公开(公告)号：JP2009164622A

公开(公告)日：2009-07-23

申请号：JP2009043678

申请日：2009-02-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERHAGEN MARTINUS CORNELIS MAR ,  JANSEN HANS ,  STAVENGA MARCO KOERT ,  VERSPAY JACOBUS JOHANNUS L H

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, and to provide a device manufacturing method. SOLUTION: A liquid supply system is configured to supply a liquid to a region between a substrate W and a projection system PL of the lithographic apparatus, and has a liquid confinement structure 12 fixed in a plane substantially perpendicular to an optical axis of the projection system PL and configured to hold the substrate W in order to restrict the liquid to a region above an upper surface of a substrate table WT so that a side of the substrate W to be exposed is substantially covered with the liquid during exposure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，并提供一种器件制造方法。 解决方案：液体供应系统被配置为将液体供应到基板W和光刻设备的投影系统PL之间的区域，并且具有固定在基本上垂直于光刻设备的光轴的平面中的液体限制结构12 投影系统PL并且被配置为保持基板W，以便将液体限制在基板台WT的上表面上方的区域，使得在曝光期间待暴露的基板W的一侧基本上被液体覆盖。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009117832A

公开(公告)日：2009-05-28

申请号：JP2008282841

申请日：2008-11-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER HEIJDEN MARCUS THEODOO ,  STAVENGA MARCO KOERT ,  WONG PATRICK ,  VAN DEN BOGAARD FREDERICK JOHA ,  DE VRIES DIRK ,  BESSEMS DAVID ,  MYCKE JACQUES ROGER ALICE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/11 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a substrate for reducing a contamination source to be used for a lithography projection device. SOLUTION: The substrate W comprises a sealing coating 106 covering at least part of a first interface between two layers 100, 102 on the substrate or between each layer and the substrate without extending to a central portion of the substrate. The sealing coating is used for providing the substrate which is used for the lithography projection device for reducing a risk of contaminating one or more components of immersion liquid and a lithography device, and a device manufacturing method. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少用于光刻投影装置的污染源的基板。 解决方案：衬底W包括密封涂层106，其覆盖衬底上的两个层100,102之间或每个层与衬底之间的第一界面的至少一部分而不延伸到衬底的中心部分。 密封涂层用于提供用于光刻投影装置的基板，用于降低污染浸入液体的一种或多种组分和光刻装置的风险，以及装置制造方法。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008277854A

公开(公告)日：2008-11-13

申请号：JP2008161707

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning the inside of a liquid immersion lithographic apparatus. SOLUTION: A cleaning fluid is introduced into a space between the projection system and the substrate table of the lithographic apparatus using the liquid supply system of the lithographic apparatus. Additionally or replacing above, a cleaning device is installed on the substrate table, or an ultrasonic emitter is provided for generating an ultrasonic liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗液浸式光刻设备内部的方法和设备。 解决方案：使用光刻设备的液体供应系统将清洁流体引入到光刻设备的投影系统和基板台之间的空间中。 另外或者更换以上，清洁装置安装在基板台上，或者提供超声发射器用于产生超声波液体。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006054468A

