公开(公告)号：JP2010278475A

公开(公告)日：2010-12-09

申请号：JP2010196374

申请日：2010-09-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS H

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a method of preventing liquid for immersion lithography from relatively deeply entering under a substrate. SOLUTION: A method of helping to prevent liquid reaching under a substrate is disclosed. The method includes steps of: introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate; and helping to keep immersion liquid that is present at the top and edge of the substrate away from the lower surface of the substrate. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止浸没式光刻液体相对深入基底的方法。 公开了一种有助于防止液体到达基底的方法。 该方法包括以下步骤：在衬底的底部边缘处引入气体，使得在衬底的边缘产生缓冲液; 并且有助于保持存在于基板的顶部和边缘处的浸没液体远离基板的下表面。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010091559A

公开(公告)日：2010-04-22

申请号：JP2009220625

申请日：2009-09-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DOOREN LEON ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JONKER WOUTER ANDRIES

IPC: G01N21/35 ,  G03F7/20 ,  H01L21/027

CPC classification number: G01N21/39 ,  G01N21/274 ,  G01N21/314 ,  G01N21/3554 ,  G01N2021/399 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a hygrometry system which has full accuracy and measurement rate and can be used in a specific environment of lithographic application. SOLUTION: The hygrometry system used for applications is an example for lithographic apparatus. This system includes tunable a laser diode, designed so as to emit the measurement radiation beam, with a wavelength of a certain wavelength region. The wavelength region contains the first wavelength, relevant to the absorption peak of the water molecule. Signal processing unit is connected to an emission detector. The signal processing unit is designed so as to measure the intensity of the absorbed measurement radiation beam of the tunable laser diode. Also the signal processing unit is connected to the tunable laser diode so as to obtain wavelength information. The unit is designed so as to detect the extreme value of the measured intensity as a function of wavelength, while calculating the humidity value from the above the detected extreme value. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有完全精度和测量速率并可用于特定光刻应用环境的湿度测量系统。

解决方案：用于应用的湿度测量系统是光刻设备的一个例子。 该系统包括可调谐的激光二极管，被设计成发射具有一定波长区域的波长的测量辐射束。 波长区域包含与水分子的吸收峰相关的第一波长。 信号处理单元连接到发射检测器。 信号处理单元被设计成测量可调激光二极管的吸收的测量辐射束的强度。 信号处理单元也连接到可调激光二极管，以获得波长信息。 该单元的设计是为了检测作为波长的函数的测量强度的极值，同时从上述检测到的极值计算湿度值。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2013038420A

公开(公告)日：2013-02-21

申请号：JP2012169243

申请日：2012-07-31

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KUNNEN JOHAN GERTRUDIS CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  MARTIN HUBEN ,  LAURENT THIBAULT SIMON MATHIEU ,  VAN BOXTEL FRANK JOHANNES JACOBUS ,  SANDER KATHARINA REINIER DERKS ,  LAMBERTUS DONDERS SJOERD NICOLAAS

IPC: H01L21/027 ,  G02B21/26 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/683

Abstract: PROBLEM TO BE SOLVED: To improve compensation of cooling of a substrate due to evaporation of immersion liquid.SOLUTION: A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table. The gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m K) at 298 K.

Abstract translation: 要解决的问题：改善由于浸没液体的蒸发引起的基板冷却补偿。 解决方案：公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体。 由气体处理系统提供的气体在298K时具有大于或等于100mW /（m K）的热导率。版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012191205A

公开(公告)日：2012-10-04

申请号：JP2012047558

申请日：2012-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  OTTENS JOOST JEROEN ,  EUSSEN EMIEL JOZEF MELANIE ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  WILLIAM PETER VAN DRENT ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  ERIK WILLEM BOGAART

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a position measurement system for accurately measuring a substrate table position.SOLUTION: The lithographic apparatus comprises: a substrate table position measurement system for measuring a substrate table position; and a projection system position measurement system for measuring a projection system position. The substrate table position measurement system comprises: a substrate table reference element mounted on the substrate table; and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to a holding plane of a substrate on the substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

