公开(公告)号：JP2010147470A

公开(公告)日：2010-07-01

申请号：JP2009281091

申请日：2009-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERMEULEN JOHANNES PETRUS MARTINUS ,  MARCEL KOENRAAD MARIE BAGGEN ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  VAN EIJK JAN ,  JEUNINK ANDRE BERNARDUS ,  KEMPER NICOLAAS R ,  MUNNIG SCHMIDT ROBERT-HAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VAN DER WIJST MARC WILHELMUS MARIA ,  CADEE THEODORUS PETRUS MARIA ,  FRANSICUS MATHIJS JACOBS ,  VALENTIN CHRISTIAAN LOUIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/42 ,  G03F7/707 ,  G03F7/70775 ,  G03F7/70816 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a patterning device support that leads to improvement in overlays. SOLUTION: Lithographic apparatus includes a position controller for selectively pressurizing, at least one of sides of a patterning device M to control the position of the patterning device M in its planar direction. The position controller includes a gas supply section and one or a plurality of outflow openings directed to the side of the gas pressure supply section, to apply a pressurized gas to at least one side of the patterning device to control the position of the patterning device, in its planar direction in a non-contact manner. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供导致覆盖层改进的图案形成装置支撑件。 解决方案：平版印刷设备包括位置控制器，用于选择性地加压图案形成装置M的至少一个边以控制图案形成装置M在其平面方向上的位置。 位置控制器包括气体供给部和指向气体压力供应部侧的一个或多个流出开口，以将加压气体施加到图案形成装置的至少一侧，以控制图案形成装置的位置， 在其平面方向上以非接触方式。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2006114919A

公开(公告)日：2006-04-27

申请号：JP2005307772

申请日：2005-09-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DEN BOEF ARIE JEFFREY ,  JEUNINK ANDRE BERNARDUS ,  PELLEMANS HENRICUS PETRUS MARI ,  SETIJA IRWAN D ,  VAN NUENEN CAS JOHANNES PETRUS ,  KEIJ STEFAN CAROLUS JACOBUS A

IPC: H01L21/027 ,  G01B11/00 ,  G03F9/00

CPC classification number: G03F9/7088 ,  G03F9/7092

Abstract: PROBLEM TO BE SOLVED: To provide an alignment system and method for effective use of a substrate by minimizing the space for alignment marks on the substrate required to align the substrate with the apparatus in a lithographic apparatus. SOLUTION: The alignment system illuminates an alignment mark 18 comprising a plurality of lines and spaces located in a scribe lane 5 of the substrate with an illumination spot 7, transfers two images of the alignment mark without spatial filtering of the images, rotates the images 180 degrees relatively to each other, combines the two images, detects an alignment signal from the combined images, and determines a unique alignment position by selecting a specific one of extreme values in the detected alignment signal. The alignment mark can be used for both coarse and fine alignments of the substrate, and since no separate marks are needed for both stages, only a limited space is required on the substrate for the alignment purpose. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种通过使基板与光刻设备中的设备对准所需的基板上的对准标记的空间最小化来有效地使用基板的对准系统和方法。 解决方案：对准系统照亮包括位于基板的划线通道5中的多个线和间隔的对准标记18，其具有照明点7，在没有图像的空间滤波的情况下传送对准标记的两个图像，旋转 相对于彼此成180度的图像，组合两个图像，检测来自组合图像的对准信号，并且通过在所检测到的对准信号中选择特定的一个极值来确定唯一的对准位置。 对准标记可以用于基板的粗略和精细对准，并且由于两个阶段不需要单独的标记，所以在基板上仅需要有限的空间用于对准目的。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006024941A

公开(公告)日：2006-01-26

申请号：JP2005198439

申请日：2005-07-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JEUNINK ANDRE BERNARDUS ,  AKHSSAY M HAMED ,  BASELMANS JOHANNES JACOBUS MAT ,  COMMISSARIS FRANCISCUS ANTONIU ,  VAN DIJK REMCO MARCEL ,  DE GROOT SIMON ,  WIM TJIBBO TEL ,  VAN DER HOFF ALEXANDER HENDRIK ,  VAN DE STADT ARNOUT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70258 ,  G03F7/70491 ,  G03F7/705 ,  G03F7/706 ,  G03F9/7046

