公开(公告)号：JP2012032602A

公开(公告)日：2012-02-16

申请号：JP2010171854

申请日：2010-07-30

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KOSHIJIMA KOSUKE ,  SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI ,  IIZUKA YUSUKE

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray- or radiation-sensitive resin composition and an actinic ray- or radiation-sensitive film with excellent immersion liquid followability whose sensitivity degradation by the immersion exposure compared to the dry exposure is suppressed, and to provide a pattern forming method using this composition.SOLUTION: The actinic ray- or radiation-sensitive resin composition contains (A), (B) and (C) in the following: (A) at least one kind of compound which generates sulfonic acid represented as general formula (I) by exposure to an actinic or radiation ray; (B) a resin which is decomposed by the action of an acid and increases the solubility in an alkali developer; and (C) a resin having at least one of fluorine and silicon atoms. (The definition of the symbols in the formula is the same as that in the patent claims and specifications.)

Abstract translation: 要解决的问题：为了提供具有优异浸渍液体追随性的光化射线或辐射敏感性树脂组合物和光化射线或辐射敏感膜，其抑制了与干燥曝光相比的浸渍曝光的灵敏度降低， 并提供使用该组合物的图案形成方法。 光解射线或辐射敏感性树脂组合物含有下列（A），（B）和（C）：（A）至少一种产生由通式（I）表示的磺酸的化合物 ）通过暴露于光化或辐射线; （B）通过酸的作用而分解并增加在碱性显影剂中的溶解度的树脂; 和（C）具有氟原子和硅原子中的至少一种的树脂。 （公式中符号的定义与专利权利要求和规范中的符号的定义相同。）版权所有：（C）2012，JPO＆INPIT

公开(公告)号：JP2011038066A

公开(公告)日：2011-02-24

申请号：JP2009281056

申请日：2009-12-10

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  HIRANO SHUJI

IPC: C08F20/26 ,  C07D307/00 ,  G03F7/039 ,  H01L21/027

CPC classification number: C07D307/77 ,  C07D493/18 ,  C08F220/18 ,  C08F220/24 ,  C08F220/30 ,  C08F2220/1808

Abstract: PROBLEM TO BE SOLVED: To provide a new polymeric compound useful for the production process for semiconductors including IC, for producing liquid crystals and circuit boards such as thermal heads, furthermore, for a resist composition used in lithographic processes in other photofabrications, and to provide a new polymerizable compound to be used in synthesizing the polymeric compound. SOLUTION: The new polymerizable compound having a lactone structure represented by a specific structural formula is provided. Besides, the polymeric compound to be obtained by polymerizing the polymerizable compound is also provided. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种用于半导体生产工艺的新的聚合物，包括用于制备液晶的IC和用于热敏头的电路板的半导体的方法，此外，为了在其它光刻中用于光刻工艺中的抗蚀剂组合物， 并提供用于合成聚合物的新的可聚合化合物。 解决方案：提供具有由具体结构式表示的内酯结构的新的可聚合化合物。 此外，还提供了通过聚合可聚合化合物获得的聚合物。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010250074A

公开(公告)日：2010-11-04

申请号：JP2009099417

申请日：2009-04-15

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： FUKUHARA TOSHIAKI ,  IWATO KAORU ,  SAEGUSA HIROSHI ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F20/12 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active light sensitive or radiation sensitive resin composition of which a depth of focus margin (DOF), surface roughness, and a development defect are improved, and to provide a pattern forming method using the composition. SOLUTION: The active light sensitive or radiation sensitive resin composition and the pattern forming method using the composition are provided. The active light sensitive or radiation sensitive resin composition contains: a resin which has a group represented by -C(X 1 )(X 2 )(OR 1 ) (wherein X 1 and X 2 are each independently hydrogen atom, fluorine atom, alkyl, or fluorinated alkyl, either one of or both of the X 1 and X 2 include at least one or more fluorine atoms, and R 1 is hydrogen atom, alkyl, cycloalkyl, or acid-degradable group) and which increases a dissolution rate in an alkali developing solution by the action of acids; an compound which generates an acid by irradiation of active light or radiation; and a resin which contains a repeating unit having at least one polar conversion group, and at least either of a fluorine atom or a silicon atom. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效的光敏或辐射敏感性树脂组合物，其聚焦余量（DOF），表面粗糙度和显影缺陷得到改善，并且提供使用该组合物的图案形成方法 。 提供了使用该组合物的活性光敏性或辐射敏感性树脂组合物和图案形成方法。 主要的光敏性或辐射敏感性树脂组合物包含：具有由-C（X 1 ）表示的基团（X 2 ）（OR / SB>）（其中X 1 和X 2 各自独立地为氢原子，氟原子，烷基或氟化烷基，X 1 和X 2 包括至少一个或多个氟原子，R SB 1是氢原子，烷基，环烷基或酸可降解基团）和 其通过酸的作用增加碱显影液中的溶解速率; 通过活性光或辐射的照射产生酸的化合物; 以及含有具有至少一个极性转换基的重复单元，以及氟原子或硅原子中的至少一个的树脂。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009244398A

