公开(公告)号：US20050274692A1

公开(公告)日：2005-12-15

申请号：US11148380

申请日：2005-06-09

Applicant: Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda ,  Pfeiffer Dirk

Inventor： Yoshitaka Hamada ,  Tsutomu Ogihara ,  Motoaki Iwabuchi ,  Takeshi Asano ,  Takafumi Ueda ,  Pfeiffer Dirk

IPC: G03F7/11 ,  B44C1/22 ,  G03F1/00 ,  G03F7/075 ,  G03F7/09 ,  H01L21/027

CPC classification number: G03F7/094 ,  G03F7/0752 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/76808

Abstract: A sacrificial film-forming composition is provided comprising (A) a silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formulae (1) and (2): X—Y—SiZ3   (1) RnSiZ4-n   (2) wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group such as an unsubstituted hydroxyl group or a substituted or unsubstituted epoxy, acyloxy or acryloxy group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, and n is an integer of 0 to 3, the silicone resin being capable of crosslinking reaction by the crosslinkable organofunctional group in formula (1), (B) a crosslinking agent, (C) an acid generator, and (D) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.

Abstract translation: 提供牺牲性成膜组合物，其包含（A）作为具有式（1）和（2）的可水解硅烷的共水解缩合物的硅氧烷树脂：<？在线配方说明=“在线配方” end =“lead”？> XY-SiZ 3（1）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula 描述=“在线公式”end =“lead”？> R SiZ 4-n（2）<？in-line-formula description =“In- 其中Z是可水解基团，X是可交联的有机官能团如未取代的羟基或取代或未取代的环氧基，酰氧基或丙烯酰氧基，Y是单键或二价烃 基团，R为氢或一价烃基，n为0〜3的整数，有机硅树脂能够通过式（1）中的交联性有机官能团交联反应，（B）交联剂，（C） 酸产生剂，和（D）有机溶剂。 该组合物具有提高的储存稳定性，填充性能，粘附性和涂层均匀性，足以形成有效地溶解在剥离溶液中的牺牲膜。