-
公开(公告)号：JP2013089482A
公开(公告)日：2013-05-13
申请号：JP2011229587
申请日：2011-10-19
Applicant: Fujitsu Ltd , 富士通株式会社
Inventor： OKUDA HISAO , NAKATANI TADASHI , KATSUKI TAKASHI , SHIMAUCHI TAKEAKI , TOYODA OSAMU
Abstract: PROBLEM TO BE SOLVED: To solve a problem on a new structure of a microswitch using a flexible beam.SOLUTION: A MEMS switch comprises: a flexible beam FB formed of an active Si layer AL of a SOI substrate and supported by a supporting Si substrate SS through a bonding oxide film BOX; a movable drive electrode MDE formed on the flexible beam FB; a movable contact electrode MCE having a movable contact point formed on the flexible beam FB; a fixed drive electrode FDE supported at a first set of fixing parts and extended above the movable drive electrode MDE; and a fixed contact electrode FCE supported by a second set of fixing parts and having a fixed contact point above the movable contact point. The fixed drive electrode FDE and the fixed contact electrode FCE include laminated layer of an adhesion metal layer AM, a seed layer SD and a plated layer PL, above the first and the second set of fixing parts. The plated layer PL is on the seed layer SD in a free lower surface faced to the movable drive electrode MDE and the movable contact point.
Abstract translation: 要解决的问题：解决使用柔性梁的微型开关的新结构的问题。 解决方案：MEMS开关包括：柔性束FB，其由SOI衬底的有源Si层AL形成，并通过结合氧化膜BOX由支撑Si衬底SS支撑; 形成在柔性梁FB上的可动驱动电极MDE; 具有形成在柔性梁FB上的可动接点的可动接触电极MCE; 固定驱动电极FDE，其被支撑在第一组固定部分上并在可移动驱动电极MDE上方延伸; 以及由第二组固定部件支撑并且在可动触点上方具有固定触点的固定接触电极FCE。 固定驱动电极FDE和固定接触电极FCE包括在第一和第二组固定部分上方的粘合金属层AM，种子层SD和镀层PL的叠层。 电镀层PL在面向可动驱动电极MDE和可动触点的自由下表面的种子层SD上。 版权所有（C）2013，JPO＆INPIT
-
公开(公告)号：JP2004071465A
公开(公告)日：2004-03-04
申请号：JP2002231623
申请日：2002-08-08
Applicant: Fujitsu Ltd , 富士通株式会社
Inventor： INOUE KAZUNORI , TOYODA OSAMU , KIBUNE MOTONARI
Abstract: PROBLEM TO BE SOLVED: To form a dielectric layer on the entire substrate by forming a plