公开(公告)号：US20190056654A1

公开(公告)日：2019-02-21

申请号：US15770175

申请日：2016-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Mária PÉTER ,  Erik Achilles ABEGG ,  Adrianus Johannes Maria GIESBERS ,  Johan Hendrik KLOOTWIJK ,  Maxim Aleksandrovich NASALEVICH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/38

Abstract: Methods of manufacturing a pellicle for a lithographic apparatus including a method involving depositing at least one graphene layer on a planar surface of a substrate. The substrate has a first substrate portion and a second substrate portion. The method further includes removing the first substrate portion to form a freestanding membrane from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.