公开(公告)号：JP2011014901A

公开(公告)日：2011-01-20

申请号：JP2010142155

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERKVENS PAUL PETRUS JOANNES ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure that reduces a change in refractive index and a focusing error resulting from a temperature change in a space by reducing a temperature change while in the fluid handling structure of immersion liquid provided to the space by the fluid handling structure.SOLUTION: The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and a contacting surface facing to the fluid handling structure. The fluid handling structure includes a supply passage formed therein for passing fluid through the fluid handling structure from the outside to the space, and a heat insulator positioned at least partly adjacent to the supply passage in order to thermally insulate fluid in the supply passage from a heat load induced in the fluid handling structure.

Abstract translation: 要解决的问题：提供一种流体处理结构，其通过降低温度变化而在空间中的温度变化引起的折射率变化和聚焦误差减小，同时在由 流体处理结构。解决方案：流体处理结构被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的接触表面之间的空间中。 流体处理结构包括形成在其中的供应通道，用于将流体从外部传递到空间;以及绝热体，其至少部分地邻近供应通道定位，以将供应通道中的流体与 在流体处理结构中引起的热负荷。

公开(公告)号：JP2010109367A

公开(公告)日：2010-05-13

申请号：JP2009242950

申请日：2009-10-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STEFFENS KOEN ,  VAN DER HAM RONALD ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To disclose a seal between a table and a component in a lithographic apparatus. SOLUTION: The seal straddles a gap between a component and a table when the component is disposed at a certain position relative to the table. The component is moveable relative to the table when in use, and in are embodiment, it is fixed to the table. The seal can be integrated with the component or the table. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开在平版印刷设备中的工作台和部件之间的密封。 解决方案：当组件相对于工作台设置在某一位置时，密封件跨越组件和工作台之间的间隙。 组件在使用时相对于桌子是可移动的，而在实施例中，它被固定在桌子上。 密封件可以与组件或工作台集成。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009231838A

公开(公告)日：2009-10-08

申请号：JP2009065329

申请日：2009-03-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  KEMPER NICOLAAS R ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DANNY MARIA HUBERTUS PHILIPS ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  MARCUS JOHANNES VAN DER ZANDEN ,  PIETER MULDER

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide: an apparatus which can remove droplets and/or a thin film from the surface of a substrate more effectively, and a gas knife device improved in performance. SOLUTION: In an immersion lithographic apparatus, for instance, a droplet removing device uses an inclined gas flow from a gas knife during exposure to remove droplets from the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决的问题：提供：能够更有效地从基板的表面除去液滴和/或薄膜的装置，以及提高性能的气刀装置。 解决方案：在浸没式光刻设备中，例如，液滴去除装置在曝光期间使用来自气刀的倾斜气流从基板去除液滴。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012238868A

公开(公告)日：2012-12-06

申请号：JP2012157590

申请日：2012-07-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHAEL ,  KUIPER ANTONY ,  STEFFENS KOEN ,  BAETEN ADRIANES JOHANNES ,  ANTONEVICI ANCA MIHAELA

IPC: H01L21/027

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus by which a two-phase flow can be stabilized and/or at least substantially separated into liquid and gas flows, and desirably substantially minimized.SOLUTION: In order to allow a liquid-rich flow to preferentially flow along a surface, gas of a two-phase flow is more easily diverted and enters a dry chamber 127 via a gap between a divider 124 and a second wall 123. The width of a channel 125, as well as a surface coating thereon if desired, encourages the liquid to enter and the gas not to enter.

Abstract translation: 要解决的问题：提供一种浸入式光刻设备，通过该浸没式光刻设备，两相流可以被稳定和/或至少基本上分离成液态和气体流，并且期望地基本上最小化。 解决方案：为了使液体丰富的流优先沿着表面流动，两相流的气体更容易转向并经由分隔件124和第二壁123之间的间隙进入干燥室127 如果需要，通道125的宽度以及其上的表面涂层鼓励液体进入并且气体不进入。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012023371A

公开(公告)日：2012-02-02

申请号：JP2011152418

申请日：2011-07-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAURENT THIBAUD SIMON MATTHEW ,  GERARDUS ADRIANUS ANTONIUS MARIA KUSTERS ,  KNARREN BASTIAAN ANDREAS WILHELMUS HUBERTUS ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  STEFFENS KOEN ,  KANEKO TAKESHI ,  ROBERT YAN VOGT ,  GREGORY MARTIN MASON CORCORAN ,  BROOKS ROOT HENDRICKS MARTINUS ,  KUNEN JOHANN GERTRUDIX CORNELIS ,  BUDDY RAMIN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70775 ,  G03F7/70341 ,  G03F7/70483 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table that can reduce or eliminate the effects of a thermal load in order to avoid deformation (e.g., expansion or contraction) of a substrate and/or substrate table.SOLUTION: There is provided a substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

Abstract translation: 要解决的问题：提供可以减少或消除热负荷的影响的衬底台，以避免衬底和/或衬底台的变形（例如，膨胀或收缩）。 解决方案：提供了一种用于在基板支撑区域上支撑基板的基板台，该基板台具有至少在基板支撑区域下方的传热流体通道，以及用于热控制的多个加热器和/或冷却器 在衬底支撑区域下方的通道中的传热流体。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011171760A

