公开(公告)号：JP2009164623A

公开(公告)日：2009-07-23

申请号：JP2009044651

申请日：2009-02-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  DONDERS SJOERD NICOLAAS LAMBER ,  LOOPSTRA ERIK ROELOF ,  MULKENS JOHANNES CATHARINUS HU

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70875 ,  B05C9/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a means for alleviating the problem concerning the presence of a dipping liquid in a lithographic projection apparatus.
SOLUTION: In the lithographic projection apparatus, a liquid supplying system supplies the dipping liquid between the last element of the projection apparatus and a substrate. An active drying station is provided to actively remove the remained dipping liquid from the exposed substrate W or other objects. The active drying station is equipped with a gas stream forming means or a dipping liquid dissolving liquid supplying means for dissolving the dipping liquid.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种减轻在光刻投影设备中存在浸渍液体的问题的方法。 解决方案：在平版印刷投影设备中，液体供应系统将投影设备的最后一个元件和基板之间的浸渍液体供应。 提供主动干燥站，以从暴露的基底W或其它物体主动去除剩余的浸渍液体。 活性干燥站装有用于溶解浸渍液体的气流形成装置或浸液溶解液体供给装置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009088563A

公开(公告)日：2009-04-23

申请号：JP2009000117

申请日：2009-01-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To prevent or reduce the occurrence of residual liquid on the substrate and/or substrate table after the exposure of a substrate, in an immersion type lithographic apparatus. SOLUTION: In immersion lithography, after the exposure of a substrate is completed, a detector is used for detecting residual liquid that remains on the substrate and/or substrate table. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：在浸没式光刻设备中，为了防止或减少在曝光基板之后在基板和/或基板台上残留液体的出现。 解决方案：在浸没式光刻中，在完成基板曝光之后，使用检测器来检测残留在基板和/或基板台上的残余液体。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009033201A

公开(公告)日：2009-02-12

申请号：JP2008274728

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVIC ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  PEETERS FELIX GODFRIED PETER ,  STREEFKERK BOB ,  TEUNISSEN FRANCISCUS JOHANNES ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus configured to prevent contamination with immersion liquid. SOLUTION: The substrate table WT includes a drainage groove, i.e. a barrier 40 which surrounds an outer peripheral edge of the substrate W and a barrier 100 which surrounds another object 20 like a sensor present on substantially the same plane with a top surface of the substrate. The barriers 40 and 100 can collect any liquid which is spilt from the liquid supply system while the substrate W is exposed to reduce the risk of contamination of delicate components of the lithographic projection apparatus. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT包括排水槽，即围绕衬底W的外围边缘的阻挡层40，以及围绕另一物体20的阻挡层100，如同位于基本相同的平面上的传感器，顶表面 的基底。 屏障40和100可以收集从液体供应系统溢出的任何液体，同时暴露基板W，以降低光刻投影设备的精密部件污染的风险。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008227548A

公开(公告)日：2008-09-25

申请号：JP2008161756

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for cleaning the inside of an immersion lithographic apparatus. SOLUTION: A cleaning fluid can be introduced into a space between a projection system and a substrate table of the lithographic apparatus by especially using a liquid supply system of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided to create an ultrasonic liquid. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗浸没式光刻设备内部的方法和装置。 解决方案：通过特别使用光刻设备的液体供应系统，可以将清洁流体引入到光刻设备的投影系统和基板台之间的空间中。 附加地或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波液体。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008227547A

公开(公告)日：2008-09-25

申请号：JP2008161741

申请日：2008-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  BASELMANS JOHANNES JACOBUS MAT ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  MERTENS JEROEN JOHANNES SOPHIA ,  MULKENS JOHANNES CATHARINUS HU ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  HOEVEN JAN CORNELIS V D ,  GROUWSTRA CEDRIC D

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To provide a method and equipment for cleaning the interior of oil immersion lithographic equipment. SOLUTION: Cleaning fluid can be introduced into a space between the projection system and the substrate table of lithographic equipment by especially using the liquid supply system of the lithographic equipment. Additionally or alternatively, a cleaning device may be provided on the substrate table, and an ultrasonic emitter may be provided in order to produce ultrasonic liquid. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种清洗油浸光刻设备内部的方法和设备。 解决方案：通过特别使用光刻设备的液体供应系统，可以将清洁液体引入到平版印刷设备的投影系统和基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波液体。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008199061A

公开(公告)日：2008-08-28

申请号：JP2008120508

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  Carl Zeiss Smt Ag ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  カール・ツァイス・エスエムティー・アーゲー

Inventor： STREEFKERK BOB ,  MULKENS JOHANNES CATHARINUS HU ,  BASELMANS JOHANNES JACOBUS MAT ,  GRAEUPNER PAUL ,  ENGELEN ADRIANUS FRANCISCUS PE ,  FINDERS JOSEF MARIA ,  VAN SCHOOT JAN BERNARD PLECHEL

