公开(公告)号：JP2010147470A

公开(公告)日：2010-07-01

申请号：JP2009281091

申请日：2009-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERMEULEN JOHANNES PETRUS MARTINUS ,  MARCEL KOENRAAD MARIE BAGGEN ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  VAN EIJK JAN ,  JEUNINK ANDRE BERNARDUS ,  KEMPER NICOLAAS R ,  MUNNIG SCHMIDT ROBERT-HAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VAN DER WIJST MARC WILHELMUS MARIA ,  CADEE THEODORUS PETRUS MARIA ,  FRANSICUS MATHIJS JACOBS ,  VALENTIN CHRISTIAAN LOUIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/42 ,  G03F7/707 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a patterning device support that leads to improvement in overlays. SOLUTION: Lithographic apparatus includes a position controller for selectively pressurizing, at least one of sides of a patterning device M to control the position of the patterning device M in its planar direction. The position controller includes a gas supply section and one or a plurality of outflow openings directed to the side of the gas pressure supply section, to apply a pressurized gas to at least one side of the patterning device to control the position of the patterning device, in its planar direction in a non-contact manner. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供导致覆盖层改进的图案形成装置支撑件。 解决方案：平版印刷设备包括位置控制器，用于选择性地加压图案形成装置M的至少一个边以控制图案形成装置M在其平面方向上的位置。 位置控制器包括气体供给部和指向气体压力供应部侧的一个或多个流出开口，以将加压气体施加到图案形成装置的至少一侧，以控制图案形成装置的位置， 在其平面方向上以非接触方式。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009111415A

公开(公告)日：2009-05-21

申请号：JP2009001028

申请日：2009-01-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  F16F6/00 ,  F16F15/00 ,  F16F15/03 ,  G03F7/709 ,  H01J37/3056

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which replacement of the substrate is attainable, while still meeting the conditions with regard to the NA number and/or meeting good purging conditions. SOLUTION: The apparatus includes a substrate support WT constructed to support the substrate, a projection system PS configured to project a patterned radiation beam onto a target portion of the substrate, and a frame onto which at least a part of the projection system is mounted. A fluid provider FP is arranged to provide a fluid between the substrate W and a downstream end of the projection system. The apparatus also includes an actuator AC that is associated with the frame and with the fluid provider and arranged to position the fluid provider, and a cushion system for cushioning vibrational forces when the actuator positions the fluid provider. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以在不影响NA数量和/或满足良好吹扫条件的条件下能够更换基板的光刻投影设备。 解决方案：该装置包括构造成支撑衬底的衬底支撑件WT，配置成将图案化的辐射束投影到衬底的目标部分上的投影系统PS以及框架，投影系统的至少一部分 被安装。 流体提供器FP布置成在基板W和投影系统的下游端之间提供流体。 该装置还包括致动器AC，该致动器AC与框架和流体供应器相关联并且被布置成定位流体提供者;以及缓冲系统，用于当致动器定位流体提供者时缓冲振动力。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2012182450A

公开(公告)日：2012-09-20

申请号：JP2012036033

申请日：2012-02-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  LAFARRE RAYMOND WILHELMUS LOUIS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  Y10T29/494 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus in which the possibility of containing bubbles is reduced at least partially, and/or the thermal load due to vaporization is reduced at least partially.SOLUTION: A fluid handling structure is configured to supply an immersion liquid to a space defined between a projection system and a counter surface facing the fluid handling structure. The fluid handling structure comprises a main body having a lower surface, a movable member which is movable for the main body, and a self-adjustment mechanism for maintaining a clearance of a specific size between the bottom surface of the movable member and the counter surface, regardless of the size of the clearance between the lower surface and the counter surface.

Abstract translation: 要解决的问题：提供其中至少部分地减少含有气泡的可能性的光刻设备，和/或至少部分地减少由于汽化引起的热负荷。 解决方案：流体处理结构构造成将浸没液体供应到在投影系统和面向流体处理结构的对置表面之间限定的空间中。 流体处理结构包括具有下表面的主体，可移动用于主体的可动构件，以及用于在可动构件的底面与对置面之间保持特定尺寸的间隙的自调节机构 ，而与下表面和对置表面之间的间隙的大小无关。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011072184A

公开(公告)日：2011-04-07

申请号：JP2010206325

申请日：2010-09-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HOL SVEN ANTOIN JOHAN ,  DE GROOT ANTONIUS FRANCISCUS JOHANNES ,  CADEE THEODORUS PETRUS MARIA ,  KESSELS MARIJN ,  HOBBELEN DANIEL GODFRIED EMMA

IPC: H02K33/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70758 ,  H02K1/146 ,  H02K41/03 ,  H02K2201/18 ,  H02K2213/12