公开(公告)日：2006-02-23

申请号：JP2005233909

申请日：2005-08-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHE ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VAN MEER ASCHWIN LODEWIJK HEND ,  MERTENS JEROEN JOHANNES SOPHIA ,  DE MOL CHRISTIANUS GERARDUS MA ,  MUITJENS MARCEL JOHANNUS ELISA ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABET ,  STAVENGA MARCO KOERT ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MAR ,  VERSPAIJ JACOBUS JOHANNUS LEON ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  NIHTIANOV STOYAN ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PET ,  JANSSEN FRANCISCUS JOHANNES JO ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system for reducing lithographic errors caused by immersion liquid. SOLUTION: A lithography apparatus comprises an illumination system so constituted as to control a radiation beam, a support so constituted as to support a pattern forming device which imparts patterns on a crosssection of the radiation beam to form a patternized radiation beam, a substrate table so constituted as to hold a substrate, a projection system so constituted as to project the patternized radiation beam on the target of the substrate, a liquid supply system so constituted as to fill at least part of a space between a final element of the projection system and the substrate with the liquid, a sealing member so disposed as to substantially enclose the liquid inside the space between the final element of the projection system and the substrate, and an element for controlling and/or compensate evaporation of the immersion liquid from the substrate. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种减少浸没液引起的平版印刷误差的系统。 解决方案：光刻设备包括照明系统，其被构造成控制辐射束，支撑件被构造成支撑图案形成装置，其在辐射束的横截面上施加图案以形成图案化的辐射束， 衬底台，其被构造成保持衬底;投影系统，其被构造成将图案化的辐射束投射到衬底的靶上;液体供应系统，其被构造成填充所述衬底的最终元件之间的至少一部分空间; 投影系统和具有液体的基板，密封构件，其被设置为基本上将液体包围在投影系统的最终元件和基板之间的空间内，以及用于控制和/或补偿浸没液体的蒸发的元件 底物。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2012069981A

公开(公告)日：2012-04-05

申请号：JP2011250615

申请日：2011-11-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  FELSPINE JACOBUS JOHANNES LEONARDUS HENDRICKS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KUIPER ANTONY

IPC: H01L21/027

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion liquid containing one or more additives for solving the problem of stain appearance when drying areas wetted by the liquid in immersion exposure.SOLUTION: A device manufacturing method includes adding a component having a vapor pressure greater than 0.1 IcPa to a liquid and exposing a photosensitive substrate to radiation, in which the radiation passes through the aqueous liquid containing the component before reaching the photosensitive substrate. Since the addition of the component increases an ion concentration in the liquid, the immersion liquid is provided containing an ion-forming component, e.g. an acid or a base having a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract translation: 要解决的问题：提供一种含有一种或多种添加剂的浸渍液体，用于解决在浸渍曝光中被液体润湿的干燥区域时污点外观的问题。 解决方案：一种器件制造方法包括将具有大于0.1IpaPa的蒸气压的组分添加到液体中，并将​​光敏衬底暴露于辐射，其中辐射在到达感光衬底之前通过含有组分的水性液体。 由于添加该组分会增加液体中的离子浓度，因此提供含有离子形成组分的浸渍液，例如， 具有较高蒸气压的酸或碱。 还提供了使用浸液的光刻工艺和光刻系统。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010219510A

公开(公告)日：2010-09-30

申请号：JP2010029605

申请日：2010-02-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HUBERTUS MULKENS JOHANNES C ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SERGEI SHULEPOV ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  CROMWIJK JAN WILLEM ,  MEIJERS RALPH JOSEPH ,  FABRIZIO EVANGELISTA ,  BESSEMS DAVID ,  LI HUA ,  JOCHEMSEN MARINUS ,  GUNTHER PIETER LEIN JOSEPH ,  BELL FRANCISCUS WILHELMUS ,  WITBERG ERIK ,  SMITS MARCUS AGNES JOHANNES ,  MA ZHENHUA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a method of controlling the same, and a device manufacturing method, wherein defects of imaging are reduced or eliminated. SOLUTION: The method includes the steps of: moving a substrate table supporting a substrate relative to a projection system; and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, and/or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate. The step of adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation onto a target portion of the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其控制方法以及减少或消除成像缺陷的器件制造方法。 解决方案：该方法包括以下步骤：相对于投影系统移动支撑衬底的衬底台; 以及在所述基板的边缘处或附近的预定区域内的目标成像期间调整所述基板台和所述投影系统之间的扫描速度，和/或调整所述基板的边缘处或其附近的预定区域中的相邻目标位置之间的步进速度 衬底的边缘。 调整扫描和/或步进速度的步骤可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009290212A

