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    Radiation source, lithographic apparatus, and method of manufacturing device
    11.
    发明专利
    Radiation source, lithographic apparatus, and method of manufacturing device 审中-公开
    辐射源，光刻设备及其制造方法

    公开(公告)号：JP2010045358A

    公开(公告)日：2010-02-25

    申请号：JP2009183973

    申请日：2009-08-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SCHIMMEL HENDRIKUS GIJSBERTUS ,  BANINE VADIM YEVGENYEVICH ,  LOOPSTRA ERIK ROELOF ,  BOSSCHART CAREL HOPE

    IPC: H01L21/027

    CPC classification number: H05G2/003 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G21K1/06 ,  H05G2/005 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To control fuel droplets by a method reducing potential contamination on other surfaces in a radiation source and other parts of a lithographic apparatus.
    SOLUTION: The radiation source is configured to generate extreme ultraviolet rays. The radiation source comprises a laser which is configured to generate a radiation beam to be guided to a plasma generation part for plasma generation when the radiation beam interacts with fuel, an optical component comprising a surface which is configured and positioned to be hit with droplets of the fuel, and a temperature conditioner configured to raise the temperature of the surface. A coating may be so provided on the surface as to change at least one nature of the surface. The energy source may be configured so that the droplets of fuel solidify before they hit the surface or to prevent the droplets of fuel from vaporizing.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：通过减少辐射源和光刻设备的其它部分中的其它表面上的潜在污染的方法来控制燃料液滴。 解决方案：辐射源被配置为产生极紫外线。 辐射源包括激光器，其被配置为当辐射束与燃料相互作用时，产生要被引导到等离子体产生部件的等离子体产生部件的辐射束;光学部件，其包括被配置并定位成被喷射的液滴 所述燃料和配置为升高所述表面的温度的温度调节器。 可以在表面上设置涂层以改变表面的至少一种性质。 能量源可以被配置为使得燃料液滴在它们撞击表面之前固化或者防止燃料液滴蒸发。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    12.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009164623A

    公开(公告)日：2009-07-23

    申请号：JP2009044651

    申请日：2009-02-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  LOOPSTRA ERIK ROELOF ,  MULKENS JOHANNES CATHARINUS HU

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70875 ,  B05C9/12 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a means for alleviating the problem concerning the presence of a dipping liquid in a lithographic projection apparatus.
    SOLUTION: In the lithographic projection apparatus, a liquid supplying system supplies the dipping liquid between the last element of the projection apparatus and a substrate. An active drying station is provided to actively remove the remained dipping liquid from the exposed substrate W or other objects. The active drying station is equipped with a gas stream forming means or a dipping liquid dissolving liquid supplying means for dissolving the dipping liquid.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种减轻在光刻投影设备中存在浸渍液体的问题的方法。 解决方案：在平版印刷投影设备中，液体供应系统将投影设备的最后一个元件和基板之间的浸渍液体供应。 提供主动干燥站，以从暴露的基底W或其它物体主动去除剩余的浸渍液体。 活性干燥站装有用于溶解浸渍液体的气流形成装置或浸液溶解液体供给装置。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus having active damping subassembly
    14.
    发明专利
    Lithographic apparatus having active damping subassembly 有权
    具有主动阻尼分层的平面设备

    公开(公告)号：JP2009105398A

    公开(公告)日：2009-05-14

    申请号：JP2008266921

    申请日：2008-10-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  LOOPSTRA ERIK ROELOF ,  VAN DER WIJST MARC WILHELMUS M ,  DE PEE JOOST ,  DE HOON CORNELIUS ADRIANUS LAM ,  BOSCHKER STIJN

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/709 ,  G03F7/70883

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus improved in the accuracy and/or the throughput of imaging. SOLUTION: This lithographic apparatus includes a projection system to project a patterned radiation beam to a substrate, and a damping system to damp the vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping sub-system to damp the vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping sub-system connected to the interface damping mass, the active damping sub-system including a sensor to measure a positional quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供改进成像精度和/或生产能力的光刻设备。 解决方案：该光刻设备包括将图案化的辐射束投射到基板的投影系统，以及阻尼系统，以阻尼至少部分投影系统的振动，阻尼系统包括界面阻尼块和活动 阻尼子系统阻尼至少部分界面阻尼块的振动，连接到投影系统的界面阻尼块和连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括 传感器，用于测量接口阻尼质量的位置数量和致动器，以基于由传感器提供的信号对接口阻尼质量施加力。 版权所有（C）2009，JPO＆INPIT

    Lithographic device, and manufacturing method of device
    15.
    发明专利
    Lithographic device, and manufacturing method of device 审中-公开
    光刻设备和器件的制造方法

    公开(公告)号：JP2009081465A

    公开(公告)日：2009-04-16

    申请号：JP2008332589

    申请日：2008-12-26

    Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・アーゲー

    Inventor： VAN EMPEL TJARKO ADRIAAN R ,  LOOPSTRA ERIK ROELOF ,  VAN DER NET ANTONIUS J ,  VAN DE VIJVER YURI JOHANNES G ,  GELLRICH BERNARD ,  JANSEN BAUKE ,  SANDERSE RENS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70933 ,  G03F7/70908

