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11.
公开(公告)号:US20210317582A1
公开(公告)日:2021-10-14
申请号:US17329459
申请日:2021-05-25
Applicant: BASF SE
Inventor: Cornelia Röger-Göpfert , Roman Benedikt Raether , Charlotte Emnet , Alexandra Haag , Dieter Mayer
IPC: C23C18/31 , C23C18/32 , C25D3/38 , C25D3/58 , H01L21/768 , H01L21/288 , C25D7/12
Abstract: Described herein is a composition for filling submicrometer sized features having an aperture size of 30 nanometers or less including a source of copper ions, and at least one suppressing agent selected from compounds of formula I where the R1 radicals are each independently selected from a copolymer of ethylene oxide and at least one further C3 to C4 alkylene oxide, said copolymer being a random copolymer, the R2 radicals are each independently selected from R1 or alkyl, X and Y are spacer groups independently, and X for each repeating unit independently, selected from C1 to C6 alkylene and Z—(O—Z)m where the Z radicals are each independently selected from C2 to C6 alkylene, n is an integer equal to or greater than 0, and m is an integer equal to or greater than 1.
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公开(公告)号:US09758885B2
公开(公告)日:2017-09-12
申请号:US14438688
申请日:2013-10-30
Applicant: BASF SE
Inventor: Marcel Patrik Kienle , Dieter Mayer , Cornelia Roeger-Goepfert , Alexandra Haag , Charlotte Emnet , Alexander Fluegel , Marco Arnold
Abstract: A composition comprising a source of metal ions and at least one additive comprising at least one polyaminoamide, said polyaminoamide comprising the structural unit represented by formula I or derivatives of the polyaminoamide of formula I obtainable by complete or partial protonation, N-functionalization or N-quaternization with a non-aromatic reactant, wherein D6 is, for each repeating unit 1 to s independently, a divalent group selected from a saturated or unsaturated C1-C20 organic radical, D7 is, for each repeating unit 1 to s independently, a divalent group selected from straight chain or branched C2-C20 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, R1 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R2, may form a divalent group D8, and R2 is, for each repeating unit 1 to s independently, selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl, or, together with R1, may form a divalent group D8, and D8 is selected from straight chain or branched C1-C18 alkanediyl, which may optionally be interrupted by heteroatoms or divalent groups selected from O, S and NR10, s is an integer from 1 to 250, R10 is selected from H, C1-C20 alkyl, and C1-C20 alkenyl, which may optionally be substituted by hydroxyl, alkoxy or alkoxycarbonyl.
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