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection equipment capable of obtaining an optimal image quality by preferentially compensating the most important aberration related to an individual usage (individual pattern and illumination mode, etc). SOLUTION: The method comprises the steps of estimating the change of an aberration of a projection system by elapse of time based on a lens heat action model 10, determining an influence specific to the usage for several image parameters according to the estimated change of an aberration of the projection system with respect to several aberration values measured based on IQEA model 11, generating a control signal specific to a beam required and patterned by the estimated aberration change of the projection system by elapse of time and the influence specific to the usage on several parameters of images, and executing transferring adjustment based on the control signal and compensating the influence specific to the usage of the estimated change of the aberration on the images. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供能够通过优先补偿与个人使用（个体图案和照明模式等）相关的最重要的像差来获得最佳图像质量的光刻投影设备。 解决方案：该方法包括以下步骤：基于透镜热作用模型10估计经过时间的投影系统的像差变化，根据估计的变化确定特定于若干图像参数的使用的影响 相对于基于IQEA模型11测量的几个像差值的投影系统的像差，产生特定于通过投影系统估计的像差变化所需和图案化的图形的控制信号，通过时间和特定于 对图像的几个参数的使用，以及基于控制信号执行传送调整，并补偿对估计的像差变化对图像的使用的影响。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011023715A

公开(公告)日：2011-02-03

申请号：JP2010147032

申请日：2010-06-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JEUNINK ANDRE BERNARDUS ,  BANINE VADIM YEVGENYEVICH ,  BUTLER HANS ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  KRUIJT-STEGEMAN YVONNE WENDELA

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

Abstract: PROBLEM TO BE SOLVED: To avoid a problem related to expansion and contraction of a template. SOLUTION: The imprint lithography apparatus is arranged away from a substrate holder 58 and arranged between a structure 64 and the substrate holder 58 during the use of imprint template arrangements 50, 52. The structure 64 includes one or more arrays of lines or one or more encoders, and a substrate 56 or the substrate holder 58 and the imprint template have one or more encoders 68 that face the one or more arrays of lines or one or more arrays of lines that face the one or more encoders 68. The configuration determination arrangement is configured to determine a relative configuration between the substrate 56 or substrate holder 58 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the substrate 56 or substrate holder 58. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：避免与模板的伸缩有关的问题。 解决方案：压印光刻设备远离衬底保持器58布置，并且在使用压印模板布置50,52期间布置在结构64和衬底保持器58之间。结构64包括一个或多个线阵列或 一个或多个编码器以及衬底56或衬底保持器58和压印模板具有面向一个或多个线阵列或面向一个或多个编码器68的线阵列的一个或多个编码器68。 配置确定装置被配置为确定衬底56或衬底保持器58和结构64之间的相对配置，和/或压印模板布置50,52和结构64之间的相对配置，和/或其间的相对配置 压印模板布置50,52和基板56或基板支架58.版权所有：（C）2011，JPO＆INPIT

公开(公告)号：JP2011014907A

公开(公告)日：2011-01-20

申请号：JP2010147028

申请日：2010-06-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERMEULEN JOHANNES PETRUS MARTINUS ,  JEUNINK ANDRE BERNARDUS ,  KRUIJT-STEGEMAN YVONNE WENDELA

IPC: H01L21/027 ,  H02K41/02 ,  H02K41/035

CPC classification number: B29C67/0051 ,  B29C64/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S425/81

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography apparatus whose throughput can be increased.SOLUTION: The imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.