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device provided with a projection column having a gas-regulated environment that is hardly affected by the fluctuation of an ambient atmosphere.
    SOLUTION: The lithographic device is disclosed. The lithographic device includes a projection system configured to project a patternized radiation beam on the target portion of a substrate. The projection system includes a housing and a plurality of optical elements disposed in the housing. In addition, the lithographic device includes an inlet for supplying a regulated gas to the housing and a gas discharge section for discharging the regulated gas from the housing to create the gas-regulated environment. At least one gate for making the gas-regulated environment communicate with the ambient atmosphere is disposed. The gate is disposed to perform the predetermined leakage of the regulated gas to the ambient atmosphere.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种设置有几乎不受环境大气波动影响的气体调节环境的投影柱的光刻设备。 解决方案：公开了光刻设备。 光刻设备包括投影系统，其被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和设置在壳体中的多个光学元件。 此外，平版印刷装置包括用于将调节气体供应到壳体的入口和用于从壳体排出调节气体以产生气体调节环境的气体排出部分。 设置用于使气体调节环境与环境大气连通的至少一个门。 门被设置为执行经调节的气体到周围大气的预定泄漏。 版权所有（C）2009，JPO＆INPIT

    Lithographic device
    16.
    发明专利
    Lithographic device 审中-公开
    LITHOGRAPHIC设备

    公开(公告)号：JP2008252117A

    公开(公告)日：2008-10-16

    申请号：JP2008134190

    申请日：2008-05-22

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF

    IPC: H01L21/027 ,  B08B5/00 ,  G03F7/20 ,  G03F7/22

    CPC classification number: G03F7/70933 ,  G03F7/70716 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70983

    Abstract: PROBLEM TO BE SOLVED: To provide a system which can reduce the absorption of a radiation beam in a lithographic projection device.
    SOLUTION: In the lithographic device using exposure radiation having a relatively short wavelength of 157 nm or 126 nm, an N
    2 laminar flow which crosses the inside of the operating section of the device and part of a beam passage adjoining the operating section is supplied. Since the speed of the laminar flow is higher than the maximum speed of the operating section and the diffusing speed of air, contamination of the N
    2 of the flow caused when the laminar flow is mixed with the air is minimized. Laminar flow may be maintained, by providing a partition wall which divides the beam passage into separated spaces and an aerodynamic member, and by covering the rough or non-flat surface of an element above or adjoining the laminar flow.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种可以减少光刻投影装置中的辐射束的吸收的系统。 解决方案：在使用具有157nm或126nm的较短波长的曝光辐射的平版印刷装置中，穿过装置的操作部分的内部的N 2 层流， 供给与操作部相邻的梁通道。 由于层流速度高于操作部分的最大速度和空气的扩散速度，所以当层流与空气混合时，流出的N 2 的污染是 最小化。 可以通过提供将梁通道分成分离的空间和空气动力学构件的分隔壁以及通过覆盖层流的上方或邻接的元件的粗糙或非平坦表面来保持层流。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus and method of manufacturing device
    18.
    发明专利
    Lithographic apparatus and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2008118135A

    公开(公告)日：2008-05-22

    申请号：JP2007282718

    申请日：2007-10-31

    Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・アーゲー

    Inventor： JANSEN BASTIAAN STEPHANUS HEND ,  LOOPSTRA ERIK ROELOF ,  RAVENSBERGEN MARIUS ,  HAUF MARKUS JOSEF

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G02B7/028 ,  G02B27/0025 ,  G03F7/70091 ,  G03F7/70891

    Abstract: PROBLEM TO BE SOLVED: To prevent local variation and deformation of refractive indexes of optical elements owing to uneven heating of them by a radiation beam resulting in prevention of deformation of air images projected on a resist layer. SOLUTION: A lithographic equipment including an optical arrangement with an array of optical elements arranged in a plane perpendicular to the radiation beam is disclosed. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively operating the heating devices, a position dependent change in optical path length can be achieved in order to correct irradiation-induced optical path length errors. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：为了防止光学元件的折射率由于辐射束的不均匀加热而的局部变化和变形，从而防止投影在抗蚀剂层上的空气图像的变形。 公开了一种光刻设备，其包括具有布置在垂直于辐射束的平面中的光学元件阵列的光学装置。 每个光学元件包括用于改变辐射束的光路长度的电加热装置。 通过选择性地操作加热装置，可以实现光程长度的位置相关的改变，以便校正照射引起的光程长度误差。 版权所有（C）2008，JPO＆INPIT

    Lithographic apparatus, device manufacturing method, and device manufactured therewith
    20.
    发明专利
    Lithographic apparatus, device manufacturing method, and device manufactured therewith 有权
    光刻设备，器件制造方法及其制造的器件

    公开(公告)号：JP2006165549A

    公开(公告)日：2006-06-22

    申请号：JP2005347566

    申请日：2005-12-01

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KRUIJSWIJK STEFAN G ,  LOOPSTRA ERIK ROELOF

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70075 ,  G03F7/70083

    Abstract: PROBLEM TO BE SOLVED: To provide an illumination system preparing an improved substrate illumination. SOLUTION: The present invention relates to a lithographic apparatus, a device manufacturing method, and a device thus manufactured. The lithographic apparatus is a scanning type in which a target portion of a substrate is scanned through a patterned radiation beam. Inhomogeneities in the radiation beam may become visible in the form of stripes on the substrate. During scanning, the overall homogeneity of the illumination may be improved by smearing out the inhomogeneities like this in such a way that additional movement is applied to a substrate table of the apparatus and a patterning device selected optionally in a direction at an angle with the scanning movement. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种制备改进的基板照明的照明系统。 解决方案：本发明涉及光刻设备，器件制造方法和由此制造的器件。 光刻设备是其中通过图案化的辐射束扫描基板的目标部分的扫描类型。 辐射束中的不均匀性可能以基板上的条纹的形式变得可见。 在扫描期间，可以通过如下方式来改善照明的整体均匀性：使得附加的移动被施加到装置的基板台上，以及可选地沿与扫描成一定角度的方向选择的图案形成装置 运动。 版权所有（C）2006，JPO＆NCIPI

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