公开(公告)号：US11526085B2

公开(公告)日：2022-12-13

申请号：US16988766

申请日：2020-08-10

Applicant: ASML Netherlands B.V.

Inventor： Hendrik Jan Hidde Smilde ,  Bastiaan Onne Fagginger Auer ,  Davit Harutyunyan ,  Patrick Warnaar

IPC: G03F7/20 ,  G03F9/00 ,  G01B9/04 ,  G01N21/88

Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.

公开(公告)号：US10394135B2

公开(公告)日：2019-08-27

申请号：US15796298

申请日：2017-10-27

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Bastiaan Onne Fagginger Auer

IPC: G03F7/20 ,  G01N21/47

Abstract: Disclosed is a method of measuring a parameter of interest relating to a structure on a substrate, and associated metrology apparatus. The method comprises determining a correction to compensate for the effect of a measurement condition on a measurement signal from a plurality of measurement signals, wherein each of said measurement signals results from a different measurement of the structure performed under a different variation of said measurement condition. The correction is then used in a reconstruction of a mathematical model of said structure to suppress an influence of variations of said measurement condition on the reconstruction.

公开(公告)号：US10317805B2

公开(公告)日：2019-06-11

申请号：US15842958

申请日：2017-12-15

Applicant: ASML Netherlands B.V.

Inventor： Jolanda Theodora Josephina Schmetz-Schagen ,  Hugo Augustinus Joseph Cramer ,  Armand Eugene Albert Koolen ,  Bastiaan Onne Fagginger Auer

IPC: G03F9/00 ,  G03F7/20 ,  G01N21/956 ,  G01B11/02 ,  G01M11/02

Abstract: A method for monitoring a characteristic of illumination from a metrology apparatus includes using the metrology apparatus to acquire a pupil image at different focus settings of the metrology apparatus and calculating an asymmetry value for each acquired pupil image, where each pupil image is acquired on at least one edge of a target of a substrate.