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公开(公告)号：KR1020130069993A
公开(公告)日：2013-06-27
申请号：KR1020110137078
申请日：2011-12-19
Applicant: 조희철
Inventor： 조희철
IPC: H04N21/454
CPC classification number: H04N21/454 , H04N21/44016
Abstract: PURPOSE: A broadcast blocking device and a method thereof are provided to select and block a specific broadcast by dividing other broadcasts and the specific broadcast such as an advertisement. CONSTITUTION: A program schedule receiving unit(170) receives a broadcast program schedule. A broadcast selection unit(110) selects a part of broadcast data in received sky wave broadcast data. A broadcast blocking unit(130) blocks output of the selected broadcast data. A substitution broadcast unit(150) outputs substitution broadcast data during a broadcast data blocking section of the broadcast blocking unit. [Reference numerals] (110) Broadcast selection unit; (130) Broadcast blocking unit; (150) Substitution broadcast unit; (170) Program schedule receiving unit; (190) Timer; (AA) Display
Abstract translation: 目的：提供广播阻止装置及其方法，通过划分其他广播和特定广播（诸如广告）来选择和阻止特定广播。 方案：节目安排接收单元（170）接收广播节目表。 广播选择单元（110）选择所接收的天波广播数据中的广播数据的一部分。 广播阻断单元（130）阻止所选广播数据的输出。 替代广播单元（150）在广播阻止单元的广播数据阻止部分期间输出替换广播数据。 （附图标记）（110）广播选择单元; （130）广播封锁单元; （150）替代广播单位; （170）节目时间表接收单元; （190）定时器; （AA）显示
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Patent Agency Ranking
公开(公告)号：KR100868658B1
公开(公告)日：2008-11-12
申请号：KR1020070048864
申请日：2007-05-18
Applicant: 조희철
IPC: B24D11/00
CPC classification number: B24D18/0018 , B24D2203/00
Abstract: A method for fabricating a polishing tool is provided to polish and discharge polished slurry by distributing diamond grit uniformly. A method for fabricating a polishing tool comprises a first step of forming photoresist on the base material(10); a second step of covering the mask in which pattern is molded and exposing and developing and transferring the same pattern on the photoresist a third step of spraying abrasive(40) on a base material on which photoresist is formed; and a fourth step of performing the electrodeposition.
Abstract translation: 提供了一种制造抛光工具的方法，用于通过均匀分布金刚石砂粒来抛光和抛光抛光的浆料。 一种用于制造抛光工具的方法包括在基材（10）上形成光致抗蚀剂的第一步骤。 覆盖模制图案的掩模的第二步骤，并且在光致抗蚀剂上曝光和显影并转印相同的图案;在其上形成光致抗蚀剂的基材上喷涂研磨剂（40）的第三步骤; 以及进行电沉积的第四步骤。
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