公开(公告)号：JP2006196898A

公开(公告)日：2006-07-27

申请号：JP2006003343

申请日：2006-01-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOOGAARD ARJEN ,  SENGERS TIMOTHEUS FRANCISCUS ,  MARIA KETELAARS WILHELMUS SEBA ,  SPEE CAROLUS IDA MARIA ANTONIU

IPC: H01L21/027

CPC classification number: G03F7/70058 ,  G03B27/42 ,  G03F7/70716 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an lithography apparatus capable of reducing or eliminating attachments of contaminated materials to the various kinds of exposure apparatus components.
SOLUTION: The main features of this invention is that the coating, comprising semiconductor, photocatalyst, and/or metal oxide, is provided at least to various kinds of the exposure apparatus components, such as a sensor arranged for the base table of the lithography apparatus.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 解决的问题：提供能够减少或消除污染物质对各种曝光装置部件的附着物的光刻装置。 解决方案：本发明的主要特征在于，包括半导体，光催化剂和/或金属氧化物的涂层至少设置在各种曝光装置部件上，例如布置在基台的传感器 光刻设备。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2012119720A

公开(公告)日：2012-06-21

申请号：JP2012027270

申请日：2012-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  ALEXEI KOLESNE TCHENKO ,  ERIK ROHLOFF ROPESTRA ,  MEIJER HENDRICUS JOHANNES MARIA ,  MERTENS JEROEN JOHANNES SOPHIA M ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOHANNES THEODOOR ,  ALEXANDER STOLE YALE ,  BOB STREEFKERK ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which the space between the final element of a projection system, where the liquid loss from a supply system is minimized during exposure of the edge part of a substrate, and the substrate is filled with a liquid.SOLUTION: An edge sealing member 17 has an upper primary surface which is substantially in flush with the upper primary surface of a substrate W, and surrounds the substrate W or other object on a substrate table at least partially. Consequently, catastrophic liquid loss is prevented when the image at an edge part of the substrate W is captured or the edge part is illuminated even if the section under a projection lens PL is operated.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中在基板的边缘部分的曝光期间来自供应系统的液体损失最小化的投影系统的最终元件之间的空间和基板 充满液体。 解决方案：边缘密封构件17具有与基板W的上主表面基本上齐平的上主表面，并且至少部分地围绕基板W或基板台上的其它物体。 因此，即使拍摄基板W的边缘部分的图像或边缘部分被照亮，即使投影透镜PL下的部分被操作，也可以防止灾难性的液体损失。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010212713A

公开(公告)日：2010-09-24

申请号：JP2010102149

申请日：2010-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MERTENS JEROEN JOHANNES SOPHIA M ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOHANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projector in which the space between a final element of a projecting system and a substrate is filled with a liquid. SOLUTION: An edge sealing member 17 surrounds at least a part of a substrate W or other objects on a substrate table WT to prevent catastrophic liquid loss, when the edge of the substrate is imaged or illuminated. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻投影仪，其中投影系统的最终元件和基板之间的空间被填充液体。 解决方案：当基板的边缘成像或照明时，边缘密封构件17围绕基板W或基板台WT上的其它物体的至少一部分，以防止灾难性的液体损失。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008288619A

公开(公告)日：2008-11-27

申请号：JP2008219416

申请日：2008-08-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection apparatus.
SOLUTION: In the immersion-type lithography apparatus, an immersion liquid is confined between a final element of a projection system and a substrate. Both of hydrophobic and hydrophilic layers are used on various elements of the apparatus. The use of them helps to prevent air-bubble formation in the immersion liquid, and reduce residues remained on the elements after immersion in the immersion liquid.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没型光刻投影装置。 解决方案：在浸没式光刻设备中，浸没液体被限制在投影系统的最终元件和基板之间。 疏水层和亲水层都用在装置的各种元件上。 它们的使用有助于防止浸入液体中的气泡形成，并且减少浸入浸液中之后残留在元件上的残留物。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007235179A

