APARATO Y SISTEMA DE PLASMA.
    11.
    发明专利

    公开(公告)号:MX2009005566A

    公开(公告)日:2009-10-20

    申请号:MX2009005566

    申请日:2007-11-27

    Abstract: Un aparato de plasma que incluye un primer cabezal de plasma de ánodo y un primer cabezal de plasma de cátodo. Cada uno de los cabezales de plasma incluye un electrodo, un canal de flujo de plasma, y una entrada de gas primaria colocada entre al menos una porción del canal de flujo de plasma. El primer cabezal de plasma de ánodo y el primer cabezal de plasmas de cátodo están colocados en un ángulo uno con relación al otro. El aparato de plasma también incluye un segundo cabezal de plasma de ánodo y un segundo cabezal de plasma de cátodo. Cada uno de los cabezales de plasma incluye un electrodo, un canal de flujo de plasma, y una entrada de gas primaria colocada entre al menos una porción del electrodo, estando el canal de flujo de plasma, el segundo cabezal de plasma de ánodo y el segundo cabezal de plasma de cátodo colocados en un ángulo uno con relación al otro.

    12.
    发明专利
    未知

    公开(公告)号:BRPI0719557A2

    公开(公告)日:2014-07-08

    申请号:BRPI0719557

    申请日:2007-11-27

    Abstract: A twin plasma apparatus including an anode plasma head and a cathode plasma head. Each of the plasma heads includes an electrode and a plasma flow channel and a primary gas inlet between at least a portion of the electrode and the plasma flow channel. The anode plasma head and the cathode plasma head are oriented at an angled toward one another. At least one of the plasma flow channels includes three generally cylindrical portions. The three generally cylindrical portions of the plasma flow channels reduce the occurrence of side arcing.

    13.
    发明专利
    未知

    公开(公告)号:BRPI0719558A2

    公开(公告)日:2013-12-10

    申请号:BRPI0719558

    申请日:2007-11-27

    Abstract: A twin plasma apparatus including an anode plasma head and a cathode plasma head. Each of the plasma heads includes an electrode and a plasma flow channel and a primary gas inlet between at least a portion of the electrode and the plasma flow channel. The anode plasma head and the cathode plasma head are oriented at an angled toward one another. At least one of the plasma flow channels includes three generally cylindrical portions. The three generally cylindrical portions of the plasma flow channels reduce the occurrence of side arcing.

    ПЛАЗМЕННЫЕ УСТРОЙСТВО И СИСТЕМА

    公开(公告)号:RU2479438C2

    公开(公告)日:2013-04-20

    申请号:RU2009124487

    申请日:2007-11-27

    Abstract: Изобретениеотноситсяк областиплазменнойобработкиматериалов. Плазменноеустройствовключаетв себяпервуюаноднуюплазменнуюголовкуи первуюкатоднуюплазменнуюголовку. Каждаяизплазменныхголовоксодержитэлектрод, каналдляпотокаплазмы, иэлементдлявпускаосновногогаза, расположенныймежду, поменьшеймере, частьюуказанногоэлектродаи указаннымканаломдляпотокаплазмы. Перваяаноднаяплазменнаяголовкаи перваякатоднаяплазменнаяголовкарасположеныподнекоторымугломдруготносительнодругав однойплоскости. Плазменноеустройствотакжесодержитвторуюаноднуюплазменнуюголовкуи вторуюкатоднуюплазменнуюголовку, расположенныеподнекоторымугломдруготносительнодругав другойплоскости. Уголмеждуплоскостями, вкоторыхрасположеныпервыекатоднаяи аноднаяголовкии вторыекатоднаяи аноднаяголовки, составляет 50-90 градусов. Техническийрезультат - повышениеэффективностиобработкиматериалов. 6 з.п. ф-лы, 12 ил.

    Plasma apparatus and system
    15.
    发明专利

    公开(公告)号:AU2007325292B2

    公开(公告)日:2013-02-14

    申请号:AU2007325292

    申请日:2007-11-27

    Abstract: A plasma apparatus including a first anode plasma head and a first cathode plasma head. Each of the plasma heads including an electrode, a plasma flow channel, and a primary gas inlet disposed between at least a portion of said plasma flow channel. The first anode plasma head and the first cathode plasma head being disposed at angle relative to one another. The plasma apparatus also including a second anode plasma head and a second cathode plasma head. Each of the plasma heads including an electrode, a plasma flow channel, and a primary gas inlet disposed between at least a portion of the electrode, the plasma flow channel, the second anode plasma head and the second cathode plasma head being disposed at an angle relative to one another.

    Plasma apparatus and system
    16.
    发明专利

    公开(公告)号:AU2007325285B2

    公开(公告)日:2013-02-14

    申请号:AU2007325285

    申请日:2007-11-27

    Abstract: A twin plasma apparatus including an anode plasma head and a cathode plasma head. Each of the plasma heads includes an electrode and a plasma flow channel and a primary gas inlet between at least a portion of the electrode and the plasma flow channel. The anode plasma head and the cathode plasma head are oriented at an angled toward one another. At least one of the plasma flow channels includes three generally cylindrical portions. The three generally cylindrical portions of the plasma flow channels reduce the occurrence of side arcing.

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