公开(公告)日：2009-10-22

申请号：JP2008088543

申请日：2008-03-28

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  SHIBUYA AKINORI

IPC: G03F7/039 ,  C08F20/12 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which is excellent in line edge roughness and exposure latitude, and to provide a pattern formation method using the positive photosensitive composition. SOLUTION: The positive photosensitive composition contains: a resin (A) which includes a recurring unit containing a lactone structure and a recurring specific structural unit having a Van der Waals volume of 306×10 -30 m 3 or less, and facilitates dissolution to alkali by the action of acid; and a compound (B) which produces alkane sulfonic acid substituted with fluorine having a Van der Waals volume less than 135×10 -30 m 3 by the irradiation of active light rays or radiation. The pattern formation method uses the positive photosensitive composition. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供线边缘粗糙度和曝光宽容度优异的正性感光性组合物，并提供使用正性感光性组合物的图案形成方法。 正型感光性组合物含有：包含含有内酯结构的重复单元的树脂（A）和范德华体积为306×10 -30 的重复特定结构单元， m 3 以下，通过酸的作用促进了对碱的溶解; 和通过活性光线照射产生Van der Waals体积小于135×10 -30 m 3 的被氟取代的烷烃磺酸的化合物（B） 或辐射。 图案形成方法使用正性感光性组合物。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008248244A

公开(公告)日：2008-10-16

申请号：JP2008058366

申请日：2008-03-07

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KANEKO YUJI ,  KAMIMURA SATOSHI ,  SHIBUYA AKINORI ,  IIZUKA YUSUKE

IPC: C08F2/06 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resin having a narrow composition distribution, to provide a method for supplying the same in excellent reproducibility, to provide a positive type photosensitive composition having an improved pattern formation during fine pattern formation and to provide a method for forming a pattern using the composition. SOLUTION: The method for producing a resin that increases a dissolution rate in an alkali development solution by an acid action comprises a process for carrying out a copolymerization while continuously adding a monomer solution (A) and a polymerization initiator to a monomer solution (B) not containing a polymerization initiator. When a monomer component having the highest polymerization rate in the case of polymerizing only the monomer solution (A) is (P), a monomer component having the lowest polymerization rate is (Q), the ratios (mol%) of (P) in the monomer solution (A) and in the monomer solution (B) are Pa and Pb, respectively and the ratios (mol%) of (Q) in the monomer solution (A) and in the monomer solution (B) are Qa and Qb, respectively, Pa>Pb and Qb>Qa. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供具有窄组成分布的树脂，以提供以优异的再现性提供其的方法，以提供在精细图案形成期间具有改进的图案形成的正型感光组合物，并提供 使用该组合物形成图案的方法。 解决方案：通过酸作用增加碱性显影液中的溶解速度的树脂的制造方法包括在将单体溶液（A）和聚合引发剂连续添加到单体溶液中的同时进行共聚的方法 （B）不含聚合引发剂。 当仅聚合单体溶液（A）的情况下具有最高聚合速率的单体组分为（P）时，具有最低聚合速率的单体组分为（Q），（P）的比例（摩尔％） 单体溶液（A）和单体溶液（B）分别为Pa和Pb，单体溶液（A）和单体溶液（B）中（Q）的比率（mol％）为Qa和Qb ，分别为Pa> Pb和Qb> Qa。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2013028706A

公开(公告)日：2013-02-07

申请号：JP2011165356

申请日：2011-07-28

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  IKEDA MORIHITO ,  TOKUOKA SHINSUKE ,  MOROOKA NAOYUKI ,  OBAYASHI TATSUHIKO

