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    PLANTS HAVING INCREASED TOLERANCE TO HERBICIDES
    11.
    发明申请
    PLANTS HAVING INCREASED TOLERANCE TO HERBICIDES 审中-公开
    具有对除草剂的耐受性的植物

    公开(公告)号：US20140357487A1

    公开(公告)日：2014-12-04

    申请号：US14355488

    申请日：2012-10-30

    Applicant: BASF SE

    Inventor： Johannes Hutzler ,  Stefan Tresch ,  Thomas Mietzner ,  Matthias Witschel ,  Jens Lerchl ,  Raphael Aponte ,  Liliana Parra Rapado ,  Jill Marie Paulik

    IPC: C12N15/82 ,  A01N43/60 ,  A01N43/40

    CPC classification number: C12N15/8274 ,  A01N43/40 ,  A01N43/60 ,  C12N9/0069 ,  C12N9/1085 ,  C12Y113/11027

    Abstract: The present invention refers to a method for controlling undesired vegetation at a plant cultivation site, the method comprising the steps of providing, at said site, a plant that comprises at least one nucleic acid comprising a nucleotide sequence encoding a wild-type hydroxyphenyl pyruvate dioxygenase or a mutated hydroxyphenyl pyruvate dioxygenase (mut-HPPD) which is resistant or tolerant to a coumarone-derivative herbicide and/or a nucleotide sequence encoding a wild-type homogentisate solanesyl transferase or a mutated homogentisate solanesyl transferase (mut-HST) which is resistant or tolerant to a coumarone-derivative herbicide, and applying to said site an effective amount of said herbicide. The invention further refers to plants comprising mut-HPPD, and methods of obtaining such plants.

    Abstract translation: 本发明涉及一种用于在植物培养部位控制不需要的植物的方法，所述方法包括以下步骤：在所述部位提供包含至少一种核酸的植物，所述核酸包含编码野生型羟基苯基丙酮酸双加氧酶的核苷酸序列 或对于香豆酮衍生物除草剂具有抗性或耐受性的突变的羟基苯基丙酮酸双加氧酶（mut-HPPD）和/或编码野生型谷胱甘肽基转移酶的核苷酸序列或抗性的突变的果糖酸solanesyl转移酶（mut-HST） 或对香豆酮衍生物除草剂具有耐受性，并向所述部位施用有效量的所述除草剂。 本发明还涉及包含mut-HPPD的植物以及获得这种植物的方法。

    Substituted 1,2,5-Oxadiazole Compounds and Their Use as Herbicides
    14.
    发明申请
    Substituted 1,2,5-Oxadiazole Compounds and Their Use as Herbicides 审中-公开

    公开(公告)号：US20140323306A1

    公开(公告)日：2014-10-30

    申请号：US14357897

    申请日：2012-11-13

    Applicant: BASF SE

    Inventor： Helmut Kraus ,  Matthias Witschel ,  Thomas Seitz ,  Trevor William Newton ,  Liliana Parra Rapado ,  Raphael Aponte ,  Klaus Kreuz ,  Klaus Grossmann ,  Jens Lerchl ,  Richard Roger Evans

    IPC: A01N43/82

    CPC classification number: A01N43/82 ,  C07D271/08 ,  C07D413/12

    Abstract: The present invention relates to substituted 1,2,5-oxadiazole compounds of the formula I and the N-oxides and salts thereof and to compositions comprising the same. The invention also relates to the use of the 1,2,5-oxadiazole compounds or of the compositions comprising such compounds for controlling unwanted vegetation. Furthermore, the invention relates to methods of applying such compounds. In formula I, the variables have the following meanings R is e.g. hydrogen, cyano, nitro, halogen, C1-C6-alkyl, C3-C7-cycloalkyl, C3-C7-cycloalkyl-C1-C4-alkyl, C1-C6-haloalkyl, C2-C6-alkenyl, C2-C6-haloalkenyl, C2-C6-alkynyl, C2-C6haloalkynyl, C1-C4-alkoxy-C1-C4-alkyl, C1-C4-haloalkoxy-C1-C4-alkyl, O—Ra, Z—S(O)n—Rb, Z—C(═O)—Rc, Z—C(═O)—ORd, Z—C(═O)NReRf, Z—NRgRh, Z-phenyl and Z-heterocyclyl etc; R1 is e.g. Z1-cyano, halogen, nitro, C1-C8-alkyl, C2-C8-alkenyl, C2-C8-alkynyl, C1-C8-haloalkyl, C1-C8-alkoxy, C1-C4-alkoxy-C1-C4-alkyl, Z1—C1-C4-alkoxy-C1-C4-alkoxy, C1-C4-alkylthio-C1-C4-alkyl, Z1—C1-C4-alkylthio-C1-C4-alkylthio, C2-C6-alkenyloxy, C2-C6-alkynyloxy, C1-C6-haloalkoxy, C1-C4-haloalkoxy-C1-C4-alkyl, Z1—C1-C4-haloalkoxy-C1-C4-alkoxy, Z1—S(O)k—R1b, Z1-phenoxy and Z1-heterocyclyloxy; R2, R3 are identical or different and e.g. hydrogen, halogen, Z2—OH, Z2—NO2, Z2-cyano, C1-C6-alkyl, C2-C8-alkenyl, C2-C8-alkynyl, Z2—C3-C10-cycloalkyl, Z2—C3-C10-cycloalkoxy, C1-C8-halo alkyl, Z2—C1-C8-alkoxy, Z2—C1-C8-haloalkoxy, Z2—C1-C4-alkoxy-C1-C4-alkoxy, Z2—C1-C4-alkylthio-C1-C4-alkylthio, Z2—C2-C8-alkenyloxy, Z2—C2-C8-alkynyloxy, Z2—C1-C8-haloalkoxy, Z2—C2-C8-haloalkenyloxy, Z2—C2-C8-haloalkynyloxy, Z2—C1—C4-haloalkoxy-C1—C4-alkoxy, Z2-(tri-C1-C4-alkyl)silyl, Z2—S(O)k—R2b, Z2—C(═O)—R2C, Z2—C(═O)—OR2d, Z2—C(═O)—NR2gR2f, Z2—NR2gR2b, Z2a-phenyl and Z2a-heterocyclyl; R4 is selected from the group consisting of hydrogen, halogen, cyano, nitro, C1-C4-alkyl and C1-C4-haloalkyl; R5 is selected from the group consisting of hydrogen, halogen, C1-C4-alkyl and C1-C4-haloalkyl; provided that at least one of the radicals R4 and R5 is different from hydrogen; n is 0, 1 or 2; k is 0, 1 or 2.

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