Abstract:
Poly(5,5'-bis(thiophen-2-yl)-benzo[2,1 -b;3,4-b']dithiophene) comprising as repeating units the group of the formula (I) wherein R is independently selected from a) a C 1-2O alkyl group, b) a C 2-20 alkenyl group, c) a C 2-20 alkynyl group, d) a C 1-20 alkoxy group, e) a -Y-C 3-10 cycloalkyl group, f) a -Y-C 6-14 aryl group, g) a -Y-3-12 membered cycloheteroalkyl group, or h) a -Y-5-14 membered het- eroaryl group, wherein each of the C 1-20 alkyl group, the C 2-20 alkenyl group, the C 2-20 alkynyl group, the C 3-10 cycloalkyl group, the C 6-14 aryl group, the 3-12 membered cycloheteroalkyl group, and the 5-14 membered heteroaryl group is optionally substituted with 1 -4 R 1 groups, R 1 is independently selected from a) a S(O) m -C 1-20 alkyl group, b) a S(O) m -OC 1-20 alkyl group, c) a S(O) m -OC 6-14 aryl group, d) a C(O)-OC 1-20 alkyl group, e) a C(O)-OC 6-14 aryl group, f) a C 1-20 alkyl group, g) a C 2-20 alkenyl group, h) a C 2-20 alkynyl group, i) a C 1-20 alkoxy group, j) a C 3-10 cycloalkyl group, k) a C 6-14 aryl group, I) a 3-12 membered cycloheteroalkyl group, or m) a 5-14 membered heteroaryl group, Y is independently selected from a divalent C 1-6 alkyl group, or a covalent bond; and m is independently selected from 0, 1, or 2, and having a number average molecular weight M n in the range of from 5,000 to 200,000 g/mol.
Abstract:
Disclosed are new semiconductor materials prepared from dimeric perylene compounds. Such compounds can exhibit high n-type carrier mobility and/or good current modulation characteristics. In addition, the compounds of the present teachings can possess certain processing advantages such as solution-processability and/or good stability at ambient conditions.
Abstract:
The present invention relates to a continuous process for the production of polymeric coupling products by using a reactor assembly which is equipped with two or more reaction cells. The educt fluid is pumped through the reaction cells and thoroughly mixed therein by means of agitators. Preferably the process according to the invention is used for the preparation of coupling products which show at least partially precipitation and/or gelation effects during the performance of the synthesis. The precipitation and/or gelation effects are associated with and increase of the viscosity of the reaction system under reaction conditions. The products which are obtained by the process according to the invention have increased molecular weight and low polydispersity over similar products which were obtained in batch experiments.
Abstract:
The present invention provides a process for the preparation of a transistor on a substrate, which transistor comprises a layer, which layer comprises polyimide B, which process comprises the steps of i) forming a layer comprising photocurable polyimide A by applying photocur- able polyimide A on a layer of the transistor or on the substrate ii) irradiating the layer comprising photocurable polyimide A with light of a wavelength of > = 360 nm in order to form the layer comprising polyimide B, and a transistor obtainable by that process.
Abstract:
Die vorliegende Erfindung betrifft ein Verfahren zur Herstellung einer Schicht enthaltend wenigstens ein halbleitendes Metalloxid auf einem Substrat, umfassend mindestens die Schritte: (A) Herstellen einer Lösung enthaltend wenigstens eine Vorläuferverbindung des wenigstens einen Metalloxids ausgewählt aus der Gruppe bestehend aus Carboxylaten von Mono-, Di- oder Polycarbonsäuren mit wenigstens drei Kohlenstoffatomen oder Derivaten von Mono-, Di- oder Polycarbonsäuren, Alkoholaten, Hydroxiden, Semicarbaziden, Carbaminaten, Hydroxamaten, Isocyanaten, Amidinen, Amidrazonen, Harnstoffderivaten, Hydroxylaminen, Oximen, Urethanen, Ammoniak, Aminen, Phosphinen, Ammonium-Verbindungen,, Aziden des entsprechenden Metalls und Mischungen davon, in wenigstens einem Lösungsmittel, (B) Aufbringen der Lösung aus Schritt (A) auf das Substrat und (C) thermisches Behandeln des Substrates aus Schritt (B) bei einer Temperatur von 20 bis 200°C, um die wenigstens eine Vorläuferverbindung in wenigstens ein halbleitendes Metalloxid zu überführen, wobei, falls in Schritt (A) elektrisch neutrales [(OH) x (NH 3 ) y Zn] z mit x, y und z unabhängig voneinander 0,01 bis 10, als Vorläuferverbindung eingesetzt wird, dieses durch Umsetzung von Zinkoxid oder Zinkhydroxid mit Ammoniak erhalten wird, ein Substrat, welches mit wenigstens einem halbleitenden Metalloxid beschichtet ist, erhältlich durch dieses Verfahren, die Verwendung dieses Substrates in elektronischen Bauteilen, sowie ein Verfahren zur Herstellung von elektrisch neutralem [(OH) x (NH 3 ) y Zn] z mit x, y und z unabhängig voneinander 0,01 bis 10, durch Umsetzung von Zinkoxid und/oder Zinkhydroxid mit Ammoniak.
