公开(公告)号：JP2004343103A

公开(公告)日：2004-12-02

申请号：JP2004133419

申请日：2004-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  MEIJER HENDRICUS JOHANNES MARI ,  VAN DER PASCH ENGELBERTUS ANTO ,  RENKENS MICHAEL JOZEF MATHIJS ,  RUIJL THEO ANJES MARIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70258 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a method of manufacturing device and an anglar decoder.
SOLUTION: A system for measuring the position of a projection system PL with respect to a reference frame RF in the lithographic system includes a sensor rigidly mounted in relation to a corresponding sensor of a system for measuring the position of a substrate table WT. Rotation of the projection system PL about its optical axis is measured using an anglar decoder for transmitting a light from a target 41 to two optical paths having an opposite inclination sensitivity.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004343075A

公开(公告)日：2004-12-02

申请号：JP2004102336

申请日：2004-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  COX HENRIKUS HERMAN MARIE ,  LEVASIER LEON MARTIN

IPC: G02F1/13 ,  F16F15/02 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F9/7019 ,  G03F7/70258 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/709 ,  G03F9/7011

Abstract: PROBLEM TO BE SOLVED: To provide a projection system exhibiting a lower sensitivity to vibration and disturbance.
SOLUTION: The projection system PL comprising at least one projector 10 arranged to receive a projection beam PB coming from a first object MA and to project that projection beam to a second object W is further provided with a sensor 11 for measuring a spatial orientation of the at least one projector 10, and a processing unit 40 arranged to be connected with at least one sensor 11. The processing unit 40 is further arranged to be connected with positioning units PW and PM for adjusting the position of at least one of the first object MA and the second object W based on the spatial orientation of at least one projector 10 thus measured.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供对振动和干扰具有较低灵敏度的投影系统。 解决方案：包括至少一个投影仪10的投影系统PL还设置有用于接收来自第一物体MA的投影束PB并且将该投影光束投射到第二物体W的投影仪10，该传感器11用于测量空间 至少一个投影仪10的取向以及被布置成与至少一个传感器11连接的处理单元40.处理单元40还被布置成与定位单元PW和PM连接，用于调整至少一个 基于如此测量的至少一个投影仪10的空间取向的第一对象MA和第二对象W。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2009105469A

公开(公告)日：2009-05-14

申请号：JP2009033850

申请日：2009-02-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus in which the generation of bubbles in immersion liquid is reduced. SOLUTION: The immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure has a buffer surface, and the buffer surface, when in use, is positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, is normally full of the immersion liquid to achieve rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中浸没液体中的气泡产生减少。 浸没式光刻投影装置具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间中，限制结构具有缓冲表面，并且当使用时，缓冲表面， 被定位在靠近基本上包括衬底的上表面的平面和保持衬底的衬底台上，以限定具有流动阻力的通道。 在缓冲表面设置有凹部，当使用时，凹部通常充满浸没液体，以在间隙在缓冲表面下移动时实现快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008053741A

公开(公告)日：2008-03-06

申请号：JP2007253982

申请日：2007-09-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DE VEN BASTIAAN LAMBERTUS ,  HEERENS GERT-JAN ,  LANSBERGEN ROBERT GABRIEL M ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/00 ,  H01L21/68

CPC classification number: G03F7/709 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/70783 ,  G03F7/70825

Abstract: PROBLEM TO BE SOLVED: To provide a lithography system capable of improving precision of an image projected on a substrate and reducing idle time. SOLUTION: A lithography apparatus is equipped with a connection system for positioning a patterning means against a reticle stage 25. This lithography projection apparatus has an operation cycle including: a projection phase where the projection system projects a patterned beam on a target part of a substrate and the reticle stage 25 supports the patterning means 1; and an exchange phase where the patterning means is exchanged and the connection system positions the patterning means against the reticle stage. The lithography apparatus is characterized in that the connection system is separated with a distance from the patterning means during the projection phase, thereby the projection image of higher precision is obtained. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供能够提高投影在基板上的图像的精度并减少空闲时间的光刻系统。 解决方案：光刻设备配备有用于将图案化装置定位在标线片平台25上的连接系统。该光刻投影设备具有操作周期，该操作周期包括：投影阶段，其中投影系统将图案化的光束投影到目标部分 的基板和标线片台25支撑图案形成装置1; 以及交换阶段，其中图案化装置被更换，并且连接系统将图案化装置对准标线片台。 光刻设备的特征在于，在投影阶段期间，连接系统与图案形成装置隔开一段距离，从而获得更高精度的投影图像。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006114927A

