公开(公告)号：US20190113852A1

公开(公告)日：2019-04-18

申请号：US16159080

申请日：2018-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Janneke RAVENSBERGEN ,  Duygu AKBULUT ,  Nitesh PANDEY ,  Jin LIAN

IPC: G03F7/20 ,  G01B9/02

CPC classification number: G03F7/70633 ,  G01B9/02083 ,  G01B9/0209 ,  G03F7/70625

Abstract: A metrology apparatus is disclosed that has an optical system to focus radiation onto a structure and directs redirected radiation from the structure to a detection system. The optical system applies a plurality of different offsets of an optical characteristic to radiation before and/or after redirected by the structure, such that a corresponding plurality of different offsets are provided to redirected radiation derived from a first point of a pupil plane field distribution relative to redirected radiation derived from a second point of the pupil plane field distribution. The detection system detects a corresponding plurality of radiation intensities resulting from interference between the redirected radiation derived from the first point of the pupil plane field distribution and the redirected radiation derived from the second point of the pupil plane field distribution. Each radiation intensity corresponds to a different one of the plurality of different offsets.