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11.发明授权公开(公告)号：US12287586B2
公开(公告)日：2025-04-29
申请号：US18398860
申请日：2023-12-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan Janssens , Bert Dirk Scholten , Sjoerd Nicolaas Lambertus Donders , Teunis Van Dam , Peter Mark Overschie , Theresa Mary Spaan-Burke , Siegfried Alexander Tromp
IPC: G03F7/00 , H01L21/683 , H01L21/67
Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.
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公开(公告)号：US10192772B2
公开(公告)日：2019-01-29
申请号：US15766740
申请日：2016-09-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Satish Achanta , Tiannan Guan , Raymond Wilhelmus Louis LaFarre , Ilya Malakhovsky , Bas Johannes Petrus Roset , Siegfried Alexander Tromp , Johannes Petrus Martinus Bernardus Vermeulen
IPC: G03F7/20 , H01L21/687 , H01L21/683 , G03F7/00
Abstract: A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.
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公开(公告)号：US09915877B2
公开(公告)日：2018-03-13
申请号：US15629399
申请日：2017-06-21
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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14.发明授权公开(公告)号：US11860552B2
公开(公告)日：2024-01-02
申请号：US16309501
申请日：2017-06-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Stef Marten Johan Janssens , Bert Dirk Scholten , Sjoerd Nicolaas Lambertus Donders , Teunis Van Dam , Peter Mark Overschie , Theresa Mary Spaan-Burke , Siegfried Alexander Tromp
IPC: G03F7/00 , H01L21/683 , H01L21/67
CPC classification number: G03F7/70725 , G03F7/707 , G03F7/70783 , G03F7/70816 , H01L21/6838 , H01L21/67288
Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.
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公开(公告)号：US10599049B2
公开(公告)日：2020-03-24
申请号：US15761245
申请日：2016-08-24
Applicant: ASML Netherlands B.V.
Inventor： Bas Johannes Petrus Roset , Siegfried Alexander Tromp
Abstract: A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising: a main body (20) having a main body surface; and a plurality of burls (21) projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; and a flow control feature (22, 22c, 22d) configured to form a gas cushion adjacent the periphery of the substrate holder when a substrate is being lowered onto the substrate holder.
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Patent Agency Ranking
公开(公告)号：US10481502B2
公开(公告)日：2019-11-19
申请号：US15918478
申请日：2018-03-12
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US10018924B2
公开(公告)日：2018-07-10
申请号：US15014829
申请日：2016-02-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Siegfried Alexander Tromp , Jacobus Josephus Leijssen , Elisabeth Corinne Rodenburg , Maurice Wilhelmus Leonardus Hendricus Feijts , Hendrik Huisman
CPC classification number: G03F7/70716 , B05D3/02 , G01J5/0285 , G01J5/20 , G03F7/70341 , G03F7/70708
Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.
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公开(公告)号：US09983489B2
公开(公告)日：2018-05-29
申请号：US15311548
申请日：2015-04-24
Applicant: ASML Netherlands B.V.
Inventor： Christianus Wilhelmus Johannes Berendsen , Marcel Beckers , Henricus Jozef Castelijns , Hubertus Antonius Geraets , Adrianus Hendrik Koevoets , Leon Martin Levasier , Peter Schaap , Bob Streefkerk , Siegfried Alexander Tromp
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70033 , G03F7/70625 , G03F7/70783 , G03F7/70875 , G03F7/70891 , G03F7/70941
Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
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19.发明授权公开(公告)号：US09298104B2
公开(公告)日：2016-03-29
申请号：US14563792
申请日：2014-12-08
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20 , H01L21/66 , H01L21/683 , H01L21/67
CPC classification number: G03F7/70716 , G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70875 , G03F7/7095 , H01L21/67109 , H01L21/67248 , H01L21/6838 , H01L22/26 , H01L2924/0002 , H01L2924/00
Abstract: A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface.
Abstract translation: 用于光刻设备的衬底保持器。 衬底保持器包括主体，多个毛刺和加热器和/或温度传感器。 主体有一个表面。 多个毛刺从表面突出并具有端面以支撑基底。 加热器和/或温度传感器设置在主体表面上。 衬底保持器构造成使得当衬底被支撑在端表面上时，加热器和/或温度传感器和衬底之间的热导率大于加热器和/或温度传感器与主体表面之间的热导率 。
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公开(公告)号：US20150131064A1
公开(公告)日：2015-05-14
申请号：US14399137
申请日：2013-05-07
Applicant: ASML Netherlands B.V.
Inventor： Thibault Simon Mathieu Laurent , Johannes Henricus Wilhelmus Jacobs , Wilhelmus Franciscus Johannes Simons , Martijn Houben , Raymond Wilhelmus Louis Lafarre , Koen Steffens , Han Henricus Aldegonda Lempens , Rogier Hendrikus Magdalena Cortie , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Siegfried Alexander Tromp , Theodorus Wilhelmus Polet , Jim Vincent Overkamp , Van Vuong Vy
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
Abstract translation: 一种用于支撑物体的物体表，具有支撑体的物体表，用于保持物体的物体保持器，邻近物体保持器的边缘的开口以及经由通道与开口流体连通的通道，其中通道 由与限定通道的第二材料不同的第一材料限定。
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