公开(公告)号：US20170237225A1

公开(公告)日：2017-08-17

申请号：US15502462

申请日：2015-07-27

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Teis Johan COENEN ,  Jeroen Johannes Michiel VAN HELVOORT ,  Wouter Joep ENGELEN ,  Gerrit Jacobus Hendrik BRUSSAARD ,  Gijsbertus Geert POORTER ,  Erik Roelof LOOPSTRA

IPC: H01S4/00 ,  H05H7/02 ,  H05H9/00

CPC classification number: H01S3/0903 ,  H01S3/0071 ,  H01S3/0959 ,  H01S3/1024 ,  H01S3/11 ,  H01S3/1103

Abstract: Passage through LINACs of electron bunches in their acceleration phase is coordinated with passage through the LINACs of electron bunches in their deceleration phase. Each successive pair of electron bunches are spaced in time by a respective bunch spacing, in accordance with a repeating electron bunch sequence. The electron source provides clearing gaps in the electron bunch sequence to allow clearing of ions at the undulator. The electron source provides the clearing gaps in accordance with a clearing gap sequence such that, for each of the plurality of energy recovery LINACS, and for substantially all of the clearing gaps: for each passage of the clearing gap through the LINAC in an acceleration phase or deceleration phase the clearing gap is coordinated with a further one of the clearing gaps passing through the LINAC in a deceleration phase or acceleration phase thereby to maintain energy recovery operation of the LINAC.

公开(公告)号：US20170205704A1

公开(公告)日：2017-07-20

申请号：US15320749

申请日：2015-07-02

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Jozef Petrus Henricus BENSCHOP ,  Arjen BOOGAARD ,  Florian Didier Albin DHALLUIN ,  Alexey Sergeevich KUZNETSOV ,  Mária PÉTER ,  Luigi SCACCABAROZZI ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Andrei Mikhailovich YAKUNIN

IPC: G03F1/62 ,  G02B5/20 ,  G03F1/38 ,  G02B5/18 ,  G03F1/24 ,  G03F7/20

CPC classification number: G03F1/62 ,  G02B5/1838 ,  G02B5/208 ,  G03F1/24 ,  G03F1/38 ,  G03F7/70191 ,  G03F7/70316 ,  G03F7/70575 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983

Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.