公开(公告)号：JP2009105443A

公开(公告)日：2009-05-14

申请号：JP2009024156

申请日：2009-02-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system reducing lithography errors arising from the immersion liquid. SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern to its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of immersion liquid from the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。 光刻设备包括：被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够将辐射束赋予其横截面图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 液体供应系统，被配置为至少部分地用液体填充所述投影系统的最终元件和所述基板之间的空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自基底的浸没液体的蒸发的元件。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009088530A

公开(公告)日：2009-04-23

申请号：JP2008250641

申请日：2008-09-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  BIJVOET DIRK-JAN ,  VAN DER ZOUW GERBRAND ,  DE JONG FREDERIK E

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70783 ,  G03F9/7003

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device with a chuck constructed to hold a substrate table, to provide a stage device on which an object is arranged, and to provide a method of manufacturing a device. SOLUTION: Disclosed is the lithography device which includes: an illumination system constructed to adjust a radiation beam; a supporter constructed to support a patterning device capable of generating a pattern imparted emitted beam by giving a pattern on a cross section of an emitted beam; a substrate table constructed to hold a substrate; a projection system constructed to project the pattern imparted radiation beam to a target part of the substrate; a chuck constructed to hold the substrate table; a positioning device for displacing the chuck in use; and a control unit constructed to control the positioning device. The control unit drives the positioning device to excite the chuck by substantially dynamical force that enables deformation of the chuck before positioning the patterning device. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种平版印刷设备，其具有构造成保持基板台的卡盘，以提供其上布置物体的平台装置，并提供制造装置的方法。 解决方案：公开了光刻设备，其包括：构造成调整辐射束的照明系统; 支撑件，其被构造成支撑能够通过在发射光束的横截面上给出图案来产生赋予发射光束的图案的图案形成装置; 构造成保持基板的基板台; 投影系统，被构造成将图案赋予的辐射束投射到基板的目标部分; 夹持构造成夹持衬底台的卡盘; 用于在使用中移动卡盘的定位装置; 以及构造成控制定位装置的控制单元。 控制单元驱动定位装置以通过在定位图案形成装置之前能够使卡盘变形的基本动力来激发卡盘。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009076940A

公开(公告)日：2009-04-09

申请号：JP2008328259

申请日：2008-12-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MERTENS JEROEN JOHANNES SOPHIA ,  VAN MEER ASCHWIN LODEWIJK HEND ,  OTTENS JOOST JEROEN ,  VAN GOMPEL EDWIN AUGUSTINUS MA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: H01L21/67109 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To disclose and provide an apparatus that is equipped with a substrate table for supporting substrate. SOLUTION: A supporting table includes a plurality of supporting protrusions, coming into contact with a substrate when used to support the substrate. This support table includes a plurality of heat transfer protrusions, extending toward the substrate without making contact with the substrate, when the substrate is supported by the supporting protrusions during use. A heat exchange gap, containing a gas for exchanging heat with the substrate, extends between the heat transfer protrusions and the substrate. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：公开并提供装备有用于支撑基板的基板台的装置。 解决方案：支撑台包括多个支撑突起，当用于支撑基板时与支撑基板接触。 该支撑台包括多个传热突起，当基板在使用期间由支撑突起支撑时，朝向基板延伸而不与基板接触。 包含用于与衬底交换热量的气体的热交换间隙在传热突起和衬底之间延伸。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007158309A

公开(公告)日：2007-06-21

申请号：JP2006290478

申请日：2006-10-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZAAL KOEN JACOBUS JOHANNES MAR ,  OTTENS JOOST JEROEN ,  VAN DEN AKKER JEROEN

IPC: H01L21/683 ,  H01L21/027

CPC classification number: G03F7/707 ,  C04B35/195 ,  C04B2235/3203 ,  C04B2235/3244 ,  C04B2235/3255 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide an article support member which is strong and less sensitive to a temperature in a producing process. SOLUTION: In the article support member constituted so that the article to be installed into a beam route of a radiation beam of a lithography device may be supported on the article support, this article support member includes a base plate 1 which is a primary material and a plurality of burls 5 which are the second material bonded to this base plate 1 that is this primary material. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种对制造过程中的温度较强且较不敏感的制品支撑构件。 解决方案：在构造成使得要安装到光刻设备的辐射束的光束路径中的物品可以被支撑在物品支撑件上的物品支撑构件中，该物品支撑构件包括基板1， 主材料和作为该主要材料的作为第二材料的多个毛刺5，该第二材料结合到该基板1。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006157014A

