离的胶片框架处理装置校正晶片的旋转未对准，所述检查系统被配置为沿与旋转未对准方向相反的方向旋转胶片框架跨过旋转未对准角度。 在胶片框架放置在晶片台上之前，胶片框架旋转可能发生，而不会降低胶片框架处理量或检查处理量。

    MULTIFUNCTION WAFER AND FILM FRAME HANDLING SYSTEM
    164.
    发明申请
    MULTIFUNCTION WAFER AND FILM FRAME HANDLING SYSTEM 审中-公开
    多功能波形和薄膜框架处理系统

    公开(公告)号：US20150214085A1

    公开(公告)日：2015-07-30

    申请号：US14424415

    申请日：2013-09-02

    Applicant: SEMICONDUCTOR TECHNOLOGIES & INSTRUMENTS PTE LTD

    Inventor： Jian Ping Jin ,  Leng Kheam Lee

    IPC: H01L21/677 ,  B25J11/00 ,  B25J15/06

    CPC classification number: H01L21/681 ,  B25J11/0095 ,  B25J15/0616 ,  B25J15/0658 ,  B25J15/0666 ,  G01B11/27 ,  G01N21/9501 ,  G01N2201/025 ,  H01L21/67144 ,  H01L21/67706 ,  H01L21/6838 ,  H01L21/68757 ,  Y10T29/49826

    Abstract: A multifunction wafer and film frame handling system includes a wafer table assembly having a wafer table providing an ultra-planar wafer table surface configured for carrying a wafer or a film frame, and at least one of: a flattening apparatus configured for automatically applying a downward force to portions of a warped or non-planar wafer in a direction normal to the wafer table surface; a displacement limitation apparatus configured for automatically constraining or preventing uncontrolled lateral motion of a wafer relative to the wafer table surface after cessation of an applied negative pressure and application of a positive pressure to the underside of the wafer via the wafer table; and a rotational misalignment compensation apparatus configured for automatically compensating for a rotational misalignment of a wafer mounted on a film frame.

    Abstract translation: 一种多功能晶片和薄膜框架处理系统，包括晶片台组件，该晶片台组件具有提供用于承载晶片或薄膜框架的超平面晶片台表面的晶片台，以及至少一个：平坦化装置，其被配置为自动施加向下 在垂直于晶片台表面的方向上对翘曲或非平面晶片的部分施力; 位移限制装置，被配置为在停止施加的负压之后自动约束或防止晶片相对于晶片台表面的不受控横向运动，并且通过晶片台向晶片的下侧施加正压力; 以及旋转对准补偿装置，被配置为自动补偿安装在胶片框架上的晶片的旋转未对准。

    REAGENT CARD ALIGNMENT SYSTEM AND METHOD
    166.
    发明申请
    REAGENT CARD ALIGNMENT SYSTEM AND METHOD 审中-公开
    试剂卡对齐系统及方法

    公开(公告)号：US20140349409A1

    公开(公告)日：2014-11-27

    申请号：US14364778

    申请日：2012-12-14

    Applicant: Siemens Healthcare Diagnostics Inc.

    Inventor： Lawrence Milesky ,  George N. Zantos

    IPC: G01N21/84 ,  G01B11/14

    CPC classification number: G01N21/8483 ,  G01B11/14 ,  G01N21/253 ,  G01N21/27 ,  G01N35/00069 ,  G01N35/04 ,  G01N2035/00148 ,  G01N2035/0491 ,  G01N2201/025 ,  G01N2201/0438 ,  G01N2201/06113

    Abstract: A reagent card analyzer comprises an optical signal source configured to transmit an optical signal and an optical signal detector spaced a distance from the optical signal source to define an optical signal path into which the optical signal is transmitted, the optical signal detector configured to detect the optical signal and to output an electrical signal indicative of the optical signal. A reader is configured to read a reagent pad of a reagent card. A reagent card moving mechanism is configured to move the reagent card having the reagent pad including a leading and trailing end through the optical signal path. An optical detector interface is electrically coupled with the optical signal detector and configured to receive electrical signals and to output a pad detect signal indicative of at least one of the leading and the trailing end as the reagent card is moved through the optical signal path.

