公开(公告)号：JP2010050478A

公开(公告)日：2010-03-04

申请号：JP2009243837

申请日：2009-10-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MARTINUS HENDRIKUS ANTONIUS LEENDERS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in an immersion liquid and evaporation of the liquid. SOLUTION: An immersion lithographic apparatus includes a liquid containment structure 12 provided for at least partially defining a space 10 structured to contain a liquid between a projection system PL and a substrate W. A sectional area of the space 10 in a plane parallel to the substrate W is minimized to reduce a traverse of a rim of the substrate W whose image is to be formed (which sometimes brings a content of bubbles in the immersion liquid). The theoretically minimum size is that of a target part TP whose image is to be formed by the projection system PL. In addition, in one embodiment, a shape of a final element of the projection system PL is modified to have a size and/or a shape similar to the target part TP on a cross section parallel to the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：减少浸没液体中气泡的产生和液体的蒸发。 浸没式光刻设备包括液体容纳结构12，其设置用于至少部分地限定被构造成在投影系统PL和衬底W之间容纳液体的空间10.平面中的空间10的截面积平行 使基板W最小化，以减少要形成图像的基板W的边缘（其有时在浸渍液体中引起气泡的含量）的横越。 理论上的最小尺寸是由投影系统PL形成其图像的目标部分TP的尺寸。 此外，在一个实施例中，投影系统PL的最终元件的形状被修改为具有与平行于基板W的横截面上的目标部件TP类似的尺寸和/或形状。版权所有： （C）2010，JPO＆INPIT

公开(公告)号：JP2009033201A

公开(公告)日：2009-02-12

申请号：JP2008274728

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT包括排水槽，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡层100，如同位于基本相同的平面上的传感器，顶表面 的基底。 屏障40和100可以收集从液体供应系统溢出的任何液体，同时暴露基板W，以降低光刻投影设备的精密部件污染的风险。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033161A

公开(公告)日：2009-02-12

申请号：JP2008187823

申请日：2008-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  VAN DER NET ANTONIUS JOHANNUS ,  WANTEN PETER FRANCISCUS ,  VAN DER DONCK JACQUES COR JOHA ,  WATSO ROBERT DOUGLAS ,  VAN DEN DOOL TEUNIS CORNELIS ,  SCHUH NADJA ,  CROMWIJK JAN WILLEM

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce contamination in immersion lithographic apparatus.
SOLUTION: The immersion lithographic apparatus is cleaned by a cleaning liquid essentially consisting of ultra-pure water, and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide having a concentration of up to 5%, or (c) ozone having a concentration of up to 50 ppm, or (d) oxygen having a concentration of up to 10 ppm, or (e) an arbitrary combination selected from (a)-(d).
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：防止或减少浸没式光刻设备中的污染。 浸渍式光刻设备由基本上由超纯水组成的清洗液和（a）过氧化氢和臭氧的混合物或（b）浓度高达5％的过氧化氢清洗， 或（c）浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任意组合。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008227548A

公开(公告)日：2008-09-25

申请号：JP2008161756

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning the inside of an immersion lithographic apparatus. SOLUTION: A cleaning fluid can be introduced into a space between a projection system and a substrate table of the lithographic apparatus by especially using a liquid supply system of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided to create an ultrasonic liquid. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗浸没式光刻设备内部的方法和装置。 解决方案：通过特别使用光刻设备的液体供应系统，可以将清洁流体引入到光刻设备的投影系统和基板台之间的空间中。 附加地或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波液体。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008227547A

公开(公告)日：2008-09-25

申请号：JP2008161741

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and equipment for cleaning the interior of oil immersion lithographic equipment. SOLUTION: Cleaning fluid can be introduced into a space between the projection system and the substrate table of lithographic equipment by especially using the liquid supply system of the lithographic equipment. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided in order to produce ultrasonic liquid. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗油浸光刻设备内部的方法和设备。 解决方案：通过特别使用光刻设备的液体供应系统，可以将清洁液体引入到平版印刷设备的投影系统和基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波液体。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008135769A

