公开(公告)号：JP2005244239A

公开(公告)日：2005-09-08

申请号：JP2005050847

申请日：2005-02-25

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DE JAGER PIETER WILLEM HERMAN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70283 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide lithography apparatus and a method for manufacturing a device. SOLUTION: A diffracted light MEMS (Micro Electro-mechanical System) device comprises a plurality of parallel planar reflecting surfaces and an actuator system. In order to change the characteristics (for example, the phase, the intensity, etc.) of the light that interacts with the diffracted light MEMS device, the position of each of the planar reflectors is adjusted so as to be in a direction perpendicular to the planar reflectors by using the actuator system. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备及其制造方法。 解决方案：衍射光MEMS（微机电系统）装置包括多个平行的平面反射表面和致动器系统。 为了改变与衍射光MEMS器件相互作用的光的特性（例如，相位，强度等），每个平面反射器的位置被调节成与垂直于 通过使用致动器系统的平面反射器。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2009260362A

公开(公告)日：2009-11-05

申请号：JP2009139843

申请日：2009-06-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JAGER PIETER WILLEM HERMAN

IPC: H01L21/027

CPC classification number: G03F7/70275

Abstract: PROBLEM TO BE SOLVED: To provide a maskless lithography system capable of increasing a throughput. SOLUTION: This lithographic apparatus has a plurality of columns 25 comprising an illumination system, an array of individually controllable elements for imparting a pattern to the cross section of each beam, a substrate table for supporting a substrate, and a projection system for projecting the patterned beams onto the substrate. A displacement system causes relative displacement between the substrate 22 and the columns so that the projection beams are scanned over a prescribed scanning direction. Each projection system includes an array of lenses. The projection system is disposed in groups so that the lenses in the arrays of various groups direct a portion of various beams to various areas of the substrate that are aligned in the scanning direction. The groups of the projection system are spaced apart in the scanning direction, and each group directs the beams to target areas that are continuous and occupy individual continuous sections of the substrate. The various sections of the substrate are exposed by the various groups of the projection system, and a high throughput can be thereby obtained. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供能够提高吞吐量的无掩模光刻系统。 解决方案：该光刻设备具有多个列25，其包括照明系统，用于向每个光束的横截面赋予图案的独立可控元件的阵列，用于支撑基板的基板台，以及用于 将图案化的光束投影到衬底上。 位移系统引起基板22和列之间的相对位移，使得投影光束在规定的扫描方向上扫描。 每个投影系统包括一组透镜。 投影系统被分组地布置，使得各种组的阵列中的透镜将各种光束的一部分引导到在扫描方向上对齐的基板的各个区域。 投影系统的组在扫描方向上间隔开，并且每个组将光束引导到连续的目标区域并且占据基板的各个连续部分。 基板的各部分被投影系统的各组曝光，从而可以获得高通量。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006148123A

公开(公告)日：2006-06-08

申请号：JP2005335740

申请日：2005-11-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DE JAGER PIETER WILLEM HERMAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70275

Abstract: PROBLEM TO BE SOLVED: To provide a maskless lithography apparatus which can increase its processing amount.
SOLUTION: A moving system moves relatively a substrate 114 and a projection system 108 such that projection beams 110 are scanned over the substrate 114 in a prescribed scanning direction. The projection system 108 contains a lens array 104 so disposed that each lens in the lens array 104 guides each beam to a target region of the substrate 114. In the projection system 108, the lenses are disposed in groups such that lenses in various groups in the array 104 guide a part of the beams to respective various regions of the substrate 114 arranged in the scanning direction. The groups of the projection system are spaced in the scanning direction, formed consecutively, and guide the beams to the target regions occupying respective continuing sections of the substrate 114. Thus, various sections of the substrate 114 are exposed through the various groups of the projection system 108, whereby a high processing amount is obtained in a relatively slow substrate moving speed and a relatively small substrate movement.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种可以增加其处理量的无掩模光刻设备。 解决方案：移动系统相对移动基板114和投影系统108，使得投影光束110在规定的扫描方向上在基板114上扫描。 投影系统108包括透镜阵列104，其设置成使得透镜阵列104中的每个透镜将每个光束引导到基板114的目标区域。在投影系统108中，透镜被分组地布置，使得各组中的透镜 阵列104将一部分光束引导到在扫描方向上布置的基板114的各个各个区域。 投影系统的组在扫描方向上间隔开，连续形成，并且将光束引导到占据基板114的相应连续部分的目标区域。因此，基板114的各个部分通过各种投影组 系统108，由此在相对较慢的衬底移动速度和相对较小的衬底移动中获得高处理量。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006018286A

公开(公告)日：2006-01-19

申请号：JP2005189555

申请日：2005-06-29

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DE JAGER PIETER WILLEM HERMAN ,  GUI CHENG-QUN ,  SPIT PETER ,  HOEBERICHTS EDUARD

