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公开(公告)号：US20190265596A1
公开(公告)日：2019-08-29
申请号：US16286885
申请日：2019-02-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Antonius Theodorus Anna Maria DERKSEN , Christiaan Alexander HOOGENDAM , Aleksey KOLESNYCHENKO , Erik Roelof LOOPSTRA , Theodorus Marinus MODDERMAN , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN
Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
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Patent Agency Ranking
公开(公告)号：US20190086821A1
公开(公告)日：2019-03-21
申请号：US16195163
申请日：2018-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Antonius Theodoras Anna Maria DERKSEN , Joeri LOF , Klaus SIMON , Alexander STRAAIJER
IPC: G03F7/20
Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
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公开(公告)号：US20180095361A1
公开(公告)日：2018-04-05
申请号：US15834609
申请日：2017-12-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Klaus SIMON
CPC classification number: G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
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公开(公告)号：US20180046089A1
公开(公告)日：2018-02-15
申请号：US15790287
申请日：2017-10-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Henrikus Herman Marie COX , Antonius Theodorus Anna Maria DERKSEN , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Joeri LOF , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Frits VAN DER MEDLEN , Johannes Catharinus Hubertus MULKENS , Gerardus Petrus Matthijs VAN NUNEN , Klaus SIMON , Bernardus Antonius SLAGHEKKE , Alexander STRAAIJER , Jan-Gerard Cornelis VAN DER TOORN , Martijn HOUKES
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号：US20160282726A1
公开(公告)日：2016-09-29
申请号：US15174773
申请日：2016-06-06
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Antonius Theodorus Anna Maria DERKSEN , Joeri LOF , Klaus SIMON , Alexander STRAAIJER
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
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公开(公告)号：US20150070668A1
公开(公告)日：2015-03-12
申请号：US14541037
申请日：2014-11-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Antonius Theodorus Anna Maria DERKSEN , Joeri LOF , Klaus SIMON , Alexander STRAAIJER
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
Abstract translation: 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括例如经由反馈电路来控制浸没液体流速和液体温度。
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