公开(公告)号：KR1020090084088A

公开(公告)日：2009-08-05

申请号：KR1020080010055

申请日：2008-01-31

Applicant: 재단법인서울대학교산학협력재단

Inventor： 김기범 ,  김현미

IPC: H01L21/027 ,  G02B21/02 ,  B82Y40/00

CPC classification number: H01L21/0275 ,  B82Y40/00 ,  G02B21/025 ,  G03F7/701

Abstract: A beam shape iris diaphragm and a pattern forming device using the same are provided to expose the region to form a nano pattern without overlapping the electronic beams. An electronic beam is irradiated on a substrate on which the electron-beam resist is coated for the nano pattern formation. A plate(211) is arranged on the top of substrate and an opening(215) of the square shape is formed. The length of one side of square is set up in the range of 5 to 1000um. The electronic beam in which the nano pattern information is included is irradiated on the substrate on which the electron-beam resist is coated and the nano pattern is formed on the substrate. A beam shape iris diaphragm(210) is irradiated on the substrate, and controls the shape of the electronic beam which is arranged on the top of substrate. A substrate holder(220) moves on the plane which is parallel to the plane of the beam shape iris diaphragm.

Abstract translation: 提供光束形状的虹膜光阑和使用其的图案形成装置，以暴露该区域以形成纳米图案而不重叠电子束。 将电子束照射在其上涂覆电子束抗蚀剂的基板上进行纳米图案形成。 板（211）布置在基板的顶部上，形成正方形的开口（215）。 平方的一侧的长度设置在5到1000um的范围内。 将包含纳米图案信息的电子束照射在其上涂布电子束抗蚀剂的基板上，并且在基板上形成纳米图案。 光束形状的虹膜光阑（210）照射在基板上，并且控制布置在基板顶部的电子束的形状。 衬底保持器（220）在平行于光束形状的虹膜光阑的平面的平面上移动。

公开(公告)号：KR100904894B1

公开(公告)日：2009-06-29

申请号：KR1020080010054

申请日：2008-01-31

Applicant: 재단법인서울대학교산학협력재단

Inventor： 김기범 ,  김현미

IPC: G03B9/02 ,  G03B9/00

CPC classification number: G03B9/07 ,  G02B21/0016 ,  G02B26/04 ,  H01L21/268

Abstract: An objective aperture and a pattern forming apparatus using the same are provided to obtain a clear atom image by reducing the background signal noise of a high resolution atom image and to form a clear pattern using the clear atom image. An objective lens aperture(700) comprises a central area(710) in which no opening is formed in order to reduce the background signal noise of a high resolution atom image, and a peripheral area(720) in which at least one opening(730) which passes diffraction beam, not transmitting beam. The central area is formed with a diameter more than 2La, where L is the distance between a specimen and the objective lens aperture and a is the convergence semiangle of electron beam irradiated to the specimen.

Abstract translation: 提供了一种客观孔径和使用其的图案形成装置，以通过降低高分辨率原子图像的背景信号噪声并使用清晰的原子图像形成清晰图案来获得清晰的原子图像。 物镜孔（700）包括中心区域（710），其中不形成开口以减少高分辨率原子图像的背景信号噪声;以及周边区域（720），其中至少一个开口（730） ）通过衍射光束，不发射光束。 中心区形成直径大于2La，其中L是试样和物镜孔之间的距离，a是照射到样品的电子束的会聚半径。

公开(公告)号：KR100928058B1

公开(公告)日：2009-11-23

申请号：KR1020080010050

申请日：2008-01-31

Applicant: 재단법인서울대학교산학협력재단

Inventor： 김기범 ,  김현미

IPC: G03B9/02 ,  G03B9/00 ,  H01L21/26

Abstract: 대물렌즈 조리개 제조방법, 제조된 대물렌즈 조리개 및 이를 이용한 패턴형성장치가 개시된다. 본 발명에 따른 대물렌즈 조리게 제조방법은 결정질 시편의 회절도형을 획득하고, 획득된 회절도형을 바탕으로 원하는 고분해능 원자이미지를 얻기 위해, 투과시킬 회절빔 및 투과빔을 선택한다. 그리고 선택된 회절빔 및 투과빔을 투과시키는 개구부를 대물렌즈 조리개용 플레이트에 형성시킨다. 본 발명에 따르면, 하나의 시편을 이용하여 다양한 원자이미지를 얻을 수 있어 여러 가지 패턴을 형성하고자 할 때 시편을 교체하는데 소요되는 시간과 노력이 절감된다.

Abstract translation: 提供一种目标孔径制造方法和使用该方法的图案形成装置，以通过从TEM中去除穿透样本的背景噪声来保持电子束的背景强度均匀。 目标孔径制造方法包括：获得晶体样本的衍射图案的步骤（S710）; 根据e衍射图案选择衍射光束和透射光束以获得高分辨率的原子图像的步骤（S720）; 在用于物镜孔径的板上形成开口部分的步骤; 以及通过开口部分传送衍射光束和选择的传输光束的步骤（S730）。

公开(公告)号：KR1020090084085A

公开(公告)日：2009-08-05

申请号：KR1020080010050

申请日：2008-01-31

Applicant: 재단법인서울대학교산학협력재단

Inventor： 김기범 ,  김현미

IPC: G03B9/02 ,  G03B9/00 ,  H01L21/26

CPC classification number: G03B9/07 ,  G02B21/0016 ,  G02B26/04 ,  H01L21/268

Abstract: An objective aperture manufacturing method and a pattern forming device using the same are provided to keep the background intensity of the electronic beam uniform by removing the background noise penetrating a specimen from a TEM. An objective aperture manufacturing method comprises: a step of obtaining the diffraction pattern of a crystalloid specimen(S710); a step of selecting the diffraction beam and transmitting beam in order to get the atom image of the high resolving power based on e diffraction pattern(S720); a step of forming an opening part at a plate for the objective lens aperture; and a step of transmitting the diffraction beam and the selected transmitting beam through the opening part(S730).

Abstract translation: 提供了一种客观孔径制造方法和使用其的图案形成装置，通过从TEM中去除穿透样本的背景噪声来保持电子束的背景强度均匀。 一种客观孔径制造方法，包括：获得晶体样品的衍射图案的步骤（S710）; 选择衍射光束和透射光束以便获得基于e衍射图案的高分辨能力的原子图像的步骤（S720）; 在用于物镜孔的板上形成开口部的步骤; 以及通过开口部发送衍射光束和所选择的发射光束的步骤（S730）。