公开(公告)日：2009-12-10

申请号：JP2009126877

申请日：2009-05-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLOIN CHRISTIAN GERARDUS NORBE ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  GUNTHER WILFRED MATHIJS ,  VAN DER WEKKEN MICHAEL CHRISTI

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. SOLUTION: The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the substrate table, or (iii) a surface of the shutter member, or (iv) an arbitrary combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种包括工作台，活门构件，流体处理结构和流体抽出系统的光刻投影装置。 流体处理结构可以被配置为在投影系统和（i）基板之间供应和限制液体，或（ii）基板台，或（iii）挡板部件的表面，或（iv ）选自（i） - （iii）中的任意组合。 活门构件的表面可以与桌子的表面邻接并且共面。 活门构件和桌子的表面可以间隔开间隙。 流体提取系统可以构造成从间隙去除液体。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009267405A

公开(公告)日：2009-11-12

申请号：JP2009100475

申请日：2009-04-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE GRAAF ROELOF FREDERIK ,  VAN DER NET ANTONIUS JOHANNUS ,  STAVENGA MARCO KOERT ,  CUIJPERS JOHANNES WILHELMUS JA ,  VAN DEN HEUVEL MARTINUS WILHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a method of detecting particles in liquid immersion fluid in a lithography device or in liquid immersion fluid from the lithography device. SOLUTION: The method includes, using a vacuum system, extracting a sample from a single phase flow of liquid immersion fluid of a fluid handling structure of a lithography device or from a fluid handling structure. The method includes detecting particles in a sample, and when detected particles exceed a particular threshold, starting a signal. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种检测光刻装置中的液浸液体或来自光刻装置的液浸液体中的颗粒的方法。 解决方案：该方法包括使用真空系统，从光刻装置的流体处理结构的液浸流体的单相流或从流体处理结构提取样品。 该方法包括检测样品中的颗粒，并且当检测到的颗粒超过特定阈值时，启动信号。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009117879A

公开(公告)日：2009-05-28

申请号：JP2009048424

申请日：2009-03-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERSPAIJ JACOBUS JOHANNUS LEON ,  JANSEN HANS ,  STAVENGA MARCO KOERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70608 ,  G03F7/70808 ,  G03F7/70858

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device manufacturing method. SOLUTION: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan view substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain the liquid and a surrounding configured not to contain the liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供光刻设备和设备制造方法。 解决方案：在将浸没液体供应到局部空间的浸没式光刻设备中，基本上平行于基板的平面图中的空间基本上为多边形。 在一个实施例中，空间的两个角部具有不大于构造成容纳液体的空间与构造成不含有液体的周边之间的过渡区域的宽度的曲率半径。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007318129A

公开(公告)日：2007-12-06

申请号：JP2007129288

申请日：2007-05-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  ANTONIUS LEENDERS MARTINUS HEN ,  WANTEN PETER FRANCISCUS ,  CUIJPERS JOHANNES WILHELMUS JA ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS COR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/68735 ,  G03F7/70916 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively cleaning an immersion lithographic equipment. SOLUTION: The immersion lithographic equipment comprises a substrate so configured as to hold a substrate, a projection system configured to project a patterned radiation beam onto the substrate, a megasonic transducer configured to clean a surface, and a liquid supply system configured to supply a liquid between the megasonic transducer and the surface to be cleaned. The surface of the immersion lithography projector is cleaned using megasonic waves generated from the megasonic transducer configured to clean the surface. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地清洗浸没式光刻设备的方法。 浸没式光刻设备包括被配置为保持基板的基板，被配置为将图案化的辐射束投影到基板上的投影系统，配置成清洁表面的兆声传感器，以及配置为 在超声波换能器和要清洁的表面之间提供液体。 浸没式光刻投影仪的表面使用由构造成清洁表面的兆声传感器产生的兆声波来清洁。 版权所有（C）2008，JPO＆INPIT