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70275 ,  G03F7/70291 ,  G03F7/70916 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method for preventing or substantially decreasing damages on a lens by contaminant.
SOLUTION: A projection system 108 comprises an array of lenses located at a spacing from a substrate 114 such that each lens in the array focuses a respective part of a patterned beam onto the substrate 114. A displacement system causes relative displacement between the lens array and the substrate. A particle detector is positioned to detect particles on the substrate which are approaching the lens array as a result of relative displacement between the lens array and the substrate. A free working distance control system is arranged to increase the spacing between the lens array and the substrate in response to detection of a particle by the detector such that the lens array is moved away from the substrate as relative displacement causes the detected particle to pass the lens array. Thus, damage to the lens array as a result of, for example, scratching by particles on the substrate surface can be avoided.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于防止或基本上减少污染物对镜片的损伤的光刻设备和方法。

解决方案：投影系统108包括位于与衬底114间隔的透镜阵列，使得阵列中的每个透镜将图案化束的相应部分聚焦到衬底114上。位移系统引起在衬底114之间的相对位移 透镜阵列和基板。 定位粒子检测器以检测由于透镜阵列和基底之间的相对位移而正在接近透镜阵列的基底上的颗粒。 布置一个自由的工作距离控制系统，以响应于由检测器检测到颗粒而增加透镜阵列和基板之间的间隔，使得透镜阵列相对于基板移动离开基板，因为相对位移导致检测到的颗粒通过 镜头阵列 因此，可以避免由于例如由基板表面上的颗粒划伤而导致的透镜阵列的损坏。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005354050A

公开(公告)日：2005-12-22

申请号：JP2005153230

申请日：2005-05-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DE JAGER PIETER WILLEM HERMAN ,  GUI CHENG-QUN ,  BIJNEN FRANSISCUS GODEFRIDUS C ,  JOHAN CHRISTIAAN GERARD HOEFNA ,  JOANNES THEODOOR DE SMIT

IPC: G01B11/00 ,  G01B11/14 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70275 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide an optical position evaluating device and method, having a lighting system supplying alignment beams of radiation and leading out positional data from the reflection of the alignment beams. SOLUTION: A substrate is supported on a substrate table, and a projection system is used to project an alignment beam to the target part of the substrate. A positioning system causes relative motion of the substrate and the projection system. An array of lenses has a layout structure such that each lens of the array focuses the individual parts of the alignment beam to the individual parts of the target part. In an array of detectors, each detector of the array detects the light reflected from the substrate, through the individual lenses of the array and provides the output representing the intensity of the light reflected to it from the substrate through the individual lenses. A processor is connected with the output of the detector, in order to lead out the data representing the position of the lens array to the substrate from the output of the detector. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光学位置评估装置和方法，其具有提供对准的辐射束并从对准光束的反射引出位置数据的照明系统。 解决方案：将基板支撑在基板台上，并且使用投影系统将对准光束投影到基板的目标部分。 定位系统引起基板和投影系统的相对运动。 透镜阵列具有布置结构，使得阵列的每个透镜将对准光束的各个部分聚焦到目标部分的各个部分。 在一组检测器中，阵列的每个检测器通过阵列的各个透镜检测从基板反射的光，并且通过各个透镜提供表示从基板反射的光的强度的输出。 处理器与检测器的输出端连接，以便从检测器的输出引出表示透镜阵列到基板的位置的数据。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011059716A

公开(公告)日：2011-03-24

申请号：JP2010274484

申请日：2010-12-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JAGER PIETER WILLEM HERMAN ,  GUI CHENG-QUN ,  KLINKHAMER JACOB FREDRIK FRISO ,  HOEBERICHTS EDUARD

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70475 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70358

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and method for exposing a large-area substrate in a single scan.
SOLUTION: An illumination system supplies beams that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along respective tracks on the substrate. Each track includes a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams. Maximum intensity of each beam directed towards a first portion of the track can be greater than maximum intensity of beam directed towards a second portion of the track, such that the first and second portions of the track are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the overlapped beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在单次扫描中暴露大面积基板的光刻设备和方法。 解决方案：照明系统提供由单独可控元件阵列构图的光束。 图案化的光束通过透镜阵列投射到基板的目标部分上。 阵列中的每个透镜将图案化束的相应部分朝向衬底引导。 位移系统导致基板和梁之间的相对位移，使得沿着预定扫描方向跨过基板扫描光束。 投影系统被定位成使得每个光束沿着衬底上的相应轨道被扫描。 每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠的至少一个第二部分，并被两个梁扫描。 指向轨道的第一部分的每个光束的最大强度可以大于指向轨道的第二部分的光束的最大强度，使得轨道的第一和第二部分暴露于基本上相同的最大强度的辐射 。 相邻光束的这种重叠和重叠光束的强度的调制可以允许不同光学列的光学占位面缝合在一起，以使得能够在单次扫描中暴露大面积的基板。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010093262A