IPC: C08F20/68 ,  C07C69/54 ,  C08F16/32 ,  C08F216/16 ,  C08F220/68

Abstract: PROBLEM TO BE SOLVED: To provide a curable resin raw material composition for optical components having stability and giving a cured product excellent in transparency and thermal discoloration resistance, exhibiting enough gas barrier properties and hardly generating cracks; and to provide optical components using the same.SOLUTION: This curable resin raw material composition contains an adamantane derivative A expressed by formula (I). In formula, Aand Aeach independently is a group selected from an acryloyloxy group, methacryloyl group, vinyl group, vinyloxy group and allyloxy group; provided that Aand Aare different from each other; Rrepresents a substituent not containing a double bond; and n denotes an integer of 0 to 8.

Abstract translation: 要解决的问题：提供一种具有稳定性的光固化树脂固化性树脂原料组合物，提供透明性，耐热变色性优异的固化物，具有足够的阻气性，难以产生裂纹; 并提供使用其的光学部件。 该固化性树脂原料组合物含有式（I）表示的金刚烷衍生物A. 在式中，A 1 和A 2 各自独立地为选自丙烯酰氧基，甲基丙烯酰基，乙烯基，乙烯基氧基 基团和烯丙氧基; 只要A 1 和A 2 彼此不同; R A 表示不含双键的取代基; 并且n表示0至8的整数。版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012137697A

公开(公告)日：2012-07-19

申请号：JP2010291380

申请日：2010-12-27

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： TANGO NAOHIRO ,  IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI ,  KATAOKA SHOHEI

IPC: G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide an actinic-ray-sensitive or radiation-sensitive resin composition capable of forming a pattern excellent in in-plane uniformity (CDU) of line width, and a pattern forming method using the composition.SOLUTION: An actinic-ray-sensitive or radiation-sensitive resin composition contains (A) a resin that has a repeating unit having a specific lactone structure and a repeating unit having a specific monoalicyclic structure and whose solubility in an alkaline developer is increased by the action of an acid and (B) a compound having a specific structure which generates an acid upon irradiation with an actinic ray or a radiation.

Abstract translation: 要解决的问题：提供能够形成线宽的面内均匀性（CDU）优异的图案的光化射线敏感性或辐射敏感性树脂组合物，以及使用该组合物的图案形成方法。 光敏感或辐射敏感性树脂组合物含有（A）具有特定内酯结构的重复单元的树脂和具有特定单环结构的重复单元，其在碱性显影剂中的溶解度为 通过酸的作用增加，（B）具有特定结构的化合物，其在用光化射线或辐射照射时产生酸。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012022100A

公开(公告)日：2012-02-02

申请号：JP2010159093

申请日：2010-07-13

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  SHIBUYA AKINORI ,  TAKAHASHI HIDETOMO ,  FUKUHARA TOSHIAKI ,  KOSHIJIMA KOSUKE

IPC: G03F7/039 ,  C08F12/04 ,  C08F22/12 ,  C08F22/36 ,  G03F7/004 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/004 ,  C08F12/20 ,  C08F12/22 ,  C08F12/32 ,  C08F212/14 ,  C08F212/32 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/20 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition that can satisfy both excellent developing property and excellent followability of immersion liquid and to provide a method for forming pattern using the composition.SOLUTION: An actinic ray sensitive or radiation sensitive resin composition according to the present invention is a resin (B) having at least one of fluorine atom and silicon atom and includes a resin (B) including a repeating unit expressed by the following formula (I); a resin (A) whose solubility in an alkali developing solution is increased by an action of an acid; and a compound which generates an acid upon irradiation with actinic ray or radiation.

