公开(公告)号：US20150124231A1

公开(公告)日：2015-05-07

申请号：US14398043

申请日：2013-05-06

Applicant: ASML Netherlands B.V.

Inventor： Heine Melle Mulder ,  Pieter Willem Herman De Jager

IPC: G03F7/20

CPC classification number: G03F7/70025 ,  G03F7/70391 ,  G03F7/704 ,  H01S3/109 ,  H01S5/141 ,  H01S5/183 ,  H01S5/423

Abstract: An assembly to modify a property of a plurality of radiation beams, the assembly including a plurality of waveguides configured to guide the plurality of radiation beams closer together, and a frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate a corresponding plurality of radiation beams having frequencies that are an integer multiple higher. Also described are a corresponding lithography apparatus, method of modifying a property of a plurality of radiation beams and device manufacturing method.

Abstract translation: 一种用于修改多个辐射束的性质的组件，所述组件包括多个波导，所述多个波导被配置为将所述多个辐射束引导得更靠近在一起;以及倍频装置，被配置为接收由所述多个波导引导的多个辐射束 并且产生具有高于整数倍的频率的对应的多个辐射束。 还描述了相应的光刻设备，修改多个辐射束的性质的方法和器件制造方法。