公开(公告)号：US20200073255A1

公开(公告)日：2020-03-05

申请号：US16610798

申请日：2018-04-17

Applicant: ASML Holding N.V.

Inventor： Leonardo Gabriel MONTILLA ,  Krishanu SHOME

IPC: G03F7/20

Abstract: A method including illuminating a product test substrate with radiation from a component, wherein the product test substrate does not have a device pattern etched therein and yields a non-zero sensitivity when illuminated, the non-zero sensitivity representing a change in an optical response characteristic of the product test substrate with respect to a change in a characteristic of the radiation; measuring at least a part of the radiation redirected by the product test substrate to determine a parameter value; and taking an action with respect to the component based on the parameter value.

公开(公告)号：US20180299790A1

公开(公告)日：2018-10-18

申请号：US15766427

申请日：2016-10-06

Applicant: ASML Holding N.V.

Inventor： Krishanu SHOME ,  Justin Lloyd KREUZER

IPC: G03F7/20

CPC classification number: G03F7/70566 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7065 ,  G03F9/7069 ,  G03F9/7088

Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.