公开(公告)号：EP3108033B1

公开(公告)日：2019-10-16

申请号：EP15740739.6

申请日：2015-01-27

Applicant: BYD Company Limited

Inventor： GONG, Qing ,  ZHOU, Wei ,  SUN, Yongliang

IPC: C23C18/20 ,  C23C18/31 ,  C08K3/20

公开(公告)号：EP2935644A1

公开(公告)日：2015-10-28

申请号：EP13866340.6

申请日：2013-12-11

Applicant: BYD Company Limited

Inventor： ZHOU, Wei ,  SUN, Yongliang

IPC: C23C14/35 ,  C23C14/06

CPC classification number: C23C14/35 ,  C03C17/009 ,  C03C23/0075 ,  C03C2217/43 ,  C03C2217/76 ,  C03C2218/156 ,  C03C2218/31 ,  C23C14/0057 ,  C23C14/022 ,  C23C14/06 ,  C23C14/0694 ,  C23C14/12 ,  C23C14/3414 ,  G02B1/111 ,  G02B1/14 ,  G02B1/18

Abstract: A film and a method for preparing the film are provided. A substrate is provided, and a film is formed on at least a part of a surface of the substrate by magnetron sputtering a target under a protective gas and a reactive gas. The target includes polytetrafluoroethylene and magnesium fluoride, and the reactive gas includes at least one selected from a group consisting of CF
4 and SiF
4 .