公开(公告)号：EP4261616A1

公开(公告)日：2023-10-18

申请号：EP22168094.5

申请日：2022-04-13

Applicant: ASML Netherlands B.V.

Inventor： SU, Jing ,  ZOU, Yi ,  VAN MIERLO, Willem, Louis ,  VAN DER STRATEN, Koen, Wilhelmus, Cornelis, Adrianus ,  CAO, Peigen ,  ENGBLOM, Peter, David ,  DILLEN, Hermanus, Adrianus ,  SLACHTER, Abraham ,  TEL, Wim, Tjibbo ,  NECHAEV, Konstantin, Sergeevich ,  ANUNCIADO, Roy

IPC: G03F7/20

Abstract: A method of grouping pattern features of a substantially irregular pattern layout for patterning a substrate in a lithographic process. The method comprises obtaining at least one substantially irregular pattern representation, each at least one substantially irregular pattern representation relating to a respective layer of interest; grouping a plurality of pattern features comprised within the substantially irregular pattern representation based on geometry and/or at least one processing attribute relating to processing performance into a plurality of groups, each group comprising a plurality of pattern features which are similar in terms of geometry and/or the at least one processing attribute; and deriving a parameter of interest associated with one or more groups of the plurality of groups.

公开(公告)号：EP4449205A1

公开(公告)日：2024-10-23

申请号：EP22835390.0

申请日：2022-12-13

Applicant: ASML Netherlands B.V.

Inventor： FU, Jiyou ,  SU, Jing ,  LIN, Chenxi ,  LIANG, Jiao ,  CHEN, Guangqing ,  ZOU, Yi

IPC: G03F7/20 ,  G03F9/00 ,  H01J37/22 ,  H01L21/66