Abstract: PROBLEM TO BE SOLVED: To provide an actuator for exerting a force and a torque on an object. SOLUTION: The actuator includes a first part that is movable with respect to a second part of the actuator in at least a first degree of freedom. The object is mounted to the first part. One of these parts is provided with a first electrical coil that is arranged to cooperate with a magnetizable portion of the other part. A controller of the actuator is configured to generate a first electrical current through the first electrical coil for generating a force between these parts. The one of these parts is provided with a second electrical coil which is arranged to cooperate with a magnetizable portion of the other part, and the controller is further configured to generate a second electrical current through the second coil and the first electrical current through the first electrical coil for exerting the force and torque between these parts. Therefore, the actuator is configured to exert the force and the torque on the object with respect to the second part. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供用于在物体上施加力和扭矩的致动器。 解决方案：致动器包括能够以至少第一自由度相对于致动器的第二部分移动的第一部件。 物体安装到第一部分。 这些部件中的一个设置有第一电线圈，其布置成与另一部分的可磁化部分配合。 致动器的控制器被配置为产生通过第一电线圈的第一电流，以在这些部件之间产生力。 这些部件中的一个设置有第二电线圈，其布置成与另一部分的可磁化部分配合，并且控制器还被配置为产生通过第二线圈的第二电流和通过第一线圈的第一电流 用于在这些部件之间施加力和扭矩的电线圈。 因此，致动器构造成相对于第二部分施加力和扭矩对物体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010147506A

公开(公告)日：2010-07-01

申请号：JP2010059515

申请日：2010-03-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MATHEUS ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G02B21/00 ,  G02B21/26 ,  G02B21/30

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus to which countermeasures are applied for suppressing influence of pressure variation of a conditioning fluid on a substrate table. SOLUTION: This lithographic apparatus is disclosed that projects a pattern from a patterning device onto a substrate. The lithographic apparatus includes a substrate table configured to hold a substrate. The substrate table includes a conditioning system configured to hold a conditioning fluid and to condition the substrate table. The conditioning system includes a pressure damper that is in fluid communication with the conditioning system and suppresses a pressure variation in the conditioning system. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中应用了对策来抑制调理流体对基片台的压力变化的影响。 解决方案：公开了将图案形成装置的图案投影到基板上的该光刻设备。 光刻设备包括被配置为保持基板的基板台。 衬底台包括配置成保持调理流体并调节衬底台的调节系统。 调节系统包括与调节系统流体连通并抑制调节系统中的压力变化的压力调节器。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006165575A

公开(公告)日：2006-06-22

申请号：JP2005353278

申请日：2005-12-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： CADEE THEODORUS PETRUS MARIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  F16F6/00 ,  F16F15/00 ,  F16F15/03 ,  G03F7/709 ,  H01J37/3056

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection equipment which enables the replacement of a substrate while satisfying the condition about NA number and/or the purge condition. SOLUTION: The equipment comprises a substrate support WT which is assembled so as to support the substrate, a projection system PS which is constituted so as to project a patterned radiation beam on a target part of the substrate, and a frame to which at least part of the projection system is attached. A fluid feeding device FP is constituted so as to feed a fluid between the substrate W and a downstream edge of the projection system. The equipment also comprises an actuator AC which is constituted so as to be associated with the frame and the fluid feeding device and position the fluid feeding device, and a buffer system which alleviates vibration power when the actuator positions the fluid feeding device. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种能够在满足关于NA号和/或吹扫条件的条件的同时更换基板的光刻投影设备。 解决方案：设备包括被组装以支撑基板的基板支撑件WT，被构造成将图案化的辐射束投影到基板的目标部分上的投影系统PS，以及框架，框架 投影系统的至少一部分被连接。 流体供给装置FP构成为在基板W与投影系统的下游边缘之间输送流体。 该设备还包括致动器AC，其构造成与框架和流体供给装置相关联并定位流体供给装置，以及缓冲系统，其在致动器定位流体供给装置时减轻振动功率。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006054468A

公开(公告)日：2006-02-23

申请号：JP2005233909

申请日：2005-08-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing lithographic errors caused by immersion liquid. SOLUTION: A lithography apparatus comprises an illumination system so constituted as to control a radiation beam, a support so constituted as to support a pattern forming device which imparts patterns on a crosssection of the radiation beam to form a patternized radiation beam, a substrate table so constituted as to hold a substrate, a projection system so constituted as to project the patternized radiation beam on the target of the substrate, a liquid supply system so constituted as to fill at least part of a space between a final element of the projection system and the substrate with the liquid, a sealing member so disposed as to substantially enclose the liquid inside the space between the final element of the projection system and the substrate, and an element for controlling and/or compensate evaporation of the immersion liquid from the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种减少浸没液引起的平版印刷误差的系统。 解决方案：光刻设备包括照明系统，其被构造成控制辐射束，支撑件被构造成支撑图案形成装置，其在辐射束的横截面上施加图案以形成图案化的辐射束， 衬底台，其被构造成保持衬底;投影系统，其被构造成将图案化的辐射束投射到衬底的靶上;液体供应系统，其被构造成填充所述衬底的最终元件之间的至少一部分空间; 投影系统和具有液体的基板，密封构件，其被设置为基本上将液体包围在投影系统的最终元件和基板之间的空间内，以及用于控制和/或补偿浸没液体的蒸发的元件 底物。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005064514A

