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    Lithographic apparatus and device manufacturing method utilizing substrate stage compensation
    13.
    发明专利
    Lithographic apparatus and device manufacturing method utilizing substrate stage compensation 有权
    利用基板阶段补偿的平面设备和设备制造方法

    公开(公告)号：JP2010109376A

    公开(公告)日：2010-05-13

    申请号：JP2009283880

    申请日：2009-12-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： COX HENRIKUS HERMAN MARIE ,  JACOBS HERNES ,  SCHOOT HARMEN KLAAS VAN DER ,  VOSTERS PETRUS MATTHIJS HENRICUS

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a system and method for expanding the position control bandwidth of a substrate support so as to position a large-mass substrate support of a lithographic apparatus with high accuracy. SOLUTION: The lithographic apparatus has an illumination system for conditioning a radiation beam, and a patterning device support for supporting a patterning device. Furthermore, the lithographic apparatus has: a substrate support for supporting a substrate; a machine frame for supporting the substrate support; a projection system for projecting a patterned beam onto a target part of the substrate; and a substrate support drive for moving the substrate support at least in one direction. The lithographic apparatus can have a reaction mass, a balance mass, and a base frame, and the substrate support drive is formed so as to generate a force, at least in one direction between the substrate support and the reaction mass, the balance mass, or a support frame. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于扩展基板支撑件的位置控制带宽的系统和方法，以便以高精度定位光刻设备的大质量基板支撑。 解决方案：光刻设备具有用于调节辐射束的照明系统和用于支撑图案形成装置的图案形成装置支撑件。 此外，光刻设备具有：用于支撑衬底的衬底支撑件; 用于支撑衬底支撑件的机架; 投影系统，用于将图案化的光束投影到基板的目标部分上; 以及用于至少沿一个方向移动衬底支撑件的衬底支撑驱动器。 光刻设备可以具有反应物料，平衡物质和基底框架，并且基板支撑驱动器形成为在基板支撑件和反应物料之间的至少一个方向上产生力，平衡质量， 或支撑框架。 版权所有（C）2010，JPO＆INPIT

    Substrate handler, lithographic apparatus, and device manufacturing method
    14.
    发明专利
    Substrate handler, lithographic apparatus, and device manufacturing method 有权
    基板处理器，光刻设备和器件制造方法

    公开(公告)号：JP2009302558A

    公开(公告)日：2009-12-24

    申请号：JP2009203315

    申请日：2009-09-03

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER SCHOOT HARMEN KLAAS ,  JACOBS HERNES ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  VOSTERS PETRUS MATTHIJS HENRIC ,  HAZENBERG JOHANNES MARTINUS AN ,  VAN BEUZEKOM AART A

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/677

    CPC classification number: G03F7/70875 ,  G03F7/7075

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate handler, a lithographic apparatus, and a device manufacturing method. SOLUTION: This invention relates to a substrate handler for handling a substrate including a conditioning device for conditioning the substrate. In one embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface wherein the displacing device is configured to displace the substrate during a conditioning process from one conditioning position to one or more other conditioning positions. According to the other embodiment, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler is configured to support the substrate on an air bed during conditioning of the substrate. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供基板处理器，光刻设备和器件制造方法。 解决方案：本发明涉及一种用于处理基板的基板处理器，该基板包括用于调节基板的调节装置。 在一个实施例中，衬底处理器包括移位装置，其配置成在基本上平行于支撑表面的方向上移动衬底，其中移位装置构造成在调节过程中将衬底从一个调节位置移动到一个或多个其它调理位置 。 根据另一实施例，衬底处理器包括用于在衬底处理器的支撑表面上方提供空气床的浮动装置，衬底处理器构造成在衬底调节期间将衬底支撑在空气床上。 版权所有（C）2010，JPO＆INPIT

    Lithographic projection apparatus
    17.
    发明专利
    Lithographic projection apparatus 审中-公开
    LITHOGRAPHIC投影设备

