公开(公告)号：JP2009231835A

公开(公告)日：2009-10-08

申请号：JP2009063815

申请日：2009-03-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTO ,  ROBBERT EDGAR VAN LEEUWEN ,  KLAVER RENATUS GERARDUS ,  HAMELS MARTIJN ROBERT

IPC: H01L21/027

CPC classification number: G03B27/54 ,  G01D5/24461 ,  G01D5/347 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a position measurement which reduces the risk of erroneous positioning of a movable object due to errors in a grid or grating.
SOLUTION: An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种位置测量，其减少由于格栅或光栅中的错误而导致可移动物体错误定位的风险。 解决方案：编码器型测量系统被配置为测量可移动物体的位置相关信号。 测量系统包括光源和传感器。 光源和传感器安装在可移动物体之一或基本上固定的框架上。 测量系统还包括参考对象，其包括安装在可移动物体或基本上固定的框架上的另一个上的光栅或栅格。 光源被配置为朝向参考对象发射光束。 传感器被配置为检测由参考对象反射的光源的光。 该测量系统还包括能够在连续生产过程中检测传感器目标物体的光栅或格栅上的误差的误差检测器。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009027141A

公开(公告)日：2009-02-05

申请号：JP2008119765

申请日：2008-05-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  EUSSEN EMIEL JOZEF MELANIE ,  HENDRIKS STEFAN GERTRUD MARIE ,  LOOPSTRA ERIK R ,  VINK JACOB W ,  CATHARINA MARIA BEERENS RUUD A ,  SCHIJVENAARS LODEWIJK ALEXANDE ,  VAN ZUTPHEN TOM

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To prevent vibration of a grating generated by reception of vibration or other mechanical disturbances by a reference structure, innaccuracy in the displacement of the grating in an encoder measurement system, and an reading error from an encoder caused thereby. SOLUTION: An auxiliary sensor system ASS measures a position of the grating GT relative to a reference, the grating forming a part of encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor ES mounted to the substrate table. This sensor calibration method comprises steps of: exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system; obtaining an auxiliary sensor system output signal from the sensor system during the movement; and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了防止由参考结构接收到振动或其他机械干扰而产生的光栅的振动，编码器测量系统中光栅位移的无效性和由此导致的编码器的读取误差 。 解决方案：辅助传感器系统ASS测量光栅GT相对于参考的位置，光栅形成编码器测量系统的一部分。 编码器测量系统适于测量光刻设备的衬底台的位置，还包括安装到衬底台的传感器ES。 该传感器校准方法包括以下步骤：激励光栅以在辅助传感器系统的至少一个测量方向上进行移动; 在运动期间从传感器系统获得辅助传感器系统输出信号; 并且基于在移动期间获得的输出信号来调整辅助传感器系统的参数，从而校准辅助传感器系统。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007251156A

公开(公告)日：2007-09-27

申请号：JP2007043038

申请日：2007-02-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LUTTIKHUIS BERNARDUS ANTONIUS ,  VAN DER PASCH ENGELBERTUS ANTO ,  VAN DE VIJVER YURI JOHANNES GA ,  VAN DER HAM RONALD ,  ROSET NIEK JACOBUS JOHANNES ,  BOSSCHART CAREL HOPE

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/70775 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus provided with a measurement system having highly reliable accuracy. SOLUTION: The lithographic apparatus is provided with a measurement system for measuring the position and/or movement of a substrate support relative to a reference frame. The measurement system is provided with a target mounted to any one of the substrate support and the reference frame, a radiation source mounted to the other one and a sensor configured to detect a pattern of radiation propagating from the target, indicating the position or movement of the substrate support. The substrate support is provided with one or more gas outlets configured so as to supply a flow of gas which encapsulates the volume of space through which the radiation beam propagates to the target. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有高度可靠精度的测量系统的光刻设备。 解决方案：光刻设备设置有用于测量衬底支撑件相对于参考框架的位置和/或运动的测量系统。 测量系统设置有安装到基板支撑件和参考框架中的任一个的目标，安装到另一个的辐射源和被配置为检测从目标传播的辐射图案的传感器，其指示位置或运动 衬底支撑。 衬底支撑件设置有一个或多个气体出口，其被配置为提供封装辐射束传播到靶的空间体积的气体流。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007004175A

公开(公告)日：2007-01-11

申请号：JP2006173228

申请日：2006-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  VAN DER SCHOOT HARMEN KLAAS