公开(公告)日：2005-03-10

申请号：JP2004234445

申请日：2004-08-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VINK JACOB WILLEM ,  DONDERS SJOERD NICOLAAS LAMBER ,  MODDERMAN THEODORUS MARINUS ,  CADEE THEODORUS PETRUS MARIA

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70783 ,  G03F7/70925 ,  G03F7/70975

Abstract: PROBLEM TO BE SOLVED: To provide an improvement of lithography projection equipment to offset the influence of irregularity of projection on a supporting table, and a method of operating the equipment like that. SOLUTION: Height adjusting equipment equalizes the height of the projection by adding and/or removing material to/from abnormal projection in such a way that a detector detects which projection has an abnormal height in accordance with the grade of its abnormality under the control of a control unit. Since this work is executed in the actual working condition of the projection equipment, the irregularity generated by assembly can be removed. This method can be applied to the support of not only a substrate but also a mask or the like. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻投影设备的改进以抵消投影不平坦对支撑台的影响，以及如此操作设备的方法。

解决方案：高度调节设备通过向异常投影添加和/或移除材料来均衡突起的高度，使得检测器根据其异常的等级根据其异常等级检测哪个突起具有异常高度 控制单元的控制。 由于这种工作是在投影设备的实际工作状态下执行的，因此可以消除组装产生的不规则现象。 该方法不仅可以应用于基板的支撑，还可以应用于掩模等。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2013135218A

公开(公告)日：2013-07-08

申请号：JP2012259504

申请日：2012-11-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  ZAAL KOEN JACOBUS J M ,  HARMEET SINGH

IPC: H01L21/027

CPC classification number: G03B27/58 ,  G03F7/2051 ,  G03F7/707 ,  G03F7/70708 ,  H01L21/683

Abstract: PROBLEM TO BE SOLVED: To provide a support in which measures are taken to improve flatness of an object such as a semiconductor substrate.SOLUTION: The support for the object includes a main body having a surface having a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relatively to the main body at least in a direction in a plane parallel to a main surface of the object.

Abstract translation: 要解决的问题：提供一种支撑件，其中采取措施来改善诸如半导体基板的物体的平坦度。解决方案：对象的支撑件包括具有多个突起的表面的主体。 每个突起具有相关联的静电致动器，用于至少沿平行于物体的主表面的平面中的方向相对于主体移动相关联的突起的自由端。

公开(公告)号：JP2012191177A

公开(公告)日：2012-10-04

申请号：JP2012027626

申请日：2012-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY ,  BEEMS MARCEL HENDRIKUS MARIA ,  CADEE THEODORUS PETRUS MARIA ,  LAFARRE RAYMOND WILHELMUS LOUIS

IPC: H01L21/027 ,  G03F9/00

CPC classification number: G01B11/14 ,  G01B11/00 ,  G02B21/0048 ,  G02B26/105 ,  G03F7/70625 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To enable accurate measurement without degrading throughput of an alignment sensor.SOLUTION: A measurement optical system comprises an illumination subsystem for illuminating a mark 202 with a radiation spot and a detecting subsystem 580 for detecting radiation diffracted by the mark. A substrate and the measurement optical system move relatively to each other at a first velocity (v) so as to scan the mark while synchronously moving the radiation spot relatively to the reference frame of the measurement optical system at a second velocity (v). The spot scans the mark at a third velocity (v) which is lower than the first velocity to allow more time for accurate position measurements to be acquired. An objective lens 524 remains fixed in relation to the reference frame while a moving optical element 562 imparts the movement of the radiation spot relative to the reference frame.

Abstract translation: 要解决的问题：使得能够精确测量而不降低对准传感器的生产量。 解决方案：测量光学系统包括用于用辐射点照射标记202的照明子系统和用于检测由标记衍射的辐射的检测子系统580。 基板和测量光学系统以第一速度（v W ）彼此相对移动，以便在相对于参考系的参考系同步移动辐射点的同时扫描标记 测量光学系统处于第二速度（v SPOT ）。 该点以比第一速度低的第三速度（v EFF ）扫描标记，以允许更多时间获取准确的位置测量。 物镜524相对于参考框架保持固定，而移动的光学元件562相对于参考框架传递辐射点的移动。 版权所有（C）2013，JPO＆INPIT