Abstract:
PROBLEM TO BE SOLVED: To provide a curable resin composition which allows alkali development, yields a cured product excellent in adhesion and scratch resistance, and is useful as a hard coating material for an image display surface of an image display device.SOLUTION: Provided is a curable resin composition containing (A) a polyvalent alcohol acrylate compound, (B) a compound containing an acrylic group or methacrylic group and a carboxyl group in a molecule, (C) a siloxane compound containing a glycidyl group, and (D) a photo-radical generator. The (C) siloxane compound containing a glycidyl group is preferably a compound represented by the general formula (1) or (2), particularly a siloxane compound containing a 3-glycidoxypropyl group. The general formulas (1) and (2) are as described in the description of the claimed invention.
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical waveguide that allows fine processing, has high surface accuracy, is manufactured in a simple process, and has an optical path conversion function. SOLUTION: The method of manufacturing the optical waveguide has the optical path conversion function of forming a core part using photo-curable resin or positive type photosensitive resin. The method of manufacturing the optical waveguide has a process of forming an optical path conversion mirror surface by continuously varying the irradiation amount of irradiation light to the photo-curable resin or positive type photosensitive resin. The optical waveguide is manufactured by the manufacturing method. Preferably, the optical waveguide has a clad part and the core part on a substrate or a support film. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a curable composition in which an obtained cured article is excellent in heat-resistance and flexibility. SOLUTION: The curable composition comprises a silicon-containing compound represented by general formula (0), and 0.01-20 pts.mass of an epoxy-curable compound based on 100 pts.mass of the compound. In general formula (0), Z is a group represented by any one of the formulae (2)-(6). COPYRIGHT: (C)2009,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a curable composition for an optical material that simultaneously satisfies heat resistance, moisture resistance and transparency (low optical loss) in an optical communication wavelength and is excellent as a material for an optical waveguide in particular and to provide an optical waveguide having a member produced by curing the curable composition. SOLUTION: The curable composition for an optical material comprises, as the essential constituents, (A) a specific silicon-containing polymer, (B) a specific epoxy resin, and (C) an energy ray-sensitive cationic polymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a photocurable resin composition useful as a hard coating material for an image display surface of an image display device resulting in a cured product having superior adhesion and scratch resistance.SOLUTION: The photocurable resin composition comprises: (A) a polyvalent alcohol (meth)acrylate compound; (B) a photo radical generator or a heat radical generator; and (C) an epoxy (meth)acrylate compound having a specified structure, further preferably, (D) a phosphoric acid (meta)acrylate compound and/or (F) another epoxy resin.
Abstract:
PROBLEM TO BE SOLVED: To provide a coating liquid for forming an insulating film in which shrinkage in a baking step in steam is small and crack of a silica film and detachment thereof from a semiconductor substrate is hard to occur, an insulating film using the same, and a method for producing a compound used for the same. SOLUTION: The coating liquid for forming an insulating film includes: inorganic polysilazane having a ratio of a peak area of 4.5-5.3 ppm derived from an SiH 1 group and an SiH 2 group to a peak area of 4.3-4.5 ppm derived from an SiH 3 group of 4.2-50 in 1 H-NMR spectrum; and an organic solvent. The insulating film is obtained by using the coating liquid for forming an insulating film. The inorganic polysilazane is obtained by reacting a dihalosilane compound, a trihalosilane compound, or a mixture thereof with a base to form adducts, and subsequently by reacting ammonia with a solution or a dispersion of the adducts at -50 to -1°C. COPYRIGHT: (C)2011,JPO&INPIT