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70625

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can accurately position a substrate upon exposure even when the substrate size increases. SOLUTION: A lithographic apparatus is provided which has an array of individually controllable elements to modulate a cross-section of a radiation beam, a substrate table to support a substrate, a projection system to project the modulated radiation beam onto a target portion of the substrate to apply a pattern, and a position encoder having a position sensor and a scale to determine a position of the substrate table. The pattern comprises a first line and a second line, the first line being offset from the second line. The scale comprises a plurality of lines intended to be straight and parallel to one another. The lithographic apparatus further includes: an imaging device to obtain an image of the first and second lines; and an image process unit to determine the non-uniformity of at least a part of the scale based on separation distances between the first and second lines measured at a plurality of positions. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供即使当基板尺寸增加时也可以在曝光时精确地定位基板的光刻设备。 解决方案：提供一种光刻设备，其具有可独立控制的元件的阵列，以调制辐射束的横截面，用于支撑衬底的衬底台，投影系统将调制的辐射束投影到目标部分 以及具有位置传感器和刻度的位置编码器，以确定衬底台的位置。 该图形包括第一行和第二行，第一行与第二行偏移。 该刻度尺包括多条相互直线并平行的线。 光刻设备还包括：成像装置，用于获得第一和第二线的图像; 以及图像处理单元，用于基于在多个位置处测量的第一和第二线之间的间隔距离来确定刻度的至少一部分的不均匀性。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004312002A

公开(公告)日：2004-11-04

申请号：JP2004105078

申请日：2004-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  BEEMS MARCEL HENDRIKUS MARIA ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  GALBURT DANIEL N

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70775 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To provide a method for Y-direction position correction of masked object shifts caused by Z-direction offset and oblique lighting.
SOLUTION: In a reflective lithographic projection apparatus, shifts of a mask pattern image in the scanning direction, which are caused by changes in the position of the mask pattern surface along the optical axis, are corrected by shifting the relative position(s) of the mask and/or a substrate in the scanning direction. Rotating the relative position(s) of the mask and/or the substrate around the optical axis can correct image rotation errors. After installing the mask in the lithographic projection apparatus, changes in the position of the mask pattern surface along the optical axis can be determined by using an interferometer. These changes can be mapped and stored to be used for controlling the lithographic projection apparatus.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2009302531A

公开(公告)日：2009-12-24

申请号：JP2009132700

申请日：2009-06-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： AARTS IGOR MATHEUS PETRONELLA ,  GEERKE JOHAN HENDRIK ,  VAN DER PASCH ENGELBERTUS ANTO ,  DE JONG FREDERIK E ,  VAN DE GRIFT MARC

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F9/7076 ,  G03F7/70516 ,  G03F7/70616 ,  G03F9/7011 ,  G03F9/7019 ,  H01L21/02271

Abstract: PROBLEM TO BE SOLVED: To provide a calibration method for calibrating a stage position of a lithography apparatus. SOLUTION: This detection method detects a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate W or on a substrate table WT and preferably extends over a length at least 50 times wider than a width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table WT in the first direction and measuring along the first direction the property of the extended pattern. The property may be a result of a physical property of the extended pattern in a second direction at a right angle to the first direction. A next step allows a calibration of a substrate table position to be derived from the measured position of the extended pattern. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供用于校准光刻设备的台位置的校准方法。 解决方案：该检测方法检测由通常沿第一方向延伸的至少一条线形成的延伸图案的特性。 延伸图案形成在衬底W上或衬底台WT上，并且优选地延伸超过线宽度的至少50倍的长度。 扩展模式是对焦点敏感。 检测方法包括沿第一方向移动衬底台WT并沿着第一方向测量延伸图案的特性。 该特性可以是延伸图案在与第一方向成直角的第二方向上的物理性质的结果。 下一个步骤允许从扩展图案的测量位置导出衬底台位置的校准。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009156862A

公开(公告)日：2009-07-16

申请号：JP2008273658

申请日：2008-10-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  VAN DER PASCH ENGELBERTUS ANTO

IPC: G01B11/00 ,  G01D5/38 ,  G03F7/20 ,  H01L21/027

CPC classification number: G01D5/38 ,  G03F9/7015 ,  G03F9/7049 ,  G03F9/7084 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a measurement system easy to manufacture a grating or a pattern. SOLUTION: The measurement system includes a sensor arranged to cooperate with a first pattern arranged on a structure of the measurement system to determine a first positional quantity of the sensor relative to the structure, and arranged to cooperate with a second pattern arranged on the structure to determine a second position quantity of the sensor relative to the structure, wherein the first and the second patterns are arranged on different surfaces of the structure. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供容易制造光栅或图案的测量系统。 解决方案：测量系统包括传感器，布置成与布置在测量系统的结构上的第一图案配合，以确定传感器相对于结构的第一位置量，并且被布置成与布置在其上的第二图案配合 确定传感器相对于结构的第二位置量的结构，其中第一和第二图案布置在结构的不同表面上。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008294443A