Abstract translation: 要解决的问题：提供可以提高生产量的压印光刻设备。解决方案：公开了压印光刻设备。 该设备包括配置成移动压印模板布置的电磁洛伦兹致动器装置，所述电磁洛伦兹致动器装置包括：磁体阵列; 以及导体阵列，每个导体被配置为承载电流，所述磁体阵列中的一个或所述导体阵列可移动并连接到所述压印模板装置，并且所述磁体阵列或所述导体阵列中的另一个延伸 至少部分地围绕或形成衬底保持器的一部分; 磁体阵列和导体阵列一起处于有利于以六个自由度移动磁体阵列或导体阵列中的可移动的一个的构造，使得印模模板布置也可以在六度 自由。

公开(公告)号：JP2010093252A

公开(公告)日：2010-04-22

申请号：JP2009225775

申请日：2009-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： COMPEN RENE THEODORUS PETRUS ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  JEUNINK ANDRE BERNARDUS ,  LOOPSTRA ERIK ROELOF ,  OTTENS JOOST JEROEN ,  SMITS PETER ,  VAN ABEELEN HENDRIKUS JOHANNES MARINUS ,  MEULENDIJKS ANTONIUS ARNOLDUS ,  HOUBEN MARTIJN ,  LEENAARS RENE WILHELMUS ANTONIUS HUBERTUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70716 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that prevents the slip occurring on a substrate table. SOLUTION: The lithographic apparatus includes an illumination system IL configured to adjust a radiation beam B; a support MT constructed to support a patterning device MA, the patterning device imparting the radiation beam B with a pattern in its cross-section to form a patterned radiation beam; a mirror block MB provided with the substrate table WT constructed to hold a substrate W; and a projection system PS configured to project the patterned radiation beam onto a target portion of the substrate W, wherein the mirror block MB is constructed and arranged to reduce slip between the mirror block MB and the substrate table WT. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止在基板台上发生滑动的光刻设备。 解决方案：光刻设备包括被配置为调节辐射束B的照明系统IL; 构造成支撑图案形成装置MA的支撑件MT，所述图案形成装置在其横截面中赋予辐射束B以图案以形成图案化的辐射束; 设置有构造成保持衬底W的衬底台WT的镜块MB; 以及投影系统PS，其被配置为将图案化的辐射束投影到基板W的目标部分上，其中，镜块MB被构造和布置成减小镜块MB和衬底台WT之间的滑动。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010080918A

公开(公告)日：2010-04-08

申请号：JP2009143991

申请日：2009-06-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  WUISTER SANDER FREDERIK ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  JEUNINK ANDRE BERNARDUS ,  DE SCHIFFART CATHARINUS ,  JANSEN NORBERT ERWIN THERENZO

IPC: H01L21/027

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography accurately controlling the force of a wide dynamic range actuator. SOLUTION: Disclosed is an imprint lithography apparatus including: a first support structure 21 for supporting a template 20; and a first actuator 22 mounted on the first support structure constituted in use such that it is disposed the first support structure and the template. The first actuator applies force to the template. The imprint lithography apparatus further includes a second support structure 40 and a second actuator 41 disposed between the second support structure and the first support structure. The second actuator applies force to the second support structure, and the moving range of the second actuator is larger than the moving range of the first actuator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供精确控制宽动态范围致动器的力的压印光刻。 解决方案：公开了一种压印光刻设备，包括：用于支撑模板20的第一支撑结构21; 以及安装在第一支撑结构上的第一致动器22，所述第一致动器22构造在使用中，使得其布置在第一支撑结构和模板上。 第一个执行器对模板施加强制。 压印光刻设备还包括设置在第二支撑结构和第一支撑结构之间的第二支撑结构40和第二致动器41。 第二致动器对第二支撑结构施加力，并且第二致动器的移动范围大于第一致动器的移动范围。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008021997A

公开(公告)日：2008-01-31

申请号：JP2007177947

申请日：2007-07-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JEUNINK ANDRE BERNARDUS ,  MARCEL KOENRAAD MARIE BAGGEN ,  BIJVOET DIRK-JAN ,  CASTENMILLER THOMAS JOSEPHUS M

