公开(公告)号：JP2005217398A

公开(公告)日：2005-08-11

申请号：JP2005007226

申请日：2005-01-14

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  LEONARDUS FRANKEN JOHANNES CHR ,  MICKAN UWE ,  VOORMA HARM-JAN

IPC: G02B17/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus, a device manufacturing method for manufacturing a device with high precision, and a device manufactured by the same. SOLUTION: The lithography apparatus comprises: an illumination system IL for providing a projection beam of radiation PB; and a support structure MT for supporting a patterning means MA. The lithographic apparatus further comprises: a substrate table WT for holding a substrate W; a projection system PL for projecting the patterned beam onto a target portion of the substrate W; and a condenser which is structured to transmit a radiation R, received from a first radiation source SO, to the illumination system IL. The condenser K comprises at least one heater for heating the condenser when a condensing component receives substantially no radiation from the radiation source SO. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，用于制造高精度器件的器件制造方法及其制造方法。 光刻设备包括：照明系统IL，用于提供辐射PB的投影光束; 以及用于支撑图案形成装置MA的支撑结构MT。 光刻设备还包括：用于保持衬底W的衬底台WT; 用于将图案化的光束投影到基板W的目标部分上的投影系统PL; 以及构造成将从第一辐射源SO接收的辐射R传送到照明系统IL的冷凝器。 冷凝器K包括至少一个用于加热冷凝器的加热器，当冷凝部件基本上不接收来自辐射源SO的辐射时。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005183973A

公开(公告)日：2005-07-07

申请号：JP2004363842

申请日：2004-12-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  GIESEN PETER THEODORUS M

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

CPC classification number: H01L21/6831 ,  G03F7/707 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device and a manufacturing method for the device. SOLUTION: The lithographic device has an illumination system providing the projection beams of a radiation and an article supporter for supporting a flat article arranged in the beam path of the projection beams of the radiation on the article supporter. The lithographic device further has an electrostatic clamp for fixing the article while brought into contact with the article supporter and a recessed filled-gas supply arranged in the article supporter for supplying the rear side of the article with a filled gas when the article is supported by the article supporter in an electrostatic field during a projection. According to the device, the recessed filled-gas supply has a shielding layer for shielding a path structure from the electrostatic field. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备及其制造方法。 解决方案：光刻设备具有提供辐射的投影光束和物品支撑件的照明系统，用于支撑布置在物品支撑件上的辐射的投影光束的光束路径中的平坦物品。 平版印刷装置还具有用于固定物品的静电夹具，同时与物品支撑件接触并设置在物品支撑件中的凹入的填充气体供应源，用于当物品被填充气体支撑时向物品的后侧供应填充气体 在投影期间静电场中的物品支撑物。 根据该装置，凹入的填充气体源具有用于屏蔽路径结构与静电场的屏蔽层。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005094018A

公开(公告)日：2005-04-07

申请号：JP2004270648

申请日：2004-09-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  BANINE VADIM YEVGENYEVICH

IPC: G03F7/207 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method. SOLUTION: A lithography apparatus is equipped with a radiation system for providing projection radiation beam, a supporting structure for supporting a patterning means which functions to pattern the cross section of the projection beam, a substrate table for holding a substrate, and a projection system for projecting patterned beam onto a target portion of the substrate. The lithography apparatus also has an infrared source for providing infrared radiation to a measurement band in the lithography apparatus, and a detector that receives infrared radiation, which has come from the infrared source and has passed the measurement band, and outputs a signal indicating the existence of gas in the measurement band. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备和设备制造方法。 解决方案：光刻设备配备有用于提供投影辐射束的辐射系统，用于支撑用于对投影光束的横截面进行图案化的图案形成装置的支撑结构，用于保持基板的基板台，以及 投影系统，用于将图案化的光束投影到基板的目标部分上。 光刻设备还具有用于向光刻设备中的测量带提供红外辐射的红外源和接收来自红外源并已经通过测量带的红外辐射的检测器，并输出表示存在的信号 的气体在测量带。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2008060570A

公开(公告)日：2008-03-13

申请号：JP2007217736

申请日：2007-08-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  BAKKER LEVINUS P ,  SCHUURMANS FRANK JEROEN P

IPC: H01L21/027

CPC classification number: G03F7/70916 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus which can reduce or prevent sputtering on optical component relevant to plasma.
SOLUTION: This lithography apparatus is a radiation source constituted so that the radiation for forming a radiation beam is emitted, wherein the radiation includes the radiation source which is a type of generating the plasma in a low-pressure environment in the lithography apparatus, and optical components constituted so that a pattern is given to a cross section of the radiation beam adjusted in order to form a radiation beam with the pattern, the radiation beam with the pattern is projected on a target portion of the substrate, and/or the radiation is detected. A plasma annihilation structure is provided in the optical components, and the plasma annihilation structure is constituted so as to cause the electron-ion recombination inside, above, and/or near the optical components.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够减少或防止与等离子体相关的光学部件上的溅射的光刻设备。 解决方案：该光刻设备是一种辐射源，其被构造成使得用于形成辐射束的辐射被发射，其中辐射包括在光刻设备中在低压环境中产生等离子体的辐射源 以及光学部件，其被构造成使得为了形成具有图案的辐射束而调节的辐射束的横截面被赋予图案，具有图案的辐射束被投影在基板的目标部分上，和/或 检测到辐射。 在光学部件中设置有等离子体湮灭结构，构成等离子体湮灭结构，以使光学部件的内部，上方和/或附近形成电子 - 离子复合。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007096297A

