Apparatus and Method for Regulating the Output of a Plasma Electron Beam Source
    178.
    发明申请
    Apparatus and Method for Regulating the Output of a Plasma Electron Beam Source 有权
    用于调节等离子体电子束源的输出的装置和方法

    公开(公告)号:US20110080093A1

    公开(公告)日:2011-04-07

    申请号:US12899012

    申请日:2010-10-06

    CPC classification number: H01J3/025 H01J15/02

    Abstract: An apparatus and method for controlling electron flow within a plasma to produce a controlled electron beam is provided. A plasma is formed between a cathode and an acceleration anode. A control anode is connected to the plasma and to the acceleration anode via a switch. If the switch is open, the ions from the plasma flow to the cathode and plasma electrons flow to the acceleration anode. With the acceleration anode suitably transparent and negatively biased with a DC high voltage source, the electrons flowing from the plasma are accelerated to form an electron beam. If the switch is closed, the ions still flow to the cathode but the electrons flow to the control anode rather than the acceleration anode. Consequently, the electron beam is turned off, but the plasma is unaffected. By controlling the opening and closing of the switch, a controlled pulsed electron beam can be generated.

    Abstract translation: 提供了一种用于控制等离子体内的电子流以产生受控电子束的装置和方法。 在阴极和加速度阳极之间形成等离子体。 控制阳极通过开关连接到等离子体和加速器阳极。 如果开关断开,来自等离子体的离子流向阴极,等离子体电子流向加速度阳极。 由于采用直流高电压源加速阳极适当地透明和负偏压,所以从等离子体流出的电子被加速以形成电子束。 如果开关闭合,离子仍然流到阴极,但电子流向控制阳极,而不是加速阳极。 因此,电子束被关闭,但是等离子体不受影响。 通过控制开关的打开和关闭,可以产生受控的脉冲电子束。

    Source for providing an electron beam of settable power
    179.
    发明授权
    Source for providing an electron beam of settable power 失效
    用于提供可设置电源的电子束的源

    公开(公告)号:US07911120B2

    公开(公告)日:2011-03-22

    申请号:US10497894

    申请日:2002-12-06

    CPC classification number: H01J37/077 H01J3/025 H01J2237/0041

    Abstract: The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/β √2πme/mi exp (−½), wherein: β is the proportion of electrons of the plasma P, me the electron mass, and mi is the mass of positively charged ions.

    Abstract translation: 本发明涉及提供可调节能量电子束的源,包括由具有第一值(S1)的内表面的外壳(1)和具有第二值的表面的抽出栅极(2)组成的等离子体室(P) 值(S2),门电位与外壳不同,可调。 本发明的特征在于等离子体被激发并限制在多极或多极磁结构中,第二值(S2)超过第一值(S1)的比接近于:D = 1 /&bgr; √2&pgr; me / mi exp(-½),其中:&bgr; 是等离子体P的电子的比例,me是电子质量,mi是带正电荷的离子的质量。

    Non-ambipolar radio-frequency plasma electron source and systems and methods for generating electron beams
    180.
    发明授权
    Non-ambipolar radio-frequency plasma electron source and systems and methods for generating electron beams 有权
    非双极射频等离子体电子源以及用于产生电子束的系统和方法

    公开(公告)号:US07875867B2

    公开(公告)日:2011-01-25

    申请号:US12327639

    申请日:2008-12-03

    CPC classification number: H01J37/077 F03H1/0025 H01J3/025 H01J2237/31

    Abstract: An electron generating device extracts electrons, through an electron sheath, from plasma produced using RF fields. The electron sheath is located near a grounded ring at one end of a negatively biased conducting surface, which is normally a cylinder. Extracted electrons pass through the grounded ring in the presence of a steady state axial magnetic field. Sufficiently large magnetic fields and/or RF power into the plasma allow for helicon plasma generation. The ion loss area is sufficiently large compared to the electron loss area to allow for total non-ambipolar extraction of all electrons leaving the plasma. Voids in the negatively-biased conducting surface allow the time-varying magnetic fields provided by the antenna to inductively couple to the plasma within the conducting surface. The conducting surface acts as a Faraday shield, which reduces any time-varying electric fields from entering the conductive surface, i.e. blocks capacitive coupling between the antenna and the plasma.

    Abstract translation: 电子产生装置通过电子鞘提取从RF场产生的等离子体中的电子。 电子鞘位于负偏压导电表面一端的接地环附近,通常为圆柱体。 在稳态轴向磁场的存在下,提取的电子通过接地环。 等离子体中足够大的磁场和/或RF功率允许螺旋形血浆产生。 与电子损失面积相比,离子损失面积足够大,以允许离开等离子体的所有电子的全非双极萃取。 负偏置导电表面中的空隙允许由天线提供的时变磁场感应地耦合到导电表面内的等离子体。 导电表面用作法拉第屏蔽,其减少任何随时间变化的电场进入导电表面,即阻止天线和等离子体之间的电容耦合。

Patent Agency Ranking