公开(公告)日：2011-09-01

申请号：JP2011101629

申请日：2011-04-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus that combines a barrier member with a shutter member to keep the final element of a projection system wet during the replacement of a substrate.
SOLUTION: A liquid immersion lithographic apparatus includes a fluid confinement system for confining a fluid in a space between the projection system and a substrate. The liquid confinement system includes an inlet port to supply liquid, and a fluid entrance connected to an outlet port. The liquid immersion lithographic apparatus further includes a fluid supply system to control the fluid flow passing through the fluid entrance by changing a flow rate of fluid supplied to the entrance port and a flow rate of fluid removed from the outlet port.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种将阻挡构件与闸板构件组合的装置，以在更换基板期间使投影系统的最终元件保持湿润。 解决方案：液浸式光刻设备包括用于将流体限制在投影系统和基底之间的空间中的流体限制系统。 液体限制系统包括用于供应液体的入口端口和连接到出口端口的流体入口。 液浸光刻设备还包括流体供应系统，用于通过改变供应到入口的流体的流量和从出口移除的流体的流量来控制流过流体入口的流体流。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009004777A

公开(公告)日：2009-01-08

申请号：JP2008153774

申请日：2008-06-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LIEBREGTS PAULUS MARTINUS MARI ,  FIEN MENNO ,  LOOPSTRA ERIK R ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JO ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected against negative effect from ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with coating on at least part thereof is disclosed. A liquid supply system with a liquid confinement structure extended along at least part of a boundary of a space between a projection system and a substrate support is disclosed. A film with coating exists on at least part of the liquid confinement structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻装置，其被适当地保护以防止例如紫外线辐射和/或浸液的负面影响。 公开了一种光刻设备，其具有在其至少部分上具有涂层的可拆卸粘性膜。 公开了一种具有液体限制结构的液体供应系统，其沿着投影系统和基板支撑件之间的空间的边界的至少一部分延伸。 在液体限制结构的至少一部分上存在具有涂层的膜。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2014099655A

公开(公告)日：2014-05-29

申请号：JP2014031482

申请日：2014-02-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIREKS DANIEL JOSEPH MARIA ,  DANNY MARIA HUBERTUS PHILIPS ,  CLEMENS JOHANNES GERARDUS VAN DEN DUNGEN ,  STEFFENS KOEN ,  ARNOLD YANG VAN PUTTEN ,  MAIKEL ADRIANUS CORNELIS SCHEPERS ,  BERKVENS PAUL PETRUS JOANNES

IPC: H01L21/027

CPC classification number: G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide fluid handling structure where size and constitution of a fluid extraction opening are designated in order to reduce vibration transmitted to the fluid handling structure as result of two-phase extraction.SOLUTION: The area of respective fluid extraction openings, the total area of all fluid extraction openings, and/or an interval between adjacent fluid extraction openings can be controlled. When vibration decreases, precision in exposure is improved.

Abstract translation: 要解决的问题：提供流体处理结构，其中指定流体提取开口的尺寸和构造，以便减少由于两相提取而传递到流体处理结构的振动。解决方案：各流体提取开口的面积， 可以控制所有流体提取开口的总面积和/或相邻的流体提取开口之间的间隔。 当振动降低时，曝光精度提高。

公开(公告)号：JP2012074746A

公开(公告)日：2012-04-12

申请号：JP2012006058

申请日：2012-01-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STEFFENS KOEN ,  VAN DER HAM RONALD ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a seal between a table and a component in a lithographic apparatus.SOLUTION: The seal bridges a gap between the component and the table when the component is in a position relative to the table. The component is moveable, in use, relative to the table and in an embodiment is attached to the table. The seal may be integral with the component or the table.

Abstract translation: 要解决的问题：提供在光刻设备中的工作台和部件之间的密封。 解决方案：当组件处于相对于桌子的位置时，密封件可以桥接组件和工作台之间的间隙。 组件在使用中相对于表是可移动的，并且在一个实施例中附加到表。 密封件可能与组件或工作台成一体。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010050454A

公开(公告)日：2010-03-04

申请号：JP2009186941

申请日：2009-08-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KEMPER NICOLAAS R ,  KATE NICOLAAS TEN ,  OTTENS JOOST JEROEN ,  BECKERS MARCEL ,  POLIZZI MARCO ,  RIEPEN MICHEL ,  KUIJPER ANTHONIE ,  STEFFENS KOEN ,  BAETEN ADRIANES JOHANNES ,  ANTONEVICI ANCA MIHAELA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus by which two-phase flow can be stabilized and/or at least substantially separated into liquid and gas flows, and desirably substantially minimized. SOLUTION: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种可以将两相流稳定化和/或至少基本上分离成液态和气体流并且期望地基本上最小化的装置。 解决方案：描述了一种浸没式光刻设备，其中通过使富含液体的液流优先沿着表面流动，将两相流分离成富含液体的富气流。 版权所有（C）2010，JPO＆INPIT