公开(公告)号：JPH02154258A

公开(公告)日：1990-06-13

申请号：JP25800289

申请日：1989-10-04

Applicant: BASF AG

Inventor： HORUSUTO KOTSUHO ,  KAARUURUDORUFU KURUTSU ,  TOOMASU TERUZAA ,  MANFUREETO TSUYURUGAA

IPC: G03F7/004 ,  B05D3/06 ,  G03F7/00 ,  G03F7/16

Abstract: PURPOSE: To obtain a photosensitive recording element fit for relief printing by separately melting mixtures each used for producing a single layer, gathering the resultant flows of melts before feeding into the gap in a calender, introducing them into the gap as a lapped molten flat formed body an carrying out rolling. CONSTITUTION: Mixture composed of a single layer contains a polymer having olefinic unsatd. groups as a binder, a photopolymn. initiator and one or more kinds of olefinic unsatd. compds. (monomers) compatible with the binder. The mixture is melted and the resultant flows of melts are gathered and introduced into the gap is calender as a lapped molten flat formed body. In this case, the pref. time from the gathering to the introduction is 10sec to 5min, especially 30sec to 3min. Layers are bonded by rolling with high bonding strength and the thickness is precisely regulated to the desired value.

公开(公告)号：JPH024256A

公开(公告)日：1990-01-09

申请号：JP2594789

申请日：1989-02-06

Applicant: BASF AG

Inventor： KAARUURUDORUFU KURUTSU ,  HORUSUTO KOTSUHO ,  TOOMASU TERUZAA ,  MANFUREETO TSUYURUGAA

IPC: G03F7/004 ,  C08F2/50 ,  G03F7/00 ,  G03F7/027 ,  G03F7/028 ,  G03F7/033

Abstract: PURPOSE: To obtain a method for fine and precise exposure and development in a short time by forming a photopolymerizable relief-forming layer having a specified structure. CONSTITUTION: A photopolymerizable relief forming layer (A) contains at least one kind of polymer binder selected from among ethylene/propyelen/alkadiene random ternary polymers having a double bond part having 2 to 20 double bonds per 1000 carbon atoms and 40-80wt.% ethylene content. The binder is included by 20 to 99.499wt.% of the layer (A). Moreover, the layer contains 0.001-10wt.% photopolymn. initiator, 0.5-50wt.% monomers and 0-40wt.% assistant to change the characteristics. The obtd. recording material enables fast exposure and gives an extremely large latitude for exposure. Thereby, a fine motif of an image mask or a negative original can accurately be reproduced.