公开(公告)号：JP2008072100A

公开(公告)日：2008-03-27

申请号：JP2007212516

申请日：2007-08-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F7/70758

Abstract: PROBLEM TO BE SOLVED: To improve the position measuring accuracy of a lithography device. SOLUTION: A stage system for the lithography equipment is provided. The stage system includes a movable stage and a still motor coil assembly including a coil, and the coil forms a moving magnetic motor for interacting with the magnet of the movable stage and driving the movable stage. The stage system further includes a position measuring system for measuring the position within an operation area of the movable stage, and the position measuring system moves a measuring beam along a measuring beam path extending toward the movable stage at the upper part of a part of the motor coil assembly. The coil assembly includes a coil assembly path between motor coils for driving a motor, and the coil assembly path extends at the lower part of the measuring beam path. The movable stage can include a substrate stage or a reticle stage. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提高光刻设备的位置测量精度。

解决方案：提供了一种用于光刻设备的平台系统。 舞台系统包括可移动台和包括线圈的静止马达线圈组件，线圈形成用于与可移动台的磁体相互作用并驱动可移动台的移动磁马达。 舞台系统还包括位置测量系统，用于测量可移动舞台的操作区域内的位置，并且位置测量系统沿测量光束移动测量光束，该测量光束沿着可移动舞台的一部分的上部延伸 电机线圈组件。 线圈组件包括用于驱动马达的马达线圈之间的线圈组合路径，并且线圈组件路径在测量光束路径的下部延伸。 可移动台可以包括衬底台或掩模版台。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008028392A

公开(公告)日：2008-02-07

申请号：JP2007185824

申请日：2007-07-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN ,  SIMONS WILHELMUS FRANCISCUS JO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide an improved controlling system for a lithographic apparatus and the lithographic apparatus having the same. SOLUTION: A controlling system for controlling a position parameter of a stage in a lithographic apparatus has a stage controller for controlling at least a position parameter of a stage at least in a first direction. The controlling system has a disturbance torque estimator for estimating a disturbance torque on a stage around an axis line extended in a second direction which is substantially orthogonal to the first direction. The controlling system has a correcting signal calculator to which the estimated disturbance torque and a signal which represents a position of a stage extended in a third direction which is substantially orthogonal to the first and second directions are provided. The correcting signal calculator determines a feed forward correcting signal for correcting a position error of the stage extended in the first direction caused by the disturbance torque. The feed forward correcting signal is provided to the stage. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于光刻设备和具有该光刻设备的光刻设备的改进的控制系统。 解决方案：用于控制光刻设备中的台的位置参数的控制系统具有级控制器，用于至少在第一方向上至少控制平台的位置参数。 所述控制系统具有干扰转矩估计器，用于估计在与所述第一方向基本正交的第二方向上延伸的轴线周围的台上的扰动转矩。 控制系统具有校正信号计算器，所述校正信号计算器提供估计的干扰转矩和表示在与第一和第二方向基本正交的第三方向上延伸的平台的位置的信号。 校正信号计算器确定用于校正由干扰转矩引起的在第一方向上延伸的级的位置误差的前馈校正信号。 前馈校正信号被提供给舞台。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006310849A

公开(公告)日：2006-11-09

申请号：JP2006118781

申请日：2006-04-24

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS

IPC: H01L21/027 ,  G05B11/32 ,  G05D3/00

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment having reduced a relative position error between a first movable part and a second movable part, a position amount controller, and a control method.
SOLUTION: The lithography equipment comprises a first movable element and a first control system for controlling the position amount of the first movable element. Further, the lithography equipment comprises a second movable element and a second control system for controlling the position amount of the second movable element. In order to reduce a tracking error, that is, a relative error between the first movable part and the second movable part, a feed forward table is provided as comprising feed forward table programming for generating a feed forward signal in synchronization with a set value signal to be provided to the first and second control systems. In order to correct the position amount of the first movable element to reduce the relative error between the position amount of the first movable element and the position amount of the second movable element, a feed forward is provided to the first control system.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供减小第一可移动部件和第二可移动部件之间的相对位置误差的光刻设备，位置量控制器和控制方法。 解决方案：光刻设备包括第一可移动元件和用于控制第一可移动元件的位置量的第一控制系统。 此外，光刻设备包括用于控制第二可移动元件的位置量的第二可移动元件和第二控制系统。 为了减少跟踪误差，即第一可移动部件和第二可移动部件之间的相对误差，提供了前馈台，其包括用于与设定值信号同步产生前馈信号的前馈表编程 被提供给第一和第二控制系统。 为了校正第一可移动元件的位置量以减小第一可移动元件的位置量与第二可移动元件的位置量之间的相对误差，向第一控制系统提供前馈。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2003068640A

公开(公告)日：2003-03-07

申请号：JP2002208919

申请日：2002-06-13

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BUTLER HANS

IPC: G03F7/20 ,  H01L21/027 ,  H02P5/00 ,  H02P7/67

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To obtain a lithographic projection apparatus, having a lower MSD value and MA value by improving synchronization. SOLUTION: The lithographic projection apparatus comprises a data storage means 35 for reading disturbance compensation force from the storage means in response to a signal, representing the position of one of first and second object tables MT and WT and a processing means 37 for generating a force adjustment signal, in response to the disturbance compensation force for adjusting the force exerted by drive means PS1 and PS2 on the object table.