公开(公告)日：2006-06-15

申请号：JP2005342342

申请日：2005-11-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OESTERHOLT RENE ,  BRINKHOF RALPH ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  LEVASIER LEON M ,  OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS JOHANNES MAR ,  SALDEN KOENRAAD STEPHAN S

IPC: H01L21/027 ,  G03F9/00

CPC classification number: G03F7/70783 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To reduce an overlay between two continuous image drawing layers of a substrate of a lithography system by correcting the non-flatness of the substrate and/or a mask table.
SOLUTION: The lithography system includes an illumination system for providing projection beams, a mask table for supporting a mask that gives a pattern to the cross-section of the projection beams, a substrate table that holds the substrate, and a projection system that projects the pattern-formed beams to the target portion of the substrate. The system also includes a processor for calculating an overlay correction value using a reference height map indicating the surface of the substrate table or the mask table. Duet to the present invention, the distortion of a wafer grid produced by the non-flatness during the period of alignment and exposure can be corrected by feed-forward and thus an overlay error caused by the difference in the flatness characteristic can be reduced. A method for indirectly validating the overlay precision about the flatness of an exposure chuck based on the height map information is provided.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：通过校正基板和/或掩模台的非平坦度来减小光刻系统的基板的两个连续图像绘制层之间的覆盖。 光刻系统包括用于提供投影光束的照明系统，用于支撑掩模的掩模台，用于对投影光束的横截面赋予图案;保持基板的基板台，以及投影系统 其将图案形成的光束投影到基板的目标部分。 该系统还包括用于使用指示衬底台或掩模台的表面的参考高度图计算覆盖校正值的处理器。 根据本发明，可以通过前馈来校正在对准和曝光期间由非平坦度产生的晶片网格的变形，从而可以降低由平坦度特性的差异引起的重叠误差。 提供了一种基于高度图信息间接验证关于曝光卡盘的平坦度的重叠精度的方法。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006108696A

公开(公告)日：2006-04-20

申请号：JP2005318812

申请日：2005-10-04

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： COMPEN RENE THEODORUS P ,  OTTENS JOOST JEROEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a cleaning system, and a cleaning method of removing contaminants on site from the lithography apparatus.
SOLUTION: A lithographic apparatus is disclosed. The apparatus includes a cleaning system for cleaning components on site in the lithography apparatus. The cleaning system is constituted so that a cleaning environment is provided in a part adjacent to a predetermined position on a component to be cleaned. The cleaning system is also constituted so that the cleaning environment is provided, substantially independently of the type of contaminant that exists at the predetermined position.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备，清洁系统以及从光刻设备中清除现场污染物的清洁方法。 解决方案：公开了一种光刻设备。 该设备包括用于在光刻设备中清洁现场部件的清洁系统。 清洁系统被构造成使得在与要清洁的部件上的预定位置相邻的部分中设置清洁环境。 清洁系统也构成为提供清洁环境，其基本上独立于存在于预定位置处的污染物的类型。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2012191205A

公开(公告)日：2012-10-04

申请号：JP2012047558

申请日：2012-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  OTTENS JOOST JEROEN ,  EUSSEN EMIEL JOZEF MELANIE ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  WILLIAM PETER VAN DRENT ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  ERIK WILLEM BOGAART

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a position measurement system for accurately measuring a substrate table position.SOLUTION: The lithographic apparatus comprises: a substrate table position measurement system for measuring a substrate table position; and a projection system position measurement system for measuring a projection system position. The substrate table position measurement system comprises: a substrate table reference element mounted on the substrate table; and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to a holding plane of a substrate on the substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

Abstract translation: 要解决的问题：提供一种包括用于精确测量衬底台位置的位置测量系统的光刻设备。 光刻设备包括：用于测量衬底台位置的衬底台位置测量系统; 以及用于测量投影系统位置的投影系统位置测量系统。 衬底台位置测量系统包括：安装在衬底台上的衬底台参考元件; 和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012151490A

公开(公告)日：2012-08-09

申请号：JP2012063528

申请日：2012-03-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  BIJVOET DIRK-JAN ,  VAN DER ZOUW GERBRAND ,  DE JONG FREDERIK E

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70783 ,  G03F9/7003

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a chuck constructed to hold a substrate table, a stage apparatus for positioning an object, and a device manufacturing method.SOLUTION: The lithographic apparatus comprises: an illumination system IL configured to condition a radiation beam; a support MT constructed to support a patterning device MA which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table WT constructed to hold a substrate W; a projection system PS configured to project the patterned radiation beam onto a target portion of the substrate; a chuck constructed to hold the substrate table WT; a positioning device for, in use, displacing the chuck; and a control unit configured to control the positioning device. The control unit is arranged to drive the positioning device to excite the chuck by a substantially dynamic force to enable deformation of the chuck.