公开(公告)日：2008-06-12

申请号：JP2007339406

申请日：2007-12-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: A liquid supply system 180 further comprises a de-mineralizing unit 130, a distillation unit 120 and a UV radiating source 145 for the purification of an immersion liquid. Chemicals can be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体供应系统使用液体限制系统在投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统180还包括去矿化单元130，蒸馏单元120和用于净化浸液的UV辐射源145。 可以将化学品添加到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008010864A

公开(公告)日：2008-01-17

申请号：JP2007158123

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HEN ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETR ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithography projection apparatus in which a liquid removal system surrounds a liquid supply system that supplies a liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system is capable of moving with respect to the liquid supply system and is controlled so that is has substantially a relative velocity of zero with respect to a moving substrate table. A gap between the liquid supply system and the liquid removal system can be covered and the atmosphere on the substrate table can be maintained so that the liquid vapor pressure becomes relatively high between the liquid supply system and the liquid removal system. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统能够相对于液体供应系统移动并且被控制为使得相对于移动的基板台具有基本相对的零速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持基板台上的气氛，使得液体供应系统和液体移除系统之间的液体蒸气压力变得相对较高。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007150308A

公开(公告)日：2007-06-14

申请号：JP2006315814

申请日：2006-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOL ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNE ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography.
SOLUTION: In the immersion lithography, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography may further comprise an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了防止浸没液中的气泡的存在对浸没式光刻中的图案图像的质量产生不利影响。 解决方案：在浸没式光刻中，可以通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板覆盖物来减小或防止浸没液体中的气泡的形成 差距。 浸没式光刻可以进一步包括致动器，该致动器在物体与液体接触时使物体在支撑台的孔中横向移动，以减小物体的端部与孔的一侧之间的间隙。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006237608A

公开(公告)日：2006-09-07

申请号：JP2006043899

申请日：2006-02-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STAVENGA MARCO KOERT ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  VERHAGEN MARTINUS CORNELIS MAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide various pressure adjusting means for reducing pressure gradient in a liquid supply system of a lithographic apparatus. SOLUTION: The liquid supply system has a liquid confinement structure constituted to at least partially confine a liquid between a projection system of the lithography apparatus and a substrate table. High pressure gradient may cause particulate contamination within the liquid supply system and/or the liquid confinement structure. The pressure gradient, for example, can be reduced by the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor for preventing shock waves, and a buffer volume/damper for compensating pressure fluctuation. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供用于减小光刻设备的液体供应系统中的压力梯度的各种压力调节装置。 解决方案：液体供应系统具有液体限制结构，其构造成至少部分地限制光刻设备的投影系统和基板台之间的液体。 高压梯度可能导致液体供应系统和/或液体限制结构内的颗粒污染。 例如，压力梯度可以通过在一个或多个阀中使用缓慢的切换，或者通过一个或多个阀周围的排出流或通过一个或多个阀的流出而被减少，而不是或者除了切断阀之外， 用于防止冲击波的压力调节器或限流器以及用于补偿压力波动的缓冲容积/阻尼器。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011254092A

公开(公告)日：2011-12-15

申请号：JP2011163844

申请日：2011-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MARCEL MATHIJS THEODORE MARIE DIERICHS ,  SECHELT NICHOLAS LAMBELDUS DONDERS ,  JOHANNES HENRICUS WILHELMUS JACOBS ,  JANSEN HANS ,  ERIK ROELOF LOOPSTRA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MARCO COELHO STAUFEN ,  BOB STREEFKERK ,  MARTINUS CORNELIS MARIA VERHAGEN ,  LAYLA SOINTIS GULDA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate by using a liquid confinement system.SOLUTION: A liquid supply system 100 may further include a de-mineralizing unit 130, a distillation unit 120 and a UV radiation source to purify an immersion liquid. A chemical may be added to the immersion liquid to inhibit lives from growing and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lives may be reduced.

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体供应系统通过使用液体限制系统在投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统100还可以包括去矿化单元130，蒸馏单元120和UV辐射源以净化浸没液体。 可以向浸入液体中加入化学物质以抑制生命的生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，从而可以减少生命的增长。 版权所有（C）2012，JPO＆INPIT