Abstract translation: 要解决的问题：提供能够满足浸出液的优异显影性和优异的追随性的光化射线敏感或辐射敏感性树脂组合物，并提供使用该组合物形成图案的方法。 解决方案：根据本发明的光化射线敏感或辐射敏感性树脂组合物是具有氟原子和硅原子中的至少一个的树脂（B），并且包括包含由以下所表示的重复单元的树脂（B） 式（I）; 通过酸的作用使在碱性显影液中的溶解度增加的树脂（A） 以及在用光化射线或辐射照射时产生酸的化合物。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011203645A

公开(公告)日：2011-10-13

申请号：JP2010072841

申请日：2010-03-26

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： KATO TAKAYUKI ,  SHIRAKAWA MICHIHIRO ,  TAKAHASHI HIDETOMO ,  HIRANO SHUJI ,  IIZUKA YUSUKE

IPC: G03F7/039 ,  C08F220/26 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray sensitive or radiation sensitive resin composition capable of improving roughness characteristics, an exposure latitude and a development defect performance, and suppressing a standing wave, and to provide a pattern forming method using the composition.SOLUTION: This active ray sensitive or radiation sensitive resin composition includes: a resin (P) containing a repeated unit (A) including a structure portion (S1) for generating an alkali-soluble group by being decomposed by action of an acid, and a structure portion (S2) for raising dissolution speed into alkali developing solution by being decomposed by action of the alkali developing solution; and a compound including a group desorbed by action of an acid and expressed by expression (C-I), or a compound having a structure wherein the compounds including the group desorbed by action of the acid and expressed by the expression (C-I) are connected plurally through a linking group. In the expression (C-I), each of p and q shows an integer of 1 or larger satisfying a relation: p+q=3. Rshows a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or the linking group. In the case of p=2, two Rs may be mutually the same or mutually different, or may be mutually bonded to form a ring. R-Rshow respectively and independently a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or the linking group. At least two of the R-Rmay mutually bonded to form a ring.

Abstract translation: 要解决的问题：提供能够改善粗糙度特性，曝光宽容度和显影缺陷性能以及抑制驻波的主动射线敏感或辐射敏感性树脂组合物，并提供使用该组合物的图案形成方法。解决方案： 该活性射线敏感性或辐射敏感性树脂组合物包括：含有重复单元（A）的树脂（P），其包含通过酸作用而分解产生碱溶性基团的结构部分（S1），以及结构部分 （S2），其通过碱显影液的作用而使溶解速度提高到碱性显影液中; 以及包含通过酸的作用并由表达（C1）表达的基团的化合物，或具有这样的结构的化合物，其中包括通过酸的作用脱离并由表达（C1）表示的基团的化合物被多重连接 连接组。 在表达式（C-I）中，p和q各自表示满足p + q = 3的关系的1以上的整数。 R5表示氢原子，烷基，环烷基，芳基，芳烷基或连接基。 在p = 2的情况下，两个Rs可以相互相同或相互不同，或者可以相互结合形成环。 R-R分别独立地为氢原子，烷基，环烷基，芳基，芳烷基或连接基。 至少两个R-Rmay相互键合形成环。

公开(公告)号：JP2011186244A

公开(公告)日：2011-09-22

申请号：JP2010052282

申请日：2010-03-09

Applicant: Fujifilm Corp ,  富士フイルム株式会社

Inventor： IIZUKA YUSUKE ,  TAKAHASHI HIDETOMO ,  SHIRAKAWA MICHIHIRO ,  YOSHITOME MASAHIRO ,  HIRANO SHUJI

IPC: G03F7/004 ,  C08F220/28 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an active ray sensitive or radiation sensitive resin composition excellent in roughness characteristics, exposure latitude, focus depth and development defect performance and capable of forming a pattern having a satisfactory shape and to provide a pattern forming method using the same. SOLUTION: The active ray sensitive or radiation sensitive resin composition contains: a resin (P) including a recurring unit (A) having a structural part (S1) decomposed by action of an acid and generating an alkali soluble group and a structural part (S2) decomposed by action of an alkali developer and increasing dissolved speed in the alkali developer; and a compound (Q) having a molar extinction coefficient of 55,000 or below in 193 nm wavelength and generating an acid by irradiation with an active ray or a radiation. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供粗糙度特性，曝光宽容度，聚焦深度和显影缺陷性能优异的活性射线敏感或辐射敏感性树脂组合物，并且能够形成具有令人满意的形状的图案并提供图案形成方法 使用相同 活性射线敏感或辐射敏感性树脂组合物包含：包含具有通过酸作用分解的结构部分（S1）并产生碱溶性基团的结构部分（S1）的重复单元（A）的树脂（P） 部分（S2）通过碱显影剂的作用分解并增加碱显影剂中的溶解速度; 和在193nm波长中摩尔消光系数为55,000以下的化合物（Q），通过用活性射线或辐射照射产生酸。 版权所有（C）2011，JPO＆INPIT