Abstract translation: 要解决的问题：提供一种包括用于精确测量衬底台位置的位置测量系统的光刻设备。 光刻设备包括：用于测量衬底台位置的衬底台位置测量系统; 以及用于测量投影系统位置的投影系统位置测量系统。 衬底台位置测量系统包括：安装在衬底台上的衬底台参考元件; 和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012114469A

公开(公告)日：2012-06-14

申请号：JP2012055739

申请日：2012-03-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG FREDERIK E ,  BEEMS MARCEL HENDRIKUS MARIA ,  VAN DEN BRINK MARINUS AART ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LEVACIA LEON MARTIN ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS J M ,  JOHANNES DROSTE RICHARD BERNARDUS ,  DE KLERK JOHANNES W ,  WANTEN PETER FRANCISCUS ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  DE JONG MARTEIJN ,  ANSTOTZ DAVID LUCIEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is disposed.SOLUTION: A liquid immersion lithographic apparatus includes a drain configured to drain liquid through a gap between an edge of a substrate and a substrate table on which the substrate is supported. The drain comprises: means for feeding the liquid to the drain regardless of a position of the substrate table; and/or means for saturating gas in the drain. These means reduce fluctuation of heat loss due to evaporation of the liquid in the drain.

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和其上放置物体的基板台之间的间隙排出。 解决方案：液浸式光刻设备包括被配置为通过衬底的边缘和衬底台之间的间隙排出液体的漏极，衬底台被支撑在衬底台上。 排水口包括：无论基板台的位置如何，将液体供给到排水口的装置; 和/或用于在排水管中使气体饱和的装置。 这些意味着减少由于排水管中液体的蒸发导致的热损失的波动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012114459A

公开(公告)日：2012-06-14

申请号：JP2012024784

申请日：2012-02-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  UITTERDIJK TAMMO

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus, in which temperature gradient in an immersion liquid is reduced or avoided.SOLUTION: An immersion lithographic apparatus, arranged in a space where one or a plurality of liquid flow dividers are enclosed by a liquid confinement structure, is disclosed. A function of the liquid flow dividers is to prevent formation of one or a plurality of recycle zones of an immersion liquid which often produce change in refractive index of the immersion liquid in the space, or consequently sometimes produce mapping error.

Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中降低或避免了浸没液体中的温度梯度。 公开了一种浸没式光刻设备，其设置在一个或多个液体分流器被液体限制结构封闭的空间中。 液体分流器的功能是防止形成浸没液体的一个或多个再循环区域，这些再循环区域通常会产生浸没液体在空间中的折射率变化，或者因此有时会产生映射误差。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011151397A

公开(公告)日：2011-08-04

申请号：JP2011009381

申请日：2011-01-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  LAURENT THIBAULT SIMON MATHIEU ,  MIRANDA MARCIO ALEXANDRE CANO ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES ,  FENG PENG ,  KUNNEN JOHAN GERTRUDIS CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F7/70991 ,  H01L21/0274 ,  H01L21/67098 ,  Y10T29/49

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic process where a process error caused by one or more heat sources can be reduced or minimized. SOLUTION: An immersion lithographic apparatus is provided. The immersion lithographic apparatus has a substrate table including a drain so configured as to receive an immersion liquid leaking into a gap between the edge of a substrate on the substrate table and the edge of a concave portion where the substrate is disposed. By directing one or more jets of the liquid toward the back side of a portion that supports the substrate, at least a portion of the concave portion that supports the substrate is thermally adjusted, thus providing a thermal adjustment system in the immersion lithographic apparatus. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可以减少或最小化由一个或多个热源引起的过程误差的光刻工艺。 解决方案：提供浸没式光刻设备。 浸没式光刻设备具有衬底台，该衬底台包括漏液，其被构造成接收浸没液体泄漏到衬底台上的衬底的边缘与设置衬底的凹部的边缘之间的间隙中。 通过将液体的一个或多个射流引导到支撑衬底的部分的后侧，至少支撑衬底的凹部的一部分被热调节，从而在浸没式光刻设备中提供热调节系统。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011066416A