公开(公告)日：2008-12-04

申请号：JP2008130322

申请日：2008-05-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STEIJAART PETER PAUL ,  BOX WILHELMUS JOSEPHUS ,  EUSSEN EMIEL JOZEF MELANIE ,  LOOPSTRA ERIK R ,  VAN DER PASCH ENGELBERTUS ANTO ,  CATHARINA MARIA BEERENS RUUD A ,  SMITS ALBERTUS ADRIANUS

IPC: H01L21/027

CPC classification number: G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To increase the position accuracy of an encoder type sensor system of a lithographic apparatus.
SOLUTION: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提高光刻设备的编码器型传感器系统的位置精度。 解决方案：公开了一种光刻设备，其包括被配置为相对于参考结构测量光刻设备的衬底台的位置的编码器型传感器系统。 编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008177561A

公开(公告)日：2008-07-31

申请号：JP2007334440

申请日：2007-12-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BEEMS MARCEL HENDRIKUS MARIA ,  VAN DER PASCH ENGELBERTUS ANTO

IPC: G01B9/02 ,  H01L21/027 ,  G01B11/00 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70941 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is an improvement of an interferometer measurement system, and to provide a method for manufacturing a device. SOLUTION: The lithographic apparatus is characterized in that at least one reflective surface 26 of an interferometer measurement system 16 is arranged so that, in use, the beam path 52 of interferometer radiation of the interferometer measurement system entering the at least one reflective surface has an offset angle in the range of from 0.1 to 10 milliradians with respect to the normal to the at least one reflective surface, and in that the effect of spurious radiation 54 on the interferometer measurement system produced within the interferometer measurement system may thereby be suppressed. Therefore, the precision and reproducibility of exact position measurement which utilizes the interferometer measurement system are improved. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供作为干涉仪测量系统的改进的光刻设备，并提供一种用于制造器件的方法。 光刻设备的特征在于，干涉仪测量系统16的至少一个反射表面26布置成使得在使用中，干涉仪测量系统的干涉仪辐射的光束路径52进入至少一个反射 表面相对于至少一个反射表面的法线具有在0.1至10毫弧度的范围内的偏移角，并且因为杂散辐射54对干涉仪测量系统内产生的干涉仪测量系统的影响可能因此为 抑制。 因此，改进了利用干涉仪测量系统的精确位置测量的精度和再现性。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007127625A

公开(公告)日：2007-05-24

申请号：JP2006249172

申请日：2006-09-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  LOOPSTRA ERIK ROELOF

IPC: G01B11/00 ,  H01L21/027 ,  H01L21/68

CPC classification number: G01B9/02051 ,  G01B9/02029 ,  G01B2290/70 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a compact position measurement unit for a lithographic apparatus or the like. SOLUTION: A measurement unit to measure a position in first and second dimensions includes a diffraction type encoder and an interferometer. The diffraction type encoder measures by means of a diffraction on first and second diffraction gratings (G1, G2) the position in the first dimension of the second grating (G2) with respect to the first grating (G1). The interferometer measures the position in the second dimension of a mirror (MI). The measurement unit includes a combined optical unit (COU) to transfer an encoder measurement beam (EMB) as well as an interferometer measurement beam (IMB). Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings (G1, G2) may further show some degree of zero order reflection to provide the mirror (MI) of the interferometer. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供用于光刻设备等的紧凑的位置测量单元。 解决方案：用于测量第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。 衍射型编码器通过第一和第二衍射光栅（G1，G2）上相对于第一光栅（G1）在第二光栅（G2）的第一维度中的位置的衍射来测量。 干涉仪测量反射镜（MI）的第二维度中的位置。 测量单元包括用于传送编码器测量光束（EMB）以及干涉仪测量光束（IMB）的组合光学单元（COU）。 此外，测量单元可以包括用于编码器的组合光源以及干涉仪。 第一和第二衍射光栅（G1，G2）中的一个可进一步示出一些零级反射以提供干涉仪的镜（MI）。 版权所有（C）2007，JPO＆INPIT