Abstract:
본 발명은 담장형 반도체를 2개의 쌍둥이 핀으로 분리시키고, 각 핀에 게이트 다이오드 구조를 갖는 메모리 셀로 메모리 셀 스트링을 형성함으로써, 집적도를 높일 수 있음은 물론, 이웃 셀간의 간섭을 근본적으로 막을 수 있고, 게이트 전극이 감싸는 제 1 반도체층 및 PN 접합에 공핍 영역 상에 형성함으로써, GIDL에 의한 메모리 동작으로 종래 낸드 플래시 메모리 어레이에서 필수적으로 요구되었던 GSL 및 CSL을 제거하여, 집적도를 획기적으로 높일 수 있어, 신경모방 기술에도 적용할 수 있는 비휘발성 메모리의 셀 스트링 및 이를 이용한 메모리 어레이를 제공한다.
Abstract:
PURPOSE: A method for differentiating adult stem cells into schwann cells is provided to effectively differentiate adult stem cells into schwann cells without an expensive differentiation medium. CONSTITUTION: A method for differentiating adult stem cells into schwann cells using an electromagnetic field comprises the steps positioning the adult stem cells in the electromagnetic field at a frequency of 1-200 Hz; and culturing the adult stem cells. The intensity of the electromagnetic field is 0.5-2 mT. The culturing comprises the steps of: culturing the adult stem cells in an alpha-MEM medium containing beta-mercaptoethanol for 12-36 hours; culturing the adult stem cells in an alpha-MEM medium containing trans-retinoic acid for 60-82 hours; and culturing the adult stem cells in an alpha-MEM medium containing forskolin for 7-14 days.
Abstract:
PURPOSE: A nonvolatile memory device including twin fins separated by a shield electrode and a NAND flash memory array using the same are provided to increase integration by preventing interference between adjacent cells using the shield electrode. CONSTITUTION: A fence type semiconductor(10a) is protrusively formed on a semiconductor substrate. An isolation insulating layer is filled in the fence type semiconductor with a preset height. A gate insulation layer stack(60) includes a charge storage layer on both sides of the fence type semiconductor on the isolation insulating layer. A control electrode(70) surrounds the gate insulation layer stack. The fence type semiconductor is vertically separated from the control electrode to form twin fins(11,12). An insulation layer is formed on both sides of the twin fins and a shield electrode is filled between the twin fins.
Abstract:
PURPOSE: A 3D memory cell stack having a horizontal type selection element is provided to conspicuously improve scattering property between memory cell elements which are perpendicularly laminated by simultaneously forming a selection element material layer on each level. CONSTITUTION: A vertical electrode(10) is vertically formed on a bottom insulating layer. A resistance alteration material layer(20) is formed in order to contact with both sides of the vertical electrode in a first direction. The vertical electrode is sandwiched in between two separation insulating layer posts(31, 32). A selection element material layer(50) is symmetrically formed between the two separation insulating layer posts. Two horizontal electrodes(60) are symmetrically on opposite side of the vertical electrode.
Abstract:
PURPOSE: A semiconductor memory device having a low leakage current is provided to reduce a leakage current in the off state by including a low band gap region having a band gap lower than a first semiconductor region in the first semiconductor region. CONSTITUTION: A semiconductor body(5) is formed on a column type semiconductor equipped with a first side and a second side. The first side and the second side are faced each other. A gate insulating layer(6) is formed on a region except for the first side and the second side among the surfaces of the semiconductor body. A gate electrode(7) is formed on the surface of the gate insulating layer. A first semiconductor region(3) is formed on the first side of the semiconductor body. A second semiconductor region(10) is formed on the second side faced with the first side surface of the semiconductor body.