    公开(公告)号：JP2007040537A

    公开(公告)日：2007-02-15

    申请号：JP2006300304

    申请日：2006-11-06

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS HERNES ,  COX HENRIKUS HERMAN MARIE ,  VOSTERS PETRUS MATTHIJS HENRIC

    IPC: F16F15/02 ,  G03F7/20 ,  F16F15/04 ,  G03B7/20 ,  G03B27/42 ,  H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/709 ,  G03F7/70766

    Abstract: PROBLEM TO BE SOLVED: To provide a support means simple in structure, low in cost and usable in a vacuum to support a balance mass for nullifying vibration caused by reaction force when moving a substrate table in a lithographic projection apparatus.
    SOLUTION: The balance mass of the lithographic projection apparatus is supported on a base frame by at least one flexible support element mechanically mounted to the balance mass and the base frame and having at least two pivot points. Since the support element has at least two pivot points, the support means hardly shows resistance to the horizontal motion of the balance mass BM to allow the balance mass BM to freely move in a horizontal direction, and is usable in the vacuum because of not using an air bearing.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种结构简单，成本低且可在真空中使用的支撑装置，以在平板印刷设备中移动基板台时支撑反作用力引起的振动的平衡质量。 解决方案：平版印刷设备的平衡质量通过至少一个机械地安装到平衡块和基座框架并且具有至少两个枢转点的柔性支撑元件支撑在基架上。 由于支撑元件具有至少两个枢转点，支撑装置几乎不显示抵抗平衡块BM的水平运动的阻力，以允许平衡块BM在水平方向上自由移动，并且由于不使用 一个空气轴承。 版权所有（C）2007，JPO＆INPIT

    Substrate handler
    18.
    发明专利
    Substrate handler 有权
    基板处理器

    公开(公告)号：JP2006191092A

    公开(公告)日：2006-07-20

    申请号：JP2005377858

    申请日：2005-12-28

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： JACOBS HERNES ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC

    IPC: H01L21/677 ,  B65G49/06 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate handler which can function more efficiently. SOLUTION: A substrate handler 12 for moving a substrate 8 relative to a substrate table 6 of a lithographic apparatus is adapted to load a substrate 8 the substrate table and to unload the substrate 8 from the substrate table 6 before and after exposure, and comprises at least one support surface or a platform 14 adapted to carry a plurality of the independent substrates 8, 8 simultaneously. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供可以更有效地起作用的基板处理器。 解决方案：用于使基板8相对于光刻设备的基板台6移动的基板处理器12适于将基板8加载到基板台并且在曝光之前和之后从基板台6卸载基板8， 并且包括适于同时承载多个独立基板8,8的至少一个支撑表面或平台14。 版权所有（C）2006，JPO＆NCIPI

    Substrate table, lithographic apparatus, and device manufacturing method
    20.
    发明专利
    Substrate table, lithographic apparatus, and device manufacturing method 有权
    基板，平面设备和器件制造方法

    公开(公告)号：JP2009295979A

    公开(公告)日：2009-12-17

    申请号：JP2009126050

    申请日：2009-05-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MONDT EVA ,  GILISSEN NOUD JAN ,  JACOBS HERNES ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VERMAELEN MARKUS MARTINUS PETR ,  RIEPEN MICHEL

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To disclose a table in which measures are taken to seal between the table and an edge of an object, in use, supported on the table.
    SOLUTION: In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：公开一种表格，其中采用措施来将桌子和使用中的物体的边缘密封在桌子上。 具体而言，在台面上的物体与桌子本身之间形成毛细通道。 在毛细管通道的径向向内的弯液面钉扎特征和/或超压存在使通道中的液体保持在通道中并有助于防止其进一步向内径向前进。 执行该功能的特征可以与围绕对象的构件相关联或形成在其中。 该构件可以与桌子的一部分热分离。 版权所有（C）2010，JPO＆INPIT

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