公开(公告)号：EP3534211A1

公开(公告)日：2019-09-04

申请号：EP18159656.0

申请日：2018-03-02

Applicant: ASML Netherlands B.V.

Inventor： DE JAGER, Pieter, Willem, Herman ,  WUISTER, Sander, Frederik ,  VAN LARE, Marie-Claire ,  MAAS, Ruben, Cornelis ,  POLYAKOV, Alexey, Olegovich

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/20

Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100nm during an atomic layer deposition process. The irradiation locally drives the atomic layer deposition process in the selected region and thereby causes the atomic layer deposition process to form a layer of material in a pattern defined by the selected portion.