公开(公告)号：EP4550047A1

公开(公告)日：2025-05-07

申请号：EP23207692.7

申请日：2023-11-03

Applicant: ASML Netherlands B.V.

Inventor： SCHOUMANS, Nicole ,  VAENKATESAN, Vidya ,  VAN LEEST, Adriaan, Johan

IPC: G03F7/00

Abstract: There is provided a method for determining angular information of one or more structures comprising: illuminating a first surface portion of said one or more structures with an illumination beam and measuring radiation scattered therefrom to determine a first signal; determining a first asymmetry metric value describing degree of asymmetry of the first signal; and determining the angular information based on at least the first asymmetry metric value, wherein the illumination beam comprises a spot size smaller in at least one dimension of a smallest element of the first surface portion.

公开(公告)号：EP3839632A1

公开(公告)日：2021-06-23

申请号：EP19218690.6

申请日：2019-12-20

Applicant: ASML Netherlands B.V.

Inventor： TEL, Wim, Tjibbo ,  VAN LEEST, Adriaan, Johan

IPC: G03F7/20

Abstract: Disclosed is a method for determining a measurement recipe describing measurement settings for measuring a parameter of interest from a substrate subject to an etch induced parameter error, said etch induced parameter error affecting measurement of the parameter of interest in a recipe dependent manner. The method comprises obtaining parameter of interest set-up data relating to measurements of at least one set-up substrate on which the parameter of interest has various first induced set values and etch induced parameter set-up data relating to measurements of at least one set-up substrate on which the etch induced parameter has various second induced set values. The recipe is determined so as to minimize the effect of the etch induced parameter on measurement of the parameter of interest.