Abstract translation: 要解决的问题：通过改善同步来获得具有较低MSD值和MA值的光刻投影装置。 解决方案：光刻投影装置包括数据存储装置35，用于响应于表示第一和第二物体表MT和WT中的一个的位置的信号从存储装置读取扰动补偿力和用于产生力的处理装置37 响应于用于调节由驱动装置PS1和PS2施加在对象台上的力的扰动补偿力的调节信号。

公开(公告)号：JP2012114435A

公开(公告)日：2012-06-14

申请号：JP2011249222

申请日：2011-11-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  COX HENRIKUS HERMAN MARIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03B27/53 ,  G03B27/58 ,  G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide an improved positioning system for an upper part component and a lower part component (e.g. a support structure for patterning means and a substrate table) of a lithographic apparatus.SOLUTION: In the positioning system for controlling a relative position between the upper part component and the lower part component of the lithographic apparatus, a position of each component is defined by a set of orthogonal coordinates. The positioning system includes: a measuring device configured to determine an error in a momentary position of one of the components with respect to a set value position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error. The measurement coordinate is different from the control coordinate.

Abstract translation: 要解决的问题：为了提供一种用于光刻设备的上部件和下部件（例如图案形成装置的支撑结构和基板台）的改进的定位系统。 解决方案：在用于控制光刻设备的上部件和下部件之间的相对位置的定位系统中，每个部件的位置由一组正交坐标限定。 定位系统包括：测量装置，被配置为相对于测量坐标中的设定值位置确定其中一个部件的瞬时位置的误差; 以及控制器，其被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动。 测量坐标与控制坐标不同。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012094864A

公开(公告)日：2012-05-17

申请号：JP2011230460

申请日：2011-10-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  OUDE NIJHUIS MARCO HENDRIKUS HERMANUS

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/709 ,  G03F7/70833 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus having an improved imaging performance.SOLUTION: A lithographic apparatus includes: a support frame which is supported by a base via a vibration isolation system; a projection system configured to transfer a pattern from a patterning device onto a substrate, and including a first frame which is spring-supported by the support frame; and an active damping system configured to damp movement of the first frame, and including a first sensor system configured to provide a first sensor output representative of absolute movement of the first frame, a first actuator system arranged to apply a force between the first frame and the support frame, and a control system configured to provide a drive signal to the first actuator system based on the first sensor output.

Abstract translation: 要解决的问题：提供具有改进的成像性能的装置。 解决方案：光刻设备包括：支撑框架，其经由隔振系统由基座支撑; 投影系统，被配置为将图案从图案形成装置传送到基板上，并且包括由支撑框架弹簧支撑的第一框架; 以及主动阻尼系统，其被配置为阻止所述第一框架的运动，并且包括构造成提供表示所述第一框架的绝对运动的第一传感器输出的第一传感器系统;布置成在所述第一框架和所述第一框架之间施加力的第一致动器系统 支撑框架和被配置为基于第一传感器输出向第一致动器系统提供驱动信号的控制系统。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010016369A

公开(公告)日：2010-01-21

申请号：JP2009139706

申请日：2009-06-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DUIJNHOVEN MARTINUS ,  VAN DER WIJST MARC WILHELMUS MARIA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03B27/54 ,  G03B27/62 ,  G03F7/70716 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide an efficient feed forward compensation mechanism for compensating pressure pulses caused by movements of an object of a device in relation to a metrology frame. SOLUTION: A lithographic apparatus including: a projection system; a metrology frame MF supported by a vibration isolation support device ISD; a movable object WT; and a displacement determining unit to determine positions, speeds and/or accelerations of the object WT in relation to the metrology frame MF and/or a projection system. At least one actuator F is provided for applying correcting forces and/or torques on the metrology frame MF, and a controller C is provided which is configured to calculate the correcting forces and/or torques to be applied to the metrology frame MF on the basis of the determined positions, speeds and/or accelerations of the object WT in order to compensate pressure pulses exerted on the metrology frame MF caused by movements of the object WT in relation to the metrology frame MF. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效的前馈补偿机构，用于补偿由相对于计量框架的装置的物体的移动引起的压力脉冲。 解决方案：一种光刻设备，包括：投影系统; 由振动隔离支撑装置ISD支撑的计量框架MF; 可移动物体WT; 以及位移确定单元，用于确定对象WT相对于度量框架MF和/或投影系统的位置，速度和/或加速度。 提供至少一个致动器F用于在计量框架MF上施加校正力和/或扭矩，并且提供控制器C，该控制器被配置为基于基础计算施加到计量框架MF的校正力和/或扭矩 的物体WT的确定位置，速度和/或加速度，以便补偿由对象WT相对于计量帧MF的移动而施加在计量框架MF上的压力脉冲。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009152597A