公开(公告)日：2007-04-12

申请号：JP2006249166

申请日：2006-09-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RAKHIMOVA TATYANA V ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN N ,  MOORS JOHANNES HUBERTUS JOSEPH ,  KOVALEV ALEKSANDER S ,  LOPAEV DMITRIY VICTOROVICH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70933 ,  G21K2201/06

Abstract: PROBLEM TO BE SOLVED: To provide a method for cleaning elements of a lithographic device, especially a method for cleaning one or more optical elements of the lithographic device. SOLUTION: This method for cleaning elements of the lithographic device, for example, optical elements such as a collector mirror, includes a step for supplying gas containing nitrogen, a step for forming a radical-containing gas by generating nitrogen radicals from at least a part of the gas containing nitrogen, and a step for supplying at least a part of the radical-containing gas to one or more elements of the lithographic device. The lithographic device comprises a source, an optical element and an electrical discharge generator arranged to generate a radio frequency discharge. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于清洁光刻设备的元件的方法，特别是用于清洁光刻设备的一个或多个光学元件的方法。 解决方案：用于清洁光刻设备的元件的方法，例如诸如集光镜的光学元件，包括供应含氮气体的步骤，通过从中产生氮自由基来形成含自由基的气体的步骤 含有氮气的至少一部分气体，以及用于将至少一部分含自由基的气体供应到光刻设备的一个或多个元件的步骤。 光刻设备包括源，光学元件和布置成产生射频放电的放电发生器。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006279051A

公开(公告)日：2006-10-12

申请号：JP2006088069

申请日：2006-03-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： JACOBS JOHANNES HENRICUS WILHE ,  BANINE VADIM YEVGENYEVICH ,  BREWSTER BARRIE DUDLEY ,  IVANOV VLADIMIR VITALEVITCH ,  MERTENS BASTIAAN MATTHIAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  LIVESEY ROBERT GORDON ,  WOLSCHRIJN BASTIAAN THEODOOR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus that can be used in a vacuum or semi-vacuum environment. SOLUTION: A lithography projection apparatus has a radiation system for supplying projection beams of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, and a projection system for imaging a mask's radiated part onto a target portion of the substrate, wherein at least one gas purge ceiling opening is provided that operates between different zones of the apparatus, and one or more gases are supplied from the opening, the gases out of groups composed of hydrogen, heavy hydrogen, and a mixture of argon and hydrogen. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供可以在真空或半真空环境中使用的光刻设备。 解决方案：光刻投影设备具有用于提供投影射束的辐射系统，设置有用于保持掩模的掩模保持器的掩模台，设置有用于保持基板的基板保持器的基板台，以及投影系统 用于将掩模的辐射部分成像到基板的目标部分上，其中提供在设备的不同区域之间操作的至少一个气体吹扫天花板开口，并且一个或多个气体从开口供应，所述气体组成 的氢，重氢，以及氩和氢的混合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004289116A

公开(公告)日：2004-10-14

申请号：JP2003373442

申请日：2003-09-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER LAAN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  LEENDERS MARTINUS HENDRIKUS AN ,  MOORS JOHANNES HUBERTUS JOSEPH

IPC: G01M11/02 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/706

Abstract: PROBLEM TO BE SOLVED: To obtain a measurement system for measuring wave front aberrations in a lithographic projection apparatus, and thereby at least partially relieve the problems of the conventional technology.
SOLUTION: A lithographic projection apparatus is concerned with the one with a form comprising: a radiation system for obtaining a projection beam of radiation; a supporting structure supporting a patterning element patterning the projection beam according to a target pattern; a substrate table holding a substrate; a projection system projecting the patterned beam to a target section of the substrate; and a measurement system for measuring the wave front aberrations of the projection system. The measurement system includes a diffraction element 7 and a structure for increasing the filling of the radiation beam into the pupil of the projection system. Both of them are movable into the projection beam between the radiation system and the projection system. Moreover, the measurement system includes a sensor module detecting the radiation beam passed through the projection system for measuring the wave front aberration of the projection system.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004282046A

公开(公告)日：2004-10-07

申请号：JP2004045957

申请日：2004-02-23

Applicant: Asml Netherlands Bv ,  Cark Zeiss Smt Ag ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ ,  カール ツァイス エスエムテー アーゲー

