METHOD FOR PRODUCING SEMICONDUCTOR NANOPARTICLE COMPLEX, SEMICONDUCTOR NANOPARTICLE COMPLEX, AND FILM

    公开(公告)号:US20190189922A1

    公开(公告)日:2019-06-20

    申请号:US16283842

    申请日:2019-02-25

    Inventor: Hiroshi ISOJIMA

    CPC classification number: H01L51/0002 B82Y40/00 C01B25/08 H01L51/0587

    Abstract: An object of the present invention is to provide a method for producing a semiconductor nanoparticle complex, which is capable of suppressing aggregation of particles and forming a good coating with an oxide, a semiconductor nanoparticle complex, and a film. The method for producing a semiconductor nanoparticle complex of the present invention is a method for producing a semiconductor nanoparticle complex including a coating step of coating a semiconductor nanoparticle with a silane having a group represented by a predetermined formula to obtain a coated semiconductor nanoparticle; a hydrophilization step of mixing the coated semiconductor nanoparticle with a reverse micelle solution to obtain a reverse micelle solution containing a hydrophilized coated semiconductor nanoparticle; and an oxide-containing layer forming step of forming an oxide-containing layer on the surface of the hydrophilized coated semiconductor nanoparticle by adding an alkoxide to the reverse micelle solution after the hydrophilization step to obtain the semiconductor nanoparticle complex.

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