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公开(公告)号：US09983482B2
公开(公告)日：2018-05-29
申请号：US14775263
申请日：2014-02-26
Applicant: ASML Netherlands B.V. , Carl Zeiss SMT GmbH
Inventor： Erik Roelof Loopstra , Olav Waldemar Vladimir Frijns , Stig Bieling , Antonius Theodorus Wilhelmus Kempen , Ivo Vanderhallen , Nicolaas Ten Kate , Ruud Antonius Catharina Maria Beerens , Richard Henricus Adrianus Van Lieshout , Theodorus Petrus Maria Cadee , Sjoerd Nicolaas Lambertus Donders , Alexander Matthijs Struycken , Marcus Petrus Scheepers
CPC classification number: G03F7/70033 , G02B5/0891 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983 , G21K1/067 , H05G2/003 , H05G2/008
Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
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公开(公告)号：US09811005B2
公开(公告)日：2017-11-07
申请号：US15003768
申请日：2016-01-21
Applicant: ASML Netherlands B.V.
Inventor： Yang-Shan Huang , Theodorus Petrus Maria Cadee
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70725 , G03F7/70758
Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.
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13.发明申请Lithographic Apparatus Comprising a Support for Holding an Object, and a Support for Use therein 有权平版印刷设备包括用于保持物体的支撑件及其中使用的支撑件公开(公告)号：US20150002832A1
公开(公告)日：2015-01-01
申请号：US14377141
申请日：2013-02-04
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Vadim Yevgenyevich Banine , Koen Jacobus Johannes Maria Zaal , Ramin Badie , Harmeet Singh
IPC: G03F7/20
CPC classification number: G03F7/70725 , G03F7/70708 , G03F7/70733 , H01L21/6875
Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.
Abstract translation: 光刻设备具有一个支撑件，该支撑件设置有用于保持物体的毛刺。 已经利用诸如MEMS技术的光刻制造方法来制造支撑件，以便产生其取向或位置可单独地电可控制的孔。
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14.发明授权公开(公告)号：US10061213B2
公开(公告)日：2018-08-28
申请号：US15505885
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Ruud Antonius Catharina Maria Beerens , Sander Christiaan Broers , Jeroen Johannes Theodorus Hendrikus De Best , Adrianus Marinus Wouter Heeren , George Alois Leonie Leenknegt , Bo Lenssen , Hendrikus Johannes Schellens , Peter Van Der Krieken , Theodorus Petrus Maria Cadee , Jan Van Eijk , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085 , H01L41/1132
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
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公开(公告)号：US09921494B2
公开(公告)日：2018-03-20
申请号：US14395454
申请日：2013-04-12
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Sander Christiaan Broers , Sven Antoin Johan Hol , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Bastiaan Lambertus Wilhelmus Marinus Van De Ven
CPC classification number: G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.
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Patent Agency Ranking
公开(公告)号：US09696640B2
公开(公告)日：2017-07-04
申请号：US14399870
申请日：2013-05-02
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70858 , G03F7/70758
Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.
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公开(公告)号：US09410796B2
公开(公告)日：2016-08-09
申请号：US13687524
申请日：2012-11-28
Applicant: ASML Netherlands B.V.
Inventor： Ruud Antonius Catharina Maria Beerens , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Raymond Wilhelmus Louis Lafarre
CPC classification number: G01B11/14 , G03F7/70008 , G03F7/70775
Abstract: A displacement measurement system comprising at least one retro reflector and a diffraction grating. Said displacement measurement system is constructed and arranged to measure a displacement by providing a first beam of radiation to the measurement system, wherein the diffraction grating is arranged to diffract the first beam of radiation a first time to form diffracted beams. The at least one retro reflector is arranged to subsequently redirect the diffracted beams to diffract a second time on the diffraction grating. The at least one retro reflector is arranged to redirect the diffraction beams to diffract at least a third time on the diffraction grating before the diffracted beams are being recombined to form a second beam. And the displacement system is provided with a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam.
Abstract translation: 一种位移测量系统，包括至少一个回射反射器和衍射光栅。 所述位移测量系统被构造和布置成通过向测量系统提供第一辐射束来测量位移，其中衍射光栅被布置成第一次衍射第一辐射束以形成衍射光束。 所述至少一个回射反射器被布置成随后重定向衍射光束以在衍射光栅上第二次衍射。 所述至少一个回射反射器被布置成在衍射光束被重新组合以形成第二光束之前将衍射光束重定向至少在衍射光栅上衍射至少三次。 并且位移系统设置有被配置为接收第二光束并且从第二光束的强度确定位移的传感器。
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公开(公告)号：US09261798B2
公开(公告)日：2016-02-16
申请号：US13871328
申请日：2013-04-26
Applicant: ASML Netherlands B.V.
Inventor： Yang-Shan Huang , Theodorus Petrus Maria Cadee
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70725 , G03F7/70758
Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.
Abstract translation: 基板台用于光刻设备中。 衬底台包括构造成保持衬底的衬底台和用于使用的定位装置相对于光刻设备的投影系统定位衬底台。 所述定位装置包括安装到所述基板台的第一定位构件和与所述第一定位构件配合以定位所述基板台的第二定位构件。 第二定位构件安装到支撑结构。 衬底台还包括致动器，该致动器被布置成相对于支撑结构在基本上固定的水平位置上在衬底台的底表面上施加垂直力。
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公开(公告)号：US20150098067A1
公开(公告)日：2015-04-09
申请号：US14399870
申请日：2013-05-02
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/70858 , G03F7/70758
Abstract: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body.
Abstract translation: 提供了一种包括包括热源，第二主体和加热器装置的第一主体的光刻设备。 第二主体经由第一和第二主体之间的间隙具有面向第一主体的面对表面。 热源用于经由间隙向第二体提供热通量。 加热器装置连接到相对表面。 加热器装置被配置为向第二主体提供另外的热通量。
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公开(公告)号：US20130314684A1
公开(公告)日：2013-11-28
申请号：US13871328
申请日：2013-04-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Yang-Shan HUANG , Theodorus Petrus Maria Cadee
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70725 , G03F7/70758
Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.
Abstract translation: 基板台用于光刻设备中。 衬底台包括构造成保持衬底的衬底台和用于使用的定位装置相对于光刻设备的投影系统定位衬底台。 所述定位装置包括安装到所述基板台的第一定位构件和与所述第一定位构件配合以定位所述基板台的第二定位构件。 第二定位构件安装到支撑结构。 衬底台还包括致动器，该致动器被布置成相对于支撑结构在基本上固定的水平位置上在衬底台的底表面上施加垂直力。
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