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70783 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus which corrects an undesirable bend of a patterning device using an improved bending mechanism of the patterning device. SOLUTION: The lithography apparatus includes a support that is structured to support the patterning device. The patterning device can give a pattern to the section of an radiation beam to form a patterned radiation beam, and the support has a support clamp structured to clamp the patterning device onto the support. The lithography apparatus also includes the bending mechanism structured to add a bending torque to the clamped patterning device, and this bending mechanism has a force/torque actuator structured to cause a clamp force added to the patterning device by the support clamp to act on the clamped patterning device with virtually no reduction of the force. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种使用改进的图案形成装置的弯曲机构校正图案形成装置的不期望的弯曲的光刻装置。 解决方案：光刻设备包括构造成支撑图案形成装置的支撑件。 图案形成装置可以向辐射束的部分提供图案以形成图案化的辐射束，并且支撑件具有构造成将图案形成装置夹持到支撑件上的支撑夹。 光刻设备还包括弯曲机构，其被构造为向夹持的图案形成装置增加弯曲扭矩，并且该弯曲机构具有力/扭矩致动器，该力/力矩致动器被构造成使得由支撑夹具附加到图案形成装置的夹紧力作用在夹紧 图案形成装置几乎没有减小力。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007150288A

公开(公告)日：2007-06-14

申请号：JP2006298498

申请日：2006-11-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  BOONMAN MARCUS EMILE JOANNES ,  CASTENMILLER THOMAS JOSEPHUS M ,  JEUNINK ANDRE BERNARDUS

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70783 ,  G03F7/707 ,  H01L21/682 ,  Y10S269/903

Abstract: PROBLEM TO BE SOLVED: To provide an article support which allows every kind of deformation induced by a heat load or the like of an article supported by itself during a lithography process. SOLUTION: The article support which is constructed for supporting a reticle (a first article) or a wafer (a second article) includes several protrusions for support on each of which the article is set when in use and which is constructed in such a way as to demarcate a support region for providing a flat surface on which they support the article, to enable the expansion and contraction of at least a part of the article by the support region when the article is subjected to the heat load in this way and to reduce the accumulation of mechanical stress in the article and a position sensor which is constructed in such a way as to determine a displacement position offset in one direction of the article on a flat surface of its support region for a certain period. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制品支撑件，其允许在光刻工艺期间由其自身支撑的物品的热负载等引起的各种变形。 解决方案：构造用于支撑掩模版（第一制品）或晶片（第二制品）的物品支撑件包括用于在使用时在每个构件上设置制品的几个突起，并且其构造为 用于划定支撑区域以提供它们支撑制品的平坦表面的方式，以便在制品以这种方式承受热负荷时能够通过支撑区域使制品的至少一部分膨胀和收缩 并且减少制品中的机械应力累积和位置传感器，其以这样的方式构造，以便确定在其支撑区域的平坦表面上的物品的一个方向上的位移偏移一段时间。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005033208A

公开(公告)日：2005-02-03

申请号：JP2004202790

申请日：2004-07-09

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LEENARDUS HENRICUS MARIE VERST ,  FINDERS JOSEF MARIA ,  VAN DER HOFF ALEXANDER HENDRIK ,  JEUNINK ANDRE BERNARDUS ,  TEL WIM TJIBBE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/705 ,  G03F7/706

Abstract: PROBLEM TO BE SOLVED: To provide a method of correcting the distortion of a pattern image projected in an imaging process and decreasing an overlay error, when the pattern is overlaid on a substrate by a lithography projection apparatus.
SOLUTION: The pattern is arranged on a mask, and the image is made by using a part of a projection system. The imaging quality of the part of the projection system is described by an imaging quality parameter, the image can be adjusted by an image tuning parameter in the projection system. An ideal image of a projection pattern is decided, a distorted image of the pattern which is simulated on the basis of the imaging quality parameter is decided, the deflection between the simulated image and the ideal image is decided, the image tuning parameter is corrected and changed in the imaging process in order to minimize deflection, and the distortion of the image is decreased.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种校正在成像处理中投射的图案图像的失真并减少叠加误差的方法，当通过光刻投影装置将图案重叠在基板上时。

解决方案：图案布置在掩模上，图像通过使用投影系统的一部分制成。 通过成像质量参数来描述投影系统的一部分的成像质量，可以通过投影系统中的图像调整参数来调整图像。 确定投影图案的理想图像，确定基于成像质量参数模拟的图案的失真图像，确定模拟图像与理想图像之间的偏转，校正图像调整参数，并且 在成像过程中改变以使偏转最小化，并且图像的失真减小。 版权所有（C）2005，JPO＆NCIPI