Inventor： KURT RALPH ,  VAN BEEK MICHAEL CORNELIS ,  DUISTERWINKEL ANTONIE ELLERT ,  KIEFT ERIK RENE ,  MEILING HANS ,  MERTENS BASTIAAN MATTHIAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  STEVENS LUCAS HENRICUS JOHANNE ,  WOLSCHRIJN BASTIAAN THEODOOR

IPC: G01N21/94 ,  G01N21/27 ,  G01N21/33 ,  G01N21/35 ,  G01N21/956 ,  G03F7/20 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC classification number: G03F7/70916 ,  G01N21/95684

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for measuring the contamination on the surfaces of the constituent components of a lithographic projection apparatus. SOLUTION: The measuring apparatus includes a radiation transmitter for projecting radiation onto at least a part of the surface of each component of a lithographic projection apparatus and a radiation receiver which receives radiation from each constituent component. A processor, which is connected to the radiation receiver through communication, obtains the characteristics of the received radiation, and then determines the characteristics of the contamination on the basis of the radiation characteristics. The measuring apparatus comprises the steps of: projecting the radiation to the surface of each component, receiving the radiation from each component, and determining the characteristics of the contamination on the basis of the received radiation. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2003059827A

公开(公告)日：2003-02-28

申请号：JP2002177248

申请日：2002-06-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER WERF JAN EVERT ,  LOOPSTRA ERIK ROELOF ,  MEILING HANS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  LEENDERS MARTINUS HENDRIKUS AN

IPC: G03F1/16 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/707 ,  G03F7/70233 ,  G03F7/70258 ,  G03F7/70283 ,  G03F7/703

Abstract: PROBLEM TO BE SOLVED: To prevent or to alleviate overlay errors or the like caused by a strain, such as deformation or the like of a mark in a lithography apparatus, having a non-telecentric projection system at the article side used in a method for manufacturing a device.
SOLUTION: The method for manufacturing the device comprises a step of providing a substrate covered with a layer of a radiation-sensitive material, a step of providing a radiation projection beam by using a radiation system, a step of imparting a pattern to a section of the projection beam by using a reflective pattern forming means, and a step of forming an image on the target part of the layer of the radiation sensitive material by projecting the pattern-formed radiation beam, by using the non-telecentric projection system at the article side. The method further comprises the steps of shifting and/or inclining a nominal reflection surface of the pattern forming means, so as to separate from a flat surface of a nominal article of the projection system, and alleviating the strain and/or the overlay error of the projection image.
COPYRIGHT: (C)2003,JPO

Abstract translation: 要解决的问题：为了防止或减轻由在光刻设备中的标记的变形等的应变引起的重叠误差等，其在用于方法中的物品侧具有非远心投影系统 制造设备。 解决方案：用于制造该器件的方法包括提供覆盖有辐射敏感材料层的衬底的步骤，通过使用辐射系统提供辐射投影束的步骤，将图案赋予 通过使用反射图案形成装置的投影束，以及通过使用非远心投影系统在物品上投射图案形成的辐射束在辐射敏感材料的层的目标部分上形成图像的步骤 侧。 该方法还包括以下步骤：移动和/或倾斜图案形成装置的标称反射表面，从而与投影系统的标称物品的平坦表面分离，并减轻应变和/或重叠误差 投影图像。

公开(公告)号：WO2005064411A3

公开(公告)日：2006-01-05

申请号：PCT/NL2004000921

申请日：2004-12-29

Applicant: ASML NETHERLANDS BV ,  BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HEN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHUURMANS FRANK JEROEN PIETER ,  STEVENS LUCAS HENRICUS JOHANNE

Inventor： BANINE VADIM YEVGENYEVICH ,  DE KUSTER JOHANNES PETERUS HEN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHUURMANS FRANK JEROEN PIETER ,  STEVENS LUCAS HENRICUS JOHANNE

IPC: G03F7/20

CPC classification number: G03F7/70908 ,  G03F7/70916

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source (SO) that produces EUV radiation, an illumination system (IL) that provides a beam of the EUV radiation produced by the radiation source, and a support structure (MT) that supports a patterning structure (MA). The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support (WT) that supports a substrate (W), and a projection system (PL) that projects the patterned beam onto a target portion (C) of the substrate. The radiation source includes a debris-mitigation system (6, 7) that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles (3) for interacting with the debris particles (2).

Abstract translation: 公开了一种光刻设备。 光刻设备包括产生EUV辐射的辐射源（SO），提供辐射源产生的EUV辐射束的照明系统（IL）和支持图形结构（MA）的支撑结构（MT） 。 图案形成结构被配置为在其横截面中赋予辐射束图案。 该装置还包括支撑衬底（W）的衬底支撑件（WT）和将图案化的光束投影到衬底的目标部分（C）上的投影系统（PL）。 辐射源包括减轻在产生EUV辐射期间形成的碎片颗粒的碎片减轻系统（6,7）。 碎片减轻系统被配置为提供用于与碎屑颗粒（2）相互作用的附加颗粒（3）。