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Patent Agency Ranking
公开(公告)号：EP3477392A1
公开(公告)日：2019-05-01
申请号：EP17199439.5
申请日：2017-10-31
Applicant: ASML Netherlands B.V.
Inventor： TARABRIN, Sergey , KOOLEN, Armand Eugene Albert
IPC: G03F7/20 , G01N21/956
Abstract: Metrology apparatus and methods are disclosed for measuring a structure formed on a substrate. In one arrangement, different components of a radiation beam are selectively extracted after reflection from the structure and independently detected. For each component, radiation is selected from one of a plurality of predetermined regions in a downstream pupil plane of the optical system downstream from the structure. Radiation is further selected from one of two predetermined orthogonal polarization states. The predetermined orthogonal polarization states are oriented differently as a pair for each of at least a subset of components comprising radiation selected from different predetermined regions in the downstream pupil plane.
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公开(公告)号：EP3454124A1
公开(公告)日：2019-03-13
申请号：EP17189728.3
申请日：2017-09-07
Applicant: ASML Netherlands B.V.
Inventor： TARABRIN, Sergey
IPC: G03F7/20
Abstract: A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.
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公开(公告)号：EP3293574A1
公开(公告)日：2018-03-14
申请号：EP16188176.8
申请日：2016-09-09
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G01B11/272 , G03F7/70591 , G03F7/70633
Abstract: Disclosed is a method of determining a characteristic of a target on a substrate and corresponding metrology apparatus and computer program. The method comprises determining a plurality of intensity asymmetry measurements from pairs of complementary pixels comprising a first image pixel in a first image of the target and a second image pixel in a second image of the target. The first image is obtained from first radiation scattered by the target and the second image is obtained from second radiation scattered by the target, the first radiation and second radiation comprising complementary non-zero diffraction orders. The characteristic of the target is then determined from said plurality of intensity asymmetry measurements.
Abstract translation: 公开了一种确定衬底上的目标的特性的方法以及相应的度量装置和计算机程序。 该方法包括从包括目标的第一图像中的第一图像像素和目标的第二图像中的第二图像像素的互补像素对确定多个强度不对称测量。 第一图像是从目标散射的第一辐射获得的，第二图像是从目标散射的第二辐射获得的，第一辐射和第二辐射包括互补的非零衍射级。 然后从所述多个强度不对称测量中确定目标的特征。
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公开(公告)号：EP4124909A1
公开(公告)日：2023-02-01
申请号：EP21188279.0
申请日：2021-07-28
Applicant: ASML Netherlands B.V.
Inventor： TARABRIN, Sergey
Abstract: Disclosed is a dark-field interferometric microscope and associated microscopy method. The microscope comprises an object branch (OIB) being operable to propagate object radiation onto a sample (W) and collect resultant scattered radiation from said sample and a reference branch (RIB) being operable to propagate reference radiation. The object radiation and said reference radiation are mutually pointwise spatially coherent. A filter arrangement removes a zeroth order component from said scattered radiation to provide filtered scattered radiation; and a detection arrangement detects an interferometric image from interference of said filtered scattered radiation and reference radiation.
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公开(公告)号：EP3671346A1
公开(公告)日：2020-06-24
申请号：EP18213270.4
申请日：2018-12-18
Applicant: ASML Netherlands B.V.
Inventor： SOKOLOV, Sergei , TARABRIN, Sergey , CHENG, Su-Ting , KOOLEN, Armand Eugene Albert
IPC: G03F7/20
Abstract: The disclosure relates to measuring a parameter of a patterning process. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.
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