公开(公告)日：2006-04-27

申请号：JP2005353206

申请日：2005-12-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  COX HENRIKUS HERMAN MARIE ,  LEVASIER LEON MARTIN

IPC: G02F1/13 ,  H01L21/027 ,  F16F15/02 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7019 ,  G03F7/70258 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/709 ,  G03F9/7011

Abstract: PROBLEM TO BE SOLVED: To provide a projection system having lower sensitivity with respect to vibration and disturbance.
SOLUTION: The projection system comprises at least one projection device 10, configured to receive a projection beam PB coming from a first object MA and to project the projection beam to a second object W. The projection system PL further comprises a sensor 11 for measuring the spatial orientation of the at least one projection device 10. The projection system PL comprises a processing unit 40 which is arranged to communicate with the at least one sensor 11. The processing unit 40 is further arranged to communicate with positioning devices PW and PM, which are arranged to adjust the position of at least one of the first MA and second object W, based on the measured spatial orientation of the at least one projection device 10.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供相对于振动和干扰具有较低灵敏度的投影系统。 解决方案：投影系统包括至少一个投影装置10，其被配置为接收来自第一物体MA的投影光束PB，并将投影光束投影到第二物体W.投影系统PL还包括传感器11 用于测量至少一个投影装置10的空间取向。投影系统PL包括处理单元40，其被配置为与至少一个传感器11通信。处理单元40还被布置成与定位装置PW和 PM，其被布置为基于所测量的至少一个投影设备10的空间取向来调整第一MA和第二物体W中的至少一个的位置。版权所有：（C）2006，JPO＆NCIPI

公开(公告)号：JP2006093709A

公开(公告)日：2006-04-06

申请号：JP2005275937

申请日：2005-09-22

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LUIJTEN CARLO CORNELIS MARIA ,  LAMBERTUS DONDERS SJOERD NICOL ,  KEMPER NICOLAAS R ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  STREEFKERK BOB ,  BECKERS MARCEL ,  BOOM HERMAN ,  MOERMAN RICHARD

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide immersion lithography equipment in which the generation of air bubbles in an immersion liquid is reduced. SOLUTION: Immersion lithography projection equipment has a liquid-confining structure configured so as to confine liquid at least partially in a space between a projection system and a substrate. The confining structure has a buffering plane which is arranged when in use, very close to the a plane substantially including the substrate and the top surface of a substrate table that holds the substrate, and defines a path having flow resistance. In this buffering plane, recesses are formed and normally filled with liquid when in use so that a gap is rapidly filled therewith when the gap between the substrate and the substrate table moves under the buffering plane. The recess may be formed into an annular or a radial shape so that a plurality of recesses can be arranged. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供浸没式光刻设备，其中浸没液体中的气泡的产生减少。 浸渍光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间中。 约束结构具有缓冲平面，该平面在使用时非常接近于基本上包括基板的平面和保持基板的基板台的顶表面，并且限定具有流动阻力的路径。 在该缓冲面中，当使用时形成凹部，并且通常在液体中充满液体，使得当基板和基板台之间的间隙在缓冲平面下移动时，间隙迅速填充。 凹部可以形成为环形或径向形状，使得可以布置多个凹部。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005294834A

公开(公告)日：2005-10-20

申请号：JP2005098186

申请日：2005-03-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  BEEMS MARCEL HENDRIKUS MARIA ,  LEENDERS MARTINUS HENDRIKUS AN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70575 ,  G03F7/7005

