公开(公告)号：JP2011103448A

公开(公告)日：2011-05-26

申请号：JP2010211472

申请日：2010-09-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY ,  BANINE VADIM YEVGENYEVICH ,  JEUNINK ANDRE BERNARDUS ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA

IPC: H01L21/027 ,  B29C59/02

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

Abstract: PROBLEM TO BE SOLVED: To align patterns with enough accuracy to each other in an imprint lithography device. SOLUTION: A method of determining an offset between an imprint template 21 and a substrate 20 by using an alignment grating 24 on the imprint template 21 and an alignment grating 23 on the substrate 20 is disclosed. The method includes bringing the imprint template alignment grating 24 and the substrate alignment grating 23 sufficiently close together such that they form a composite grating, guiding an alignment radiation beam to the composite grating while modulating the relative position of the imprint template 21 and the substrate 20, detecting a luminous intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing the modulation of the detected luminous intensity. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：在压印光刻设备中使图案彼此之间具有足够的精度。 公开了一种通过使用压印模板21上的对准光栅24和衬底20上的对准光栅23来确定压印模板21和衬底20之间的偏移的方法。 该方法包括使压印模板对准光栅24和衬底对准光栅23足够靠近在一起，使得它们形成复合光栅，将对准辐射束引导到复合光栅，同时调制压印模板21和衬底20的相对位置 检测从复合光栅反射的对准辐射的发光强度，并通过分析所检测的发光强度的调制来确定偏移。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011071508A

公开(公告)日：2011-04-07

申请号：JP2010206182

申请日：2010-09-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER FREDERIK ,  DEN BOEF ARIE JEFFREY

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide a technique of improving throughput of an imprint lithography device. SOLUTION: This imprint lithography method includes: bringing an imprint template into contact with an imprintable medium provided on a substrate; and guiding actinic radiation at the imprintable medium, the actinic radiation being oriented such that it is not perpendicularly incident upon a patterned surface of the imprint template. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种提高压印光刻设备的生产能力的技术。 解决方案：该压印光刻方法包括：使印模模板与设置在基板上的可压印介质接触; 并且在可压印介质上引导光化辐射，光化辐射被定向成使得其不垂直入射到压印模板的图案化表面上。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011029642A

公开(公告)日：2011-02-10

申请号：JP2010162396

申请日：2010-07-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography template with an alignment mark for preventing the alignment mark from being filled with an imprintable medium. SOLUTION: The imprint lithography template 40 includes: a patterned region to imprint a layer of imprintable medium 32, and an alignment mark 48 for use in aligning the imprint template. The alignment mark configured so that the imprintable medium is prevented from filling the alignment mark when the imprint template imprints the imprintable medium. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供具有用于防止对准标记被可压印介质填充的对准标记的压印光刻模板。 压印光刻模板40包括：印模可压印介质层32的图案区域和用于对准压印模板的对准标记48。 对准标记被构造成当压印模板压印可压印介质时防止可压印介质填充对准标记。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010183076A

公开(公告)日：2010-08-19

申请号：JP2010016186

申请日：2010-01-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  LAMMERS JEROEN HERMAN ,  VAN DER TEMPEL LEENDERT

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To improve the throughput of an imprint lithography process. SOLUTION: A imprint lithography method includes: a step of imprinting a pattern to an imprintable medium by using an imprint template so as to imprint the pattern to a ceratin area of a substrate provided with a plurality of drops of the imprintable medium with a first configuration; and a step of imprinting a pattern to an imprintable medium by using the same imprint template so as to imprint the pattern to a certain area of a substrate provided with a plurality of drops of the imprintable medium with a second configuration, wherein the first configuration of drops of the imprintable medium is different from the second configuration of drops of the imprintable medium. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提高压印光刻工艺的生产量。 压印光刻方法包括：通过使用压印模板将图案压印到可压印介质上的步骤，以将图案印刷到设置有多个可压印介质的液滴的基板区域， 第一种配置; 以及通过使用相同的印模模板将图案压印到可压印介质的步骤，以便将图案印刷到具有第二配置的设置有多个可压印介质的液滴的基板的特定区域，其中第一配置 可压印介质的液滴与可压印介质的液滴的第二配置不同。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009141350A

公开(公告)日：2009-06-25

申请号：JP2008303287

申请日：2008-11-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  SCHRAM IVAR ,  WUISTER SANDER FREDERIK ,  LAMMERS JEROEN HERMAN

IPC: H01L21/027 ,  B29C67/00

CPC classification number: G03F7/0002 ,  B29C43/021 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide an imprint template cover for an imprint template.
SOLUTION: The imprint template cover is used for imprint templates. There is a pattern feature on the imprint template. The cover is configured to extend around the pattern feature of the imprint template during use, and does not come into contact with the pattern feature.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为压印模板提供压印模板封面。

解决方案：压印模板封面用于压印模板。 压印模板上有一个模式功能。 盖被配置为在使用期间围绕压印模板的图案特征延伸，并且不与图案特征接触。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007307899A