公开(公告)日：2007-09-13

申请号：JP2007159104

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBER ,  KOLESNYCHENKO ALEKSEY ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  MULKENS JOHANNES CATHARINUS HU ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  SIMON KLAUS ,  DE SMIT JOANNES THEODOOR ,  STRAAIJER ALEXANDER ,  STREEFKERK BOB ,  BIJLAART ERIK THEODORUS MARIA ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  VAN SANTEN HELMAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  MERTENS JEROEN JOHANNES SOPHIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion type lithography projection apparatus with improved functionality. SOLUTION: The lithography projection apparatus includes: a radiation system Ex, IL also equipped with a radiation source LA, for providing the projection beams PB of radiation; a first object table (mask table) MT connected to a first positioning means, for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to a second positioning means, for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of the radiated part of the mask MA on the target part C of the substrate W. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 光刻投影设备包括：辐射系统Ex，IL，其还配备有辐射源LA，用于提供辐射的投影光束PB; 连接到第一定位装置的第一目标表（掩模台）MT，用于相对于构件PL正确定位掩模; 连接到第二定位装置的第二对象台（衬底台）WT，用于相对于构件PL正确定位衬底; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007053377A

公开(公告)日：2007-03-01

申请号：JP2006221569

申请日：2006-08-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  SENGERS TIMOTHEUS FRANCISCUS ,  KUIJPER ANTHONIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70616

Abstract: PROBLEM TO BE SOLVED: To adjust a conventional lithography equipment to an environment of immersion. SOLUTION: In the lithography projection equipment, a liquid supply system and an object W on a substrate table WT are arranged to prevent a high-speed immersion liquid from flowing onto a sensor S. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：将常规光刻设备调整到浸没环境。 解决方案：在光刻投影设备中，布置液体供应系统和衬底台WT上的物体W，以防止高速浸没液体流入传感器S.版权所有（C）2007 ，JPO＆INPIT

公开(公告)号：JP2007027732A

公开(公告)日：2007-02-01

申请号：JP2006191025

申请日：2006-07-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK ROELOF ,  BLEEKER ARNO JAN ,  MULDER HEINE M ,  NOORDMAN OSCAR FRANCISCUS J ,  SENGERS TIMOTHEUS FRANCISCUS ,  JORRITSMA LAURENTIUS C ,  TRENTELMAN MARK ,  STREUTKER GERRIT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70733 ,  G03F7/70208 ,  G03F7/70283 ,  G03F7/70466

Abstract: PROBLEM TO BE SOLVED: To provide a lithography equipment of enhanced productivity. SOLUTION: The stage equipment holds two pattern forming apparatus 42 and 43. The pattern forming apparatus are so arrayed that the distance between patterns in scanning direction agrees with the length of the pattern in the scanning direction. So, a first chip is exposed with a first pattern 44, and a second chip that adjoins the first chip is skipped. Then a second pattern 45 is used to expose a third chip that adjoins the second chip, for an improved exposure sequence. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种提高生产率的光刻设备。

解决方案：平台设备保持两个图案形成装置42和43.图案形成装置如此排列，使得扫描方向上的图案之间的距离与图案在扫描方向上的长度一致。 因此，第一芯片以第一图案44曝光，并且跳过与第一芯片相邻的第二芯片。 然后使用第二图案45来暴露与第二芯片相邻的第三芯片，以改善曝光顺序。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2012114484A

公开(公告)日：2012-06-14

申请号：JP2012066780

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：浸没型光刻投影装置包括：辐射系统Ex，IL，其设置有辐射源LA并且提供放射线的投影束PB; 连接到用于相对于构件PL正确定位掩模的第一定位装置的第一对象表（掩模台）MT; 连接到用于相对于构件PL正确定位衬底的第二定位装置的第二对象台（衬底台）WT; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012054602A

公开(公告)日：2012-03-15

申请号：JP2011243516

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2009283970A

公开(公告)日：2009-12-03

申请号：JP2009176829

申请日：2009-07-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.
SOLUTION: The immersion lithographic projection apparatus is disclosed in which immersion liquid is provided between the last element of a projection system and a substrate. The use of both hydrophobic and hydrophilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the immersion liquid and to help reduce residue on the elements after being in contact with the immersion liquid.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供浸没式光刻投影装置。 公开了浸没式光刻投影装置，其中浸没液体设置在投影系统的最后一个元件和基板之间。 提供了在设备的各种元件上使用疏水层和亲水层两者以帮助防止在浸液中形成气泡并有助于在与浸液接触之后减少元件上的残留物。 版权所有（C）2010，JPO＆INPIT