Abstract translation: 要解决的问题：提供一种包括夹持基板台的卡盘，用于定位物体的平台装置和装置制造方法的光刻设备。 解决方案：光刻设备包括：被配置为调节辐射束的照明系统IL; 构造成支撑图案形成装置MA的支撑件MT，其能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底W的衬底台WT; 投影系统PS被配置为将图案化的辐射束投影到基板的目标部分上; 构造成夹持衬底台WT的卡盘; 用于在使用中移动卡盘的定位装置; 以及控制单元，被配置为控制所述定位装置。 控制单元布置成驱动定位装置以通过基本上动态的力来激励卡盘，以使卡盘变形。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012114469A

公开(公告)日：2012-06-14

申请号：JP2012055739

申请日：2012-03-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG FREDERIK E ,  BEEMS MARCEL HENDRIKUS MARIA ,  VAN DEN BRINK MARINUS AART ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LEVACIA LEON MARTIN ,  VAN DER MEULEN FRITS ,  OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS J M ,  JOHANNES DROSTE RICHARD BERNARDUS ,  DE KLERK JOHANNES W ,  WANTEN PETER FRANCISCUS ,  VAN DER HOEVEN JAN CORNELIS ,  KADIJK EDWIN CORNELIS ,  DE JONG MARTEIJN ,  ANSTOTZ DAVID LUCIEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is disposed.SOLUTION: A liquid immersion lithographic apparatus includes a drain configured to drain liquid through a gap between an edge of a substrate and a substrate table on which the substrate is supported. The drain comprises: means for feeding the liquid to the drain regardless of a position of the substrate table; and/or means for saturating gas in the drain. These means reduce fluctuation of heat loss due to evaporation of the liquid in the drain.

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和其上放置物体的基板台之间的间隙排出。 解决方案：液浸式光刻设备包括被配置为通过衬底的边缘和衬底台之间的间隙排出液体的漏极，衬底台被支撑在衬底台上。 排水口包括：无论基板台的位置如何，将液体供给到排水口的装置; 和/或用于在排水管中使气体饱和的装置。 这些意味着减少由于排水管中液体的蒸发导致的热损失的波动。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010010695A

公开(公告)日：2010-01-14

申请号：JP2009190091

申请日：2009-08-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  ZAAL KOEN JACOBUS JOHANNES MARIA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method for manufacturing device, which perform good backfill gas feed. SOLUTION: The lithographic apparatus includes: an illumination system for providing a projection beam of radiation; an article support for supporting a flat article to be placed in a beam path of the projection beam of radiation on the article support, including a plurality of supporting protrusions, the plurality of protrusions defining a support zone for providing a flat plane of support; and a backfill gas feed, which is arranged in the support zone, for providing a flow of a backfill gas to a backside of the article when supported by the article support, the backfill gas providing an improved thermal conduction between the article and the article support. The support zone is surrounded by a boundary zone having a lower height relative to the plane of support, so that the flow of the backfill gas is not bound to the support zone. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供执行良好回填气体进料的光刻设备和制造装置的方法。 光刻设备包括：用于提供投影射线束的照明系统; 用于支撑将物品放置在物品支撑件上的投射辐射束的光束路径中的物品支撑件，包括多个支撑突起，所述多个突出部限定用于提供平坦的支撑平面的支撑区域; 以及设置在所述支撑区域中的回填气体进料，用于当由所述物品支撑件支撑时，将所述回填气体的流动提供到所述物品的后侧，所述回填气体在所述物品与所述物品支撑件之间提供改进的热传导 。 支撑区被相对于支撑平面具有较低高度的边界区围绕，使得回填气体的流动不与支撑区域结合。 版权所有（C）2010，JPO＆INPIT