    Abstract translation: 一种试剂卡分析仪，包括被配置为发送光信号的光信号源和与光信号源间隔一定距离的光信号检测器，以限定光信号传输光信号路径，该光信号检测器被配置为检测 并且输出指示光信号的电信号。 读取器被配置为读取试剂卡的试剂垫。 试剂卡移动机构被配置为使具有包括前端和后端的试剂垫的试剂卡移动通过光信号路径。 光学检测器接口与光学信号检测器电耦合，并被配置为接收电信号，并且当试剂卡移动通过光信号路径时，输出指示前端和后端中的至少一个的焊盘检测信号。

    Methods for gas leak detection and localization in populated areas using multi-point analysis
    168.
    发明申请
    Methods for gas leak detection and localization in populated areas using multi-point analysis 有权
    使用多点分析在人口稠密地区进行气体泄漏检测和定位的方法

    公开(公告)号：US20140032129A1

    公开(公告)日：2014-01-30

    申请号：US13656123

    申请日：2012-10-19

    Applicant: Picarro, Inc.

    Inventor： Chris W. Rella ,  Eric R. Crosson ,  Sze Meng Tan

    IPC: G06F15/00 ,  G06F19/00

    CPC classification number: G01M3/20 ,  G01M3/38 ,  G01N21/3504 ,  G01N21/39 ,  G01N2021/0314 ,  G01N2201/025

    Abstract: Improved gas leak detection from moving platforms is provided. Automatic horizontal spatial scale analysis can be performed in order to distinguish a leak from background levels of the measured gas. Source identification can be provided by using isotopic ratios and/or chemical tracers to distinguish gas leaks from other sources of the measured gas. Multi-point measurements combined with spatial analysis of the multi-point measurement results can provide leak source distance estimates. These methods can be practiced individually or in any combination.

    Abstract translation: 提供了从移动平台改进的气体泄漏检测。 可以进行自动水平空间尺度分析，以区分泄漏与被测气体的背景水平。 可以通过使用同位素比率和/或化学示踪剂来提供源识别，以区分气体泄漏与测量气体的其他来源。 多点测量结合多点测量结果的空间分析可以提供泄漏源距离估计。 这些方法可以单独或以任何组合实施。

    Methods for gas leak detection and localization in populated areas using isotope ratio measurements
    169.
    发明申请
    Methods for gas leak detection and localization in populated areas using isotope ratio measurements 有权
    使用同位素比率测量在人口稠密地区进行气体泄漏检测和定位的方法

    公开(公告)号：US20140026641A1

    公开(公告)日：2014-01-30

    申请号：US13656096

    申请日：2012-10-19

    Applicant: Picarro, Inc.

    Inventor： Chris W. Rella ,  Eric R. Crosson ,  Michael Woelk ,  Sze Meng Tan

    IPC: G01N9/36

    CPC classification number: G01M3/20 ,  G01M3/38 ,  G01N21/01 ,  G01N21/31 ,  G01N21/3504 ,  G01N21/39 ,  G01N2021/0314 ,  G01N2201/025

    Abstract: Improved gas leak detection from moving platforms is provided. Automatic horizontal spatial scale analysis can be performed in order to distinguish a leak from background levels of the measured gas. Source identification can be provided by using isotopic ratios and/or chemical tracers to distinguish gas leaks from other sources of the measured gas. Multi-point measurements combined with spatial analysis of the multi-point measurement results can provide leak source distance estimates. These methods can be practiced individually or in any combination.

    Abstract translation: 提供了从移动平台改进的气体泄漏检测。 可以进行自动水平空间尺度分析，以区分泄漏与被测气体的背景水平。 可以通过使用同位素比率和/或化学示踪剂来提供源识别，以区分气体泄漏与测量气体的其他来源。 多点测量结合多点测量结果的空间分析可以提供泄漏源距离估计。 这些方法可以单独或以任何组合实施。

Patent Agency Ranking