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    Printer and device manufacturing method
    13.
    发明专利
    Printer and device manufacturing method 有权
    打印机和设备制造方法

    公开(公告)号：JP2005268779A

    公开(公告)日：2005-09-29

    申请号：JP2005058315

    申请日：2005-03-03

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： SIMON KLAUS

    IPC: G03F7/20 ,  B05C1/06 ,  B05C1/08 ,  B05D3/00 ,  H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To provide a pattern forming device, a printer, and a device manufacturing method which achieve low manufacturing and usage cost, and imprinting in nanometers.
    SOLUTION: By using a bent member, on which a stamp surface having a pattern, is supported, the bent member is rolled on a substrate to be printed. A resist layer is formed on the substrate. An irradiation system is further provided for irradiating a contact region in between the stamp surface and the substrate. The resist layer is cured in a predetermined region by irradiation light irradiated through the pattern, and imprinting in nanometers is enabled.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种图案形成装置，打印机和实现低制造和使用成本并以纳米压印的装置制造方法。 解决方案：通过使用支撑具有图案的印模表面的弯曲构件，将弯曲构件在要印刷的基板上滚动。 在基板上形成抗蚀剂层。 还设置有照射系统，用于照射印模表面和基底之间的接触区域。 抗蚀剂层通过照射通过图案的照射光在预定区域中固化，并且能够进行纳米压印。 版权所有（C）2005，JPO＆NCIPI

    Method for manufacturing device, device manufactured by the method, and computer program
    14.
    发明专利
    Method for manufacturing device, device manufactured by the method, and computer program 有权
    制造装置的方法，由方法制造的装置和计算机程序

    公开(公告)号：JP2003318105A

    公开(公告)日：2003-11-07

    申请号：JP2003106573

    申请日：2003-04-10

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VAN DE MOOSDIJK MICHAEL JOSEPH ,  SIMON KLAUS ,  VAN DEN BRINK ENNO

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70475 ,  G03F7/70466

    Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a device, which minimizes or eliminates at least a portion of error sources in positional adjustment of adjacent exposure portions.
    SOLUTION: A projection field is selected so as to minimize a stitching error, in order to print a layer of an extended device, i.e., a device extending into a plurality of target portions or dies. It is desirable that the projection field is selected based on the data characterizing a used projection lens, and in such a way that the difference between positional errors of a projected image at the side opposite to the field is minimized.
    COPYRIGHT: (C)2004,JPO

    Abstract translation: 要解决的问题：提供一种使相邻曝光部分的位置调整中的误差源的至少一部分最小化或消除的装置的制造方法。

    解决方案：选择投影场以便最小化缝合误差，以便打印延伸装置的层，即延伸到多个目标部分或管芯中的装置。 期望基于表征所使用的投影透镜的数据来选择投影场，并且使得与场的相反侧的投影图像的位置误差之间的差最小化。 版权所有（C）2004，JPO

    Imprint lithography
    15.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2012227555A

    公开(公告)日：2012-11-15

    申请号：JP2012180407

    申请日：2012-08-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SIMON KLAUS

    IPC: H01L21/027 ,  B29C59/04

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide lithography capable of a high resolution imprint.SOLUTION: An imprint method is disclosed. In one example, separated first and second target regions made of an imprintable medium on a substrate are brought into contact with first and second templates, respectively, to form first and second imprints in the imprintable medium, and then the first and second templates are removed from the imprinted medium.

    Abstract translation: 要解决的问题：提供能够进行高分辨率印记的光刻。 解决方案：公开了一种压印方法。 在一个示例中，分离的由可压印介质构成的分离的第一和第二目标区域分别与第一和第二模板接触，以在可压印介质中形成第一和第二印记，然后移除第一和第二模板 从印记媒体。 版权所有（C）2013，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    16.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012151488A

    公开(公告)日：2012-08-09

    申请号：JP2012061787

    申请日：2012-03-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

    IPC: H01L21/027 ,  G02B13/00 ,  G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

    Abstract: PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller configured to adjust temperature of a member in the final stage of a projection exposure apparatus PL, a substrate, and immersion liquid to common target temperature T4. Imaging consistency and whole performance can be improved, by adjusting all of the temperatures of these structural members and by reducing temperature gradients. Means used to adjust the temperature may include controlling a flow rate and the temperature of the immersion liquid via a feedback circuit.

