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公开(公告)号：US10935895B2
公开(公告)日：2021-03-02
申请号：US16539487
申请日：2019-08-13
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik Koevoets , Erik Johan Arlemark , Sander Catharina Reinier Derks , Sjoerd Nicolaas Lambertus Donders , Wilfred Edward Endendijk , Franciscus Johannes Joseph Janssen , Raymond Wilhelmus Louis Lafarre , Leon Martin Levasier , Jim Vincent Overkamp , Nicolaas Ten Kate , Jacobus Cornelis Gerardus Van Der Sanden
IPC: G03B27/52 , G03F7/20 , H01L21/67 , H01L21/683
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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公开(公告)号：US10394140B2
公开(公告)日：2019-08-27
申请号：US16326410
申请日：2017-07-28
Applicant: ASML Netherlands B.V.
Inventor： Hendrikus Herman Marie Cox , Paul Corné Henri De Wit , Arie Jeffrey Den Boef , Adrianus Hendrik Koevoets , Jim Vincent Overkamp , Frits Van Der Meulen , Jacobus Cornelis Gerardus Van Der Sanden
IPC: G03F7/20
Abstract: A lithographic apparatus comprises a projection system which is configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table. The lithographic apparatus further comprises a heating apparatus comprises one or more radiation sources configured to provide additional radiation beams which illuminate and heat part of the substrate during the exposure.
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公开(公告)号：US20190072863A1
公开(公告)日：2019-03-07
申请号：US16177585
申请日：2018-11-01
Applicant: ASML Netherlands B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
IPC: G03F7/20
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US20180067398A1
公开(公告)日：2018-03-08
申请号：US15314841
申请日：2015-05-07
Applicant: ASML Netherlands B.V.
Inventor： Rogier Hendrikus Magdalena CORTIE , Christianus Wilhelmus Berendsen , Andre Bernardus Jeunink , Adrianus Hendrik Koevoets , Jim Vincent Overkamp , Sigfried Alexander Tromp , Van Vuong Vy , Daniel Elza Roeland Audenaerdt
IPC: G03F7/20
CPC classification number: G03F7/7095 , G03F7/70341 , G03F7/70733 , G03F7/70875 , G03F7/70891
Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.
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公开(公告)号：US10712678B2
公开(公告)日：2020-07-14
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
IPC: B29C43/58 , G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/20 , B29C43/02 , B29C59/02 , B29C59/16
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
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Patent Agency Ranking
公开(公告)号：US10120292B2
公开(公告)日：2018-11-06
申请号：US15297001
申请日：2016-10-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Adrianus Hendrik Koevoets , Sjoerd Nicolaas Lambertus Donders , Menno Fien , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Martijn Houben , Jan Steven Christiaan Westerlaken , Jim Vincent Overkamp , Maarten Van Beijnum
Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
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公开(公告)号：US10018926B2
公开(公告)日：2018-07-10
申请号：US15314841
申请日：2015-05-07
Applicant: ASML Netherlands B.V.
Inventor： Rogier Hendrikus Magdalena Cortie , Christianus Wilhelmus Johannes Berendsen , Andre Bernardus Jeunink , Adrianus Hendrik Koevoets , Jim Vincent Overkamp , Siegfried Alexander Tromp , Van Vuong Vy , Daniel Elza Roeland Audenaerdt
CPC classification number: G03F7/7095 , G03F7/70341 , G03F7/70733 , G03F7/70875 , G03F7/70891
Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.
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公开(公告)号：US09939738B2
公开(公告)日：2018-04-10
申请号：US15329536
申请日：2015-07-16
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik Koevoets , Christianus Wilhelmus Johannes Berendsen , Rogier Hendrikus Magdalena Cortie , Jim Vincent Overkamp , Patricius Jacobus Neefs , Putra Saputra , Ruud Hendrikus Martinus Johannes Bloks , Michael Johannes Hendrika Wilhelmina Renders , Johan Gertrudis Cornelis Kunnen , Thibault Simon Mathieu Laurent
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70341 , G03F7/70783 , G03F7/70875
Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two-phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.
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公开(公告)号：US09696640B2
公开(公告)日：2017-07-04
申请号：US14399870
申请日：2013-05-02
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70858 , G03F7/70758
Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.
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公开(公告)号：US20150098067A1
公开(公告)日：2015-04-09
申请号：US14399870
申请日：2013-05-02
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/70758
Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.
Abstract translation: 提供了一种包括包括热源，第二主体和加热器装置的第一主体的光刻设备。 第二主体经由第一和第二主体之间的间隙具有面向第一主体的面对表面。 热源用于经由间隙向第二体提供热通量。 加热器装置连接到相对表面。 加热器装置被配置为向第二主体提供另外的热通量。
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