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device and a manufacturing method of the device.
SOLUTION: The lithographic device includes a radiation source designed to provide an illuminating system with the radiation, and is provided with the radiation source designed to provide a radiation in a first wavelength range, and a radiation in a second wavelength range different from the first wavelength range. A support is configured to support a patternizing device designed to impart a pattern onto the cross-section of the radiation. A substrate table is designed to hold the substrate, a projection system is designed to project the patternized radiation on the targeted portions of the substrate. The first wavelength range is a primary wavelength of the lithographic device. The second wavelength range can be used for setting up the lithographic device. The set-up includes one or a plurality out of calibration, approval, performance test and alignment. In addition, the other substrates can be also exposed by using the second wavelength range.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备和该设备的制造方法。 解决方案：光刻设备包括被设计成为照明系统提供辐射的辐射源，并且设置有被设计成提供第一波长范围内的辐射的辐射源和与第一波长范围不同的第二波长范围内的辐射 第一波长范围。 支撑构造成支撑设计成将图案赋予辐射横截面的图案化装置。 基板台被设计成保持基板，投影系统设计成将图案化的辐射投射到基板的目标部分上。 第一波长范围是光刻设备的主要波长。 第二波长范围可用于设置光刻设备。 该设置包括一个或多个校准，批准，性能测试和对齐。 此外，其他基板也可以通过使用第二波长范围曝光。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009302594A

公开(公告)日：2009-12-24

申请号：JP2009227369

申请日：2009-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  LEENDERS MARTINUS HENDRIKUS AN

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method, capable of reducing the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on an imaging quality. SOLUTION: In a liquid immersion lithography apparatus, liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of a projection beam, has through-holes to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供能够降低污染物的输送，杂散光，温度梯度和/或气泡对成像质量的影响的光刻设备和设备制造方法。 解决方案：在液浸光刻设备中，将液体供应到投影系统和基板之间的空间，并且提供板结构以将空间分成两部分。 板结构具有允许透射投影束的孔，具有通孔以减少板的存在的阻尼效应，并且可选地具有一个或多个入口和出口以提供围绕板中的孔的各种流动。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007005795A

公开(公告)日：2007-01-11

申请号：JP2006168236

申请日：2006-06-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MAR ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JO ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system efficiently and effectively eliminating an energy loss in lithography equipment when a relevant component is locally cooled by the evaporation of a supplied liquid, and defocus and lens aberration are caused by transformation and alteration in immersion lithography for filling a gap between a projection system and a substrate with an immersion liquid in order to increase the number of holes. SOLUTION: A timetable 34 is prepared having information on time at which the evaporation of a supplied liquid 11 is the most likely caused, the position of a substrate W, a speed, an acceleration speed and the like. The evaporation of a local area is prevented by heating at least a portion of the substrate W by using a heater according to the timetable 34 by using a liquid evaporation control device 30 or sending humidified air. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：当通过供应液体的蒸发局部冷却相关部件时，为了提供高效且有效地消除光刻设备中的能量损失的系统，并且散焦和透镜像差是由浸渍的变换和变化引起的 用于通过浸没液体填充投影系统和基板之间的间隙以增加孔的数量的光刻。 解决方案：制备时间表34，其具有关于供应的液体11的蒸发最可能引起的时间的信息，基板W的位置，速度，加速度等。 通过使用液体蒸发控制装置30或发送加湿空气根据时间表34的加热器加热基板W的至少一部分来防止局部区域的蒸发。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006148111A

公开(公告)日：2006-06-08

申请号：JP2005331476

申请日：2005-11-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  GILISSEN NOUD J ,  LEENDERS MARTINUS HENDRIKUS AN ,  ZAAL KOEN JACOBUS JOHANNES MAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

Abstract: PROBLEM TO BE SOLVED: To improve the production yield of lithographic equipment and to provide a device manufacturing method. SOLUTION: The lithographic equipment includes optical elements such as an immersion fluid reservoir at least partially supported by a gas support section etc. A surrounding structure that encloses a substrate is provided in order to enable illumination at the end part of the substrate by the lithography equipment. Level parameters such as the thickness of the substrate are measured by a thickness sensor etc. The substrate table is located with respect to the surrounding structure by an actuator and the substrate surface is made be at the substantially the same level with the surface of the surrounding structure. The optical elements are enabled to move between the substrate surface and the surface of the surrounding structure. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提高平版印刷设备的生产成本并提供装置制造方法。 解决方案：光刻设备包括诸如至少部分地被气体支撑部分支撑的浸没流体储存器的光学元件。提供包围基板的周围结构，以便能够在基板的端部处照明 光刻设备。 通过厚度传感器等来测量衬底的厚度等级参数。衬底台通过致动器相对于周围结构定位，并且衬底表面被制成与周围表面基本相同的高度 结构体。 光学元件能够在基板表面和周围结构的表面之间移动。 版权所有（C）2006，JPO＆NCIPI