公开(公告)日：2009-07-09

申请号：JP2008318049

申请日：2008-12-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  GEERKE JOHAN HENDRIK ,  HEMPENIUS PETER PAUL ,  DE VOS YOUSSEF KAREL MARIA ,  DE PEE JOOST ,  BEIJERS CLEMENTIUS ANDREAS JOH ,  ROOZEN NICOLAAS BERNARDUS ,  VAN DEN BOOGAERT ERWIN ANTONIU ,  OUDE NIJHUIS MARCO HENDRIKUS H ,  DEBIESME FRANCOIS XAVIER

IPC: H01L21/027 ,  F16F15/02

CPC classification number: G10K11/178 ,  G03B27/42 ,  G03F7/709 ,  G10K2210/129

Abstract: PROBLEM TO BE SOLVED: To reduce an influence of vibrations in a lithographic apparatus.
SOLUTION: A lithographic apparatus transfers a pattern from a patterning device onto a substrate. This lithographic apparatus includes an acoustic sensor which measures first acoustic vibrations in a sensor measurement region of the lithographic apparatus. An actuator is provided at least in a region within the lithographic apparatus in order to generate second acoustic vibrations. Furthermore, a control device is provided which has a sensor input part for receiving a sensor signal of the acoustic sensor and an actuator output part for giving an actuator driving signal to the actuator. The control device drives the actuator so that the second acoustic vibrations cancel the first acoustic vibrations at least partially in the region.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：减少光刻设备中振动的影响。 解决方案：光刻设备将图案从图案形成装置传送到基板上。 该光刻设备包括测量光刻设备的传感器测量区域中的第一声振动的声传感器。 致动器至少设置在光刻设备内的区域中，以产生第二声振动。 此外，提供了一种控制装置，其具有用于接收声传感器的传感器信号的传感器输入部分和用于向致动器提供致动器驱动信号的致动器输出部分。 控制装置驱动致动器，使得第二声振动至少部分地在该区域中抵消第一声振动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009147300A

公开(公告)日：2009-07-02

申请号：JP2008256544

申请日：2008-10-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS M ,  DE HOON CORNELIUS ADRIANUS LAM

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/709 ,  G05D19/02

Abstract: PROBLEM TO BE SOLVED: To provide a stable control system for controlling the position or position related quantity such as the speed or acceleration of an object, especially a stable active damping system. SOLUTION: A control system for controlling the position or position related quantity of an object includes: a measuring system for measuring the position or position related quantity of the object; a controller for supplying control signals on the basis of the measured position or position related quantity; and an actuator for actuating the object on the basis of the control signal. The control system further includes at least one filter unit for filtering the measured position or position related quantity. At least one filter unit is a partial order filter unit. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供用于控制位置或位置相关量的稳定控制系统，例如物体的速度或加速度，特别是稳定的主动阻尼系统。 解决方案：用于控制物体的位置或位置相关量的控制系统包括：用于测量物体的位置或位置相关量的测量系统; 控制器，用于根据所测量的位置或位置相关量提供控制信号; 以及用于基于控制信号致动物体的致动器。 控制系统还包括至少一个用于过滤测量位置或位置相关量的过滤器单元。 至少一个滤波器单元是部分阶滤波器单元。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008060563A

公开(公告)日：2008-03-13

申请号：JP2007212517

申请日：2007-08-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: H02P5/46 ,  G03F7/70725 ,  G03F7/70758 ,  H02P25/08

Abstract: PROBLEM TO BE SOLVED: To provide a method for controlling a short stroke module in a lithography equipment substrate stage or a reticle stage. SOLUTION: A movable object is operated at a first degree of freedom. Step (a) makes a first motor assembly including at least one motor of first type or a plurality of motors and a second motor assembly including at least one motor of second type or a plurality of motors and enables each of the first and second motor assemblies to move the movable object at the first degree of freedom; step (b) supplies a feed forward signal from a feed forward unit to the first motor assembly based on the feed forward reference signal; and step (c) supplies a position control signal from a position control unit to the second motor assembly based on the position control reference signal. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于控制光刻设备基板台或标线片台中的短行程模块的方法。 解决方案：可移动物体以第一自由度运行。 步骤（a）制造包括至少一个第一类型的电动机或多个电动机的第一电动机组件和包括至少一个第二类型的电动机或多个电动机的第二电动机组件，并且使第一和第二电动机组件 以第一自由度移动可移动物体; 步骤（b）基于前馈参考信号将来自前馈单元的前馈信号提供给第一电动机组件; 并且步骤（c）基于位置控制参考信号将位置控制信号从位置控制单元提供给第二电动机组件。 版权所有（C）2008，JPO＆INPIT