公开(公告)日：2011-03-31

申请号：JP2010206356

申请日：2010-09-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BECKERS MARCEL ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  MIGCHELBRINK FERDY ,  EVERS ELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a seal member or a barrier member that reduces a turbulent flow and an overflow of immersion liquid in a liquid supply system for an immersion lithographic apparatus.
SOLUTION: The immersion liquid is supplied into a seal member 12 through an inlet 128. The immersion liquid is pushed into orifices 121 that permit fluid communication between a first chamber 120 and a second chamber 122, causing a first pressure drop in the immersion liquid. The orifices 121 are individual holes prepared in a plate 123 separating the chambers 120 and 122, and the orifices 121 disperse a flow in a tangential direction over a plate 126 separating the chamber 122 from a space, ensuring a uniform flow over the width of the array of orifices 124. The orifices 124 are provided as a (regular) two-dimensional array in the plate 126 of the seal member 12. Thus uniform and parallel flows are generated in the space.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种密封构件或阻挡构件，其减少用于浸没式光刻设备的液体供应系统中的湍流和浸没液体的溢出。 解决方案：浸没液体通过入口128供应到密封构件12.浸入液体被推入孔口121，孔口121允许第一室室120和第二室室122之间的流体连通， 浸液 孔121是在分离腔室120和122的板123中制备的单独的孔，并且孔口121沿切线方向分散流体，从而使腔室122与空间分离，从而确保在宽度方向上的均匀流动 孔124的阵列在密封构件12的板126中作为（规则的）二维阵列提供。因此，在该空间中产生均匀和平行的流。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2014027308A

公开(公告)日：2014-02-06

申请号：JP2013228111

申请日：2013-11-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  NICOLAAS TEN KATE ,  LOOPSTRA ERIK ROELOF ,  ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIANUS GERARDUS MARIA DE MOL ,  MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABETH ,  MARCO COELHO STAUFEN ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  STOYAN NIHTIANOV ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PETER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors caused by immersion liquid.SOLUTION: A lithographic apparatus comprises: an illumination system configured to adjust a radiation beam; a support body configured to support a pattern forming device capable of imparting a pattern to the radiation beam in a cross section of the radiation beam to form a pattern formed radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the pattern formed radiation beam onto a target portion of the substrate; a liquid supply system configured to fill at least a part of space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 支撑体，被配置为支撑图案形成装置，其能够在所述辐射束的横截面中赋予所述辐射束的图案以形成图案形成的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案形成的辐射束投影到所述基板的目标部分上; 液体供应系统，其配置成用液体填充所述投影系统的最终元件和所述基板之间的至少一部分空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。

公开(公告)号：JP2013042127A

公开(公告)日：2013-02-28

申请号：JP2012167085

申请日：2012-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KUNEN JOHANN GERTRUDIX CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THOMAS IVO ADAM JOHANNES ,  HOUBEN MARTIJN ,  LAURENT THIBAUD SIMON MATTHEW ,  GREGORY MARTIN MASON CORCORAN ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  GERBEN PETERS ,  GUNTHER PIETER LEIN JOSEPH ,  REMIE MARINUS JAN ,  SANDER CATHARINA REINIER DERKS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To reduce influence of a localized heat load when using immersion fluid in a lithographic apparatus.SOLUTION: A support table configured to support a substrate comprises a support section to support a substrate, and a regulation system to supply heat energy to and/or remove heat energy from the support section. The regulation system comprises a plurality of regulation units that are independently controllable.

Abstract translation: 要解决的问题：为了减少在光刻设备中使用浸液时的局部热负荷的影响。 解决方案：构造成支撑衬底的支撑台包括用于支撑衬底的支撑部分和用于向支撑部分提供热能和/或从其移除热能的调节系统。 调节系统包括可独立控制的多个调节单元。 版权所有（C）2013，JPO＆INPIT