公开(公告)日：2007-11-29

申请号：JP2007123276

申请日：2007-05-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  SCHRAM IVAR

IPC: B29C59/02 ,  B29C33/38 ,  H01L21/027

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide a making method of an imprint template.
SOLUTION: The making method of the imprint template 44 comprises mounting a transfer layer on a substrate 30; mounting a layer of an imprintable medium 36 on the transfer layer; polymerizing the imprintable medium by exposing the imprintable medium to chemical rays using a master imprint template 38 in order to imprint a pattern on the imprintable medium; and etching the obtained polymer layer, the transfer layer and the substrate so that the imprinted pattern is transferred to the substrate. By this the substrate is converted to the imprint template having the pattern reverse to the pattern mounted on the master imprint template.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供压印模板的制作方法。 解决方案：压印模板44的制作方法包括将转印层安装在基板30上; 在转印层上安装一层可压印介质36; 通过使用母版印模板38将可压印介质暴露于化学射线以便将图案压印在可压印介质上来聚合可压印介质; 并蚀刻所得到的聚合物层，转印层和基板，使得印刷图案转印到基板上。 由此，将基板转换成具有与安装在主印模模板上的图案相反的图案的印模模板。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2011082514A

公开(公告)日：2011-04-21

申请号：JP2010220095

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAMMERS JEROEN HERMAN ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  KOOLE ROELOF

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide imprint lithography for achieving lower levels of the defects caused by a void. SOLUTION: The imprint lithography method includes a step of bringing a patterned surface into contact with an imprintable liquid medium for a filling period. Light, such as scattered or reflected, emitted from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be performed further rapidly to reduce risk of defects arising from remnants of unfilled voids. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供压印光刻以实现由空隙引起的较低水平的缺陷。 压印光刻方法包括使图案化表面与可压印液体介质接触以进行填充时间的步骤。 在填充期间收集和测量从介质和图案化表面之间的界面发射的诸如散射或反射的光，以获得关于界面处的一个或多个空隙的数据，并且填充周期的结束时间从 数据和时间之间的关系。 该方法可以允许进一步快速进行随后的工艺步骤，以减少由未填充空隙的残余物引起的缺陷的风险。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011073444A

公开(公告)日：2011-04-14

申请号：JP2010211473

申请日：2010-09-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER FREDERIK

IPC: B29C59/02 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/0002 ,  B29C43/021 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To prepare an imprint template at a comparatively low cost. SOLUTION: A method of forming the imprint template using a substrate having an inorganic release layer and an imprintable medium layer includes steps for using a master imprint template to imprint a pattern into an imprintable medium, solidifying the imprintable medium, and etching the imprintable medium and the inorganic release layer to form a pattern in the inorganic release layer. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：以相对较低的成本制备压印模板。 解决方案：使用具有无机剥离层和可压印介质层的基材形成印模模板的方法包括使用主印模模板将图案压印到可压印介质中的步骤，固化可压印介质，并蚀刻 可压印介质和无机剥离层，以在无机剥离层中形成图案。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011061195A

公开(公告)日：2011-03-24

申请号：JP2010184511

申请日：2010-08-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER FREDERIK ,  BANINE VADIM YEVGENYEVICH ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  LAMMERS JEROEN HERMAN ,  KOOLE ROELOF

IPC: H01L21/027 ,  B29C59/02 ,  B81C99/00

CPC classification number: B29C43/34 ,  B29C43/021 ,  B29C43/58 ,  B29C2043/025 ,  B29K2101/12 ,  B44C1/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography method and an apparatus capable of eliminating or relaxing the problem of unevenness in an imprint template. SOLUTION: The imprint lithography method includes a step of providing a first amount 60 of an imprintable medium having a first etching rate when solidified on a first area of a substrate and a step of providing a second amount 62 of an imprintable medium having a second etching rate different from the first etching rate when solidified on a second area different from the first area on the substrate. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供压印光刻方法和能够消除或放松压印模板不均匀问题的装置。 压印光刻方法包括在基板的第一区域上固化时提供具有第一蚀刻速率的可压印介质的第一量60的步骤，以及提供可压印介质的第二量62的步骤， 在与基板上的第一区域不同的第二区域上固化时，与第一蚀刻速率不同的第二蚀刻速率。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011049554A

公开(公告)日：2011-03-10

申请号：JP2010176894

申请日：2010-08-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOOLE ROELOF ,  WUISTER SANDER FREDERIK

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To rapidly separate a surface of an imprint template from a patterned layer on a substrate formed by imprint lithography. SOLUTION: This imprint lithography method for forming a patterned layer from a UV-curable liquid medium on a substrate includes steps of: sticking together a patterned surface and the UV-curable medium for a filling period A; illuminating the UV-curable medium with UV-radiation for an illumination period B; holding the patterned surface and the UV-curable liquid medium together for a holding period C such that the UV-curable medium forms a self-supporting layer; and separating the patterned surface from the patterned layer at the end 24 of the holding period. The start time 22 of the illumination period is earlier than the end time 21 of the filling period by a pre-cure period E. Also, a method is disclosed where the end time 23 of the illumination period is earlier than the end time 24 of the holding period. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：将压印模板的表面从通过压印光刻形成的基板上的图案化层快速分离。 解决方案：用于从基板上的可UV固化的液体介质形成图案层的压印光刻方法包括以下步骤：将图案化表面和可UV固化的介质粘合在一个填充周期A上; 用UV辐射照射紫外线固化介质照射周期B; 将图案化表面和UV可固化液体介质一起保持保持期间C，使得UV可固化介质形成自支撑层; 并且在保持期的端部24处将图案化表面与图案化层分离。 照明期间的开始时间22比预固化期间E早于填充期间的结束时间21.此外，公开了一种方法，其中照明期间的结束时间23早于 持有期间。 版权所有（C）2011，JPO＆INPIT