IPC: H01L21/027 ,  G03F7/20 ,  G03F7/207

CPC classification number: G03F7/70341 ,  G03F7/70333

Abstract: PROBLEM TO BE SOLVED: To improve focus latitude and/or to stabilize contrast control in an immersion lithographic apparatus, where the position of a focus changes when accelerating a substrate table during exposure.
SOLUTION: A final element 50 in a projection system that is a parallel plate used for sealing a projection system PL against an immersion liquid 10 in immersion lithography changes an incidence angle of projection beams when the final element inclines to the optical axis of the device. Force generated by the immersion liquid is utilized passively, and the final element is moved, thus changing the focus continuously at all points on the substrate to improve the focus latitude. Some methods, such as a method for inclining the projection beams to the substrate, are disclosed.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提高聚焦宽度和/或稳定浸没式光刻设备中的对比度控制，其中在曝光期间加速衬底台时焦点的位置改变。 解决方案：投影系统中的最终元件50，其是用于在浸没光刻中将投影系统PL与浸没液体10密封的平行板，当最终元件倾斜到光轴的光轴时，投影光束的入射角度 装置。 由浸没液体产生的力被动被动使用，最后的元件移动，从而在基板上的所有点连续地改变聚焦，以提高焦点的纬度。 公开了一些方法，例如将投射光束倾斜到衬底的方法。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008135769A

公开(公告)日：2008-06-12

申请号：JP2007339406

申请日：2007-12-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  DONDERS SJOERD NICOLAAS LAMBER ,  JACOBS JOHANNES HENRICUS WILHE ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  SEUNTIENS-GRUDA LEJLA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate with a liquid confinement system. SOLUTION: A liquid supply system 180 further comprises a de-mineralizing unit 130, a distillation unit 120 and a UV radiating source 145 for the purification of an immersion liquid. Chemicals can be added to the immersion liquid for the inhibition of organism growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of organisms is reduced. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体供应系统使用液体限制系统在投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统180还包括去矿化单元130，蒸馏单元120和用于净化浸液的UV辐射源145。 可以将化学品添加到用于抑制生物体生长的浸液中，并且液体供应系统的组分可以由对可见光不透明的材料制成，使得生物体的生长减少。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008010864A

公开(公告)日：2008-01-17

申请号：JP2007158123

申请日：2007-06-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HEN ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MAR ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETR ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithography projection apparatus in which a liquid removal system surrounds a liquid supply system that supplies a liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system is capable of moving with respect to the liquid supply system and is controlled so that is has substantially a relative velocity of zero with respect to a moving substrate table. A gap between the liquid supply system and the liquid removal system can be covered and the atmosphere on the substrate table can be maintained so that the liquid vapor pressure becomes relatively high between the liquid supply system and the liquid removal system. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统能够相对于液体供应系统移动并且被控制为使得相对于移动的基板台具有基本相对的零速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持基板台上的气氛，使得液体供应系统和液体移除系统之间的液体蒸气压力变得相对较高。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007150308A

公开(公告)日：2007-06-14

申请号：JP2006315814

申请日：2006-11-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOL ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNE ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To prevent the presence of air bubbles in an immersion liquid to cause an adverse effect on the quality of a pattern image in an immersion lithography.
SOLUTION: In the immersion lithography, the formation of air bubbles in the immersion liquid can be minimized or prevented by reducing the size of a gap or a gap region between an object and a substrate table and/or providing a cover plate covering the gap. The immersion lithography may further comprise an actuator which laterally moves the object in a hole of the support table to reduce a gap between an end of the object and a side of the hole when the object is in contact with a liquid.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了防止浸没液中的气泡的存在对浸没式光刻中的图案图像的质量产生不利影响。 解决方案：在浸没式光刻中，可以通过减小物体和基板台之间的间隙或间隙区域的尺寸和/或提供盖板覆盖物来减小或防止浸没液体中的气泡的形成 差距。 浸没式光刻可以进一步包括致动器，该致动器在物体与液体接触时使物体在支撑台的孔中横向移动，以减小物体的端部与孔的一侧之间的间隙。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007013152A

公开(公告)日：2007-01-18

申请号：JP2006176047

申请日：2006-06-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  LEENDERS MARTINUS HENDRIKUS AN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus capable of suppressing the conveyance of contaminants, stray light, temperature gradients and/or the effect of air bubbles on imaging quality; and to provide a method of manufacturing a device. SOLUTION: There is disclosed an immersion lithographic apparatus supplying a liquid to a space between a projection system and a substrate, and provided with a plate structure for dividing the space into two parts. The plate structure has an opening for permitting the transmission of projection beams, a through-hole for suppressing a damping effect due to the existence of the plate, and optionally one or a plurality of inlets and outlets for providing various flows to the circumference of the opening of the plate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供能够抑制污染物的传播，杂散光，温度梯度和/或气泡对成像质量的影响的光刻投影设备; 并提供一种制造装置的方法。 解决方案：公开了一种将液体供应到投影系统和基板之间的空间的浸没式光刻设备，并且设置有用于将空间分成两部分的板结构。 板结构具有用于允许透射投影光束的开口，用于抑制由于板的存在而引起的阻尼效应的通孔，以及可选地一个或多个入口和出口，用于向 开盘。 版权所有（C）2007，JPO＆INPIT