公开(公告)日：2010-04-22

申请号：JP2009233770

申请日：2009-10-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SYSTMA JOOST ,  DE JAGER PIETER WILLEM HERMAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70558 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a system capable of detecting and feeding back the intensities of radiation from a plurality of radiation distribution channels so as to be uniform and compensating for variation of them in lithographic equipment using an array of individually controllable elements.
SOLUTION: In the lithographic equipment, in which each of an individually controllable elements provides a pattern to beam of radiation 6 respectively, then the beam is projected on a substrate 9, a detector 20 for detecting intensities of radiation measures the loss of radiation in a radiation distribution system 7, determines the amount of loss, and feeds back the information to a compensating system. The compensating system compensates the amount of loss, and keeps the intensity of radiation projected on the substrate constant.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够检测和反馈来自多个辐射分布通道的辐射强度的系统，以便在使用单独可控元件的阵列的平版印刷设备中使其均匀并补偿它们的变化 。 解决方案：在光刻设备中，其中每个独立可控元件分别向辐射束6提供图案，然后将光束投影到基板9上，用于检测辐射强度的检测器20测量损失 辐射分布系统7中的辐射确定损失量，并将信息反馈给补偿系统。 补偿系统补偿损失量，并保持投影在基板上的辐射强度恒定。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007180298A

公开(公告)日：2007-07-12

申请号：JP2005377557

申请日：2005-12-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JAGER PIETER WILLEM HERMAN

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device including an illumination system for supplying radiation beams, the array of elements to be individually controlled to pattern the beams, and a projection system for guiding the patterned beams to a substrate supported on a substrate table; and to provide a method therefor.
SOLUTION: As one example, the respective elements to be individually controlled are controlled so as to direct the respective parts of the beams to be separated from the pupil in order to adjust each part of the beams passing a pupil. As another example, the elements to be individually controlled are arranged as some groups so as to allow the radiation to be reflected against the respective elements of one group to be directed toward the same lens of a lens array. As another example, the elements to be individually controlled in one arbitrary group are controlled to allow the patterns given to the beams to be substantially symmetrical relative to the pupil by each group of the elements, and also controlled to direct the radiation in various directions by separation from the pupil.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种包括用于提供辐射束的照明系统的光刻设备，要独立控制以对光束进行图案化的元件阵列，以及用于将图案化的光束引导到支撑在基板上的基板的投影系统 底物台; 并提供一种方法。 解决方案：作为一个示例，控制要单独控制的各个元件，以便将光束的相应部分引导离开光瞳，以便调整通过光瞳的光束的每一部分。 作为另一示例，要单独控制的元件被布置为一些组，以便允许辐射被反射到一组的相应元件以指向透镜阵列的相同透镜。 作为另一示例，控制在一个任意组中被单独控制的元件，以允许给予光束的图案相对于每个元件组的瞳孔基本对称，并且还被控制以通过 与学生分离。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005244238A

公开(公告)日：2005-09-08

申请号：JP2005050816

申请日：2005-02-25

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： GUI CHENG-QUN ,  BRUINSMA ANASTASIUS JACOBUS AN ,  DE JAGER PIETER WILLEM HERMAN ,  VENEMA WILLEM JURRIANUS

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/7025 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70791 ,  G03F7/70816 ,  G03F7/70825 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a configuration for relatively adjusting positions of beams on a substrate, formed into a pattern generated by a light engine with respect to the substrate. SOLUTION: In this configuration, an array of image forming elements for forming the image of a part of the beams formed into a pattern on respective points on the substrate is moved relatively with respect to an array of individually controllable elements for forming beamed into a pattern by giving a pattern. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于相对调节基板上的光束位置的配置，其形成为由光引擎相对于基板产生的图案。 解决方案：在该配置中，用于形成在基板上的各个点上形成为图案的部分光束的图像的图像形成元件阵列相对于用于形成被辐射的单独可控元件的阵列而相对移动 通过给出模式进入模式。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2003282431A

公开(公告)日：2003-10-03

申请号：JP2003064185

申请日：2003-02-03

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： GIJSBERTSEN JOHANNES GERARDUS ,  DE JAGER PIETER WILLEM HERMAN ,  NIJKERK MICHIEL DAVID

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F9/7053

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus where alignment is easy and reliable, and to provide a device-manufacturing method.
SOLUTION: A lithographic projection apparatus has an alignment sensor comprising an electron beam supply source 10 for supplying an electron beam 12 for impinging on an alignment mark 14 on a substrate W, and a back- scattered electron detector 16 for detecting electrons being back-scattered from the alignment marker 14. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种光刻设备，其中对准容易且可靠，并提供器件制造方法。 解决方案：光刻投影装置具有对准传感器，该对准传感器包括用于提供用于撞击基板W上的对准标记14的电子束12的电子束供给源10和用于检测电子的反向散射电子检测器16 对准传感器与投影系统和投影辐射无关，并且是离轴对准传感器。 版权所有（C）2004，JPO