Abstract:
Disclosed are new semiconductor materials prepared from polycyclic compounds. Such compounds can exhibit high n-type carrier mobility and/or good current modulation characteristics. In addition, the compounds of the present teachings can possess certain processing advantages such as solution-processability and/or good stability at ambient conditions.
Abstract:
A method for producing an organic semiconductor device (110) having at least one organic semiconducting material (122) and at least two electrodes (114) adapted to support an electric charge carrier transport through the organic semiconducting material (122) is disclosed. The organic semiconducting material (122) intrinsically has ambipolar semiconducting properties. The method comprises at least one step of generating at least one intermediate layer (120) which at least partially is interposed between the organic semiconducting material (122) and at least one of the electrodes (114) of the organic semiconductor device (110). The intermediate layer (120) comprises at least one thiol compound having the general formula HS-R, wherein R is an organic residue. The thiol compound has an electric dipole moment pointing away from the SH-group of the thiol compound. The electric dipole moment has at least the same magnitude as the electric dipole moment in 4-Phenylthiophenol. By the intermediate layer (120) an ambipolar charge carrier transport between the electrodes (114) is suppressed in favor of a unipolar charge carrier transport.
Abstract:
Dithienobenzo-thieno[3,2-b]thiophene-copolymers of the formula (I) wherein: pi is a monocyclic or polycyclic moiety optionally substituted with 1-4 Ra groups, wherein R a , at each occurrence, is independently hydrogen or a) a halogen, b) -CN, c) -NO 2 , d) oxo, e) -OH, f) =C(R b ) 2 ; g) a C 1-20 alkyl group, h) a C 2-20 alkenyl group, i) a C 2-20 alkynyl group, j) a C 1-20 alkoxy group, k) a C 1-20 alkylthio group, I) a C 1-20 haloalkyl group, m) a -Y- C 3-10 cycloalkyl group, n) a -Y- C 6-14 aryl group, o) a -Y-3-12 membered cycloheteroalkyl group, or p) a -Y-5-14 membered heteroaryl group, wherein each of the C 1-20 alkyl group, the C 2-20 alkenyl group, the C 2-20 alkynyl group, the C 3-10 cycloalkyl group, the C 6-14 aryl or haloaryl group, the 3-12 membered cycloheteroalkyl group, and the 5- 14 membered heteroaryl group is optionally substituted with 1 -4 R b groups; Y, at each occurrence, is independently a divalent C 1-6 alkyl group, a divalent C 1-6 haloalkyl group, or a covalent bond; and R 1 , R 2 , R 3 , at each occurrence, are independently H, a halogen, CN, a C 1-30 alkyl group, a C 2-30 alkenyl group, a C 1-30 haloalkyl group, a C 2-30 alkynyl group, a C 1-30 alkoxy group, a C(O)-C 1-20 alkyl group, a C(O)-OC 1-20 alkyl group, a Y-C 3-10 cycloalkyl group, a -Y-3- 12 membered cycloheteroalkyl group, each optionally substituted with 1-5 substituents selected from a halogen, -CN, a C 1-6 alkyl group, a C 1-6 alkoxy group, and a C 1-6 haloalkyl group, -L-Ar 1 , -L-Ar 1 -Ar 1 , -L-Ar 1 -R 4 , or -L-Ar 1 -Ar 1 -R 4 and Y, at each occurrence, is independently a divalent C 1-6 alkyl group, a divalent C 1-6 haloalkyl group, or a covalent bond; n = 0, 1, 2; and o = 1 - 1000.
Abstract:
Die vorliegende Erfindung betrifft ein Verfahren zur Herstellung einer Schicht enthaltend wenigstens ein halbleitendes Metalloxid auf einem Substrat, umfassend mindestens die Schritte: (A) Aufbringen einer porösen Schicht aus mindestens einem halbleitenden Metalloxid auf ein Substrat, (B) Behandeln der porösen Schicht aus Schritt (A) mit einer Lösung enthaltend wenigstens eine Vorläuferverbindung des halbleitenden Metalloxids, so dass die Poren der porösen Schicht zumindest teilweise mit dieser Lösung gefüllt werden und (C) thermisches Behandeln der in Schritt (B) erhaltenen Schicht, um die wenigstens eine Vorläuferverbindung des halbleitenden Metalloxids in das halbleitende Metalloxid zu überführen, wobei die mindestens eine Vorläuferverbindung des mindestens einen halbleitenden Metalloxids in Schritt (B) ausgewählt ist aus der Gruppe bestehend aus Carboxylaten von Mono-, Di- oder Polycarbonsäuren mit wenigstens drei Kohlenstoffatomen oder Derivaten von Mono-, Di-oder Polycarbonsäuren, Alkoholaten, Hydroxiden, Semicarbaziden, Carbaminaten, Hydroxamaten, Isocyanaten, Amidinen, Amidrazonen, Harnstoffderivaten, Hydroxylaminen, Oximen, Oximaten, Urethanen, Ammoniak, Aminen, Phosphinen, Ammonium-Verbindungen, Nitraten, Nitriten oder Aziden des entsprechenden Metalls und Mischungen davon.