    Abstract translation: 要解决的问题：为了减少由于浸没投影曝光装置中的基板和浸没液体中的温度梯度引起的图像失真。 解决方案：浸没式光刻设备包括温度控制器，其被配置为将投影曝光设备PL，基板和浸没液体的最终级中的部件的温度调节到共同的目标温度T4。 通过调整这些结构件的所有温度和降低温度梯度，可以提高成像的一致性和整体性能。 用于调节温度的手段可以包括通过反馈电路来控制浸入液体的流量和温度。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    18.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2010153913A

    公开(公告)日：2010-07-08

    申请号：JP2010070092

    申请日：2010-03-25

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  JOERI LOF ,  SIMON KLAUS ,  STRAAIJER ALEXANDER

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70258 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70891

    Abstract: PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and an immersion liquid in an immersion projection exposure apparatus.
    SOLUTION: The immersion lithography apparatus comprises a temperature controller configured to adjust temperatures of a member in the final stage of a projection exposure apparatus PL, a substrate, and the immersion liquid to a common target temperature. Controlling the temperatures of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperatures may include controlling the immersion liquid flow rate and liquid temperature via a feedback circuit.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：为了减少浸没投影曝光装置中的基板和浸没液中的温度梯度引起的图像失真。 浸渍光刻设备包括温度控制器，其被配置为将投影曝光设备PL，基板和浸没液体的最终阶段中的部件的温度调节到共同的目标温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括通过反馈电路控制浸没液体流速和液体温度。 版权所有（C）2010，JPO＆INPIT

    Imprint lithography
    19.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2010016405A

    公开(公告)日：2010-01-21

    申请号：JP2009237982

    申请日：2009-10-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SIMON KLAUS

    IPC: H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of microfabrication without requiring expensive equipments and materials. SOLUTION: The lithographic apparatus is disclosed that has a first substrate table 31 arranged to hold a substrate and a second substrate table 32 arranged to hold a substrate, an imprint template holder 41 arranged to hold an imprint template 40, and an imprintable medium dispenser 36, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is movable between the first and second positions, such that the first and second substrate tables swap positions. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够进行微细加工而不需要昂贵的设备和材料的光刻设备。 解决方案：公开了光刻设备，其具有布置成保持基板的第一基板台31和布置成保持基板的第二基板台32，设置成保持印模模板40的压印模板保持器41和可压印 介质分配器36，其中所述第一基板台可在位于所述可压印介质分配器处或邻近所述可压印介质分配器的第一位置与位于所述压印模板保持器之间或邻近所述压印模板保持器的第二位置之间移动，并且所述第二基板台可在所述第一和 第二位置，使得第一和第二衬底台交换位置。 版权所有（C）2010，JPO＆INPIT

    Imprint lithography
    20.
    发明专利
    Imprint lithography 审中-公开
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2009147380A

    公开(公告)日：2009-07-02

    申请号：JP2009072540

    申请日：2009-03-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SIMON KLAUS

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography capable of a high resolution imprint.
    SOLUTION: An imprint method is disclosed. In one example, spaced-apart first and second target regions made of an imprintable medium on a substrate are brought into contact with first and second templates, respectively, to form first and second imprints in the imprintable medium, and then the first and second templates are removed from the imprinted medium.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够进行高分辨率印记的光刻。 解决方案：公开了一种压印方法。 在一个示例中，分别在衬底上由可压印介质制成的间隔开的第一和第二目标区域分别与第一和第二模板接触，以在可压印介质中形成第一和第二印记，然后形成第一和第二模板 从印迹介质中移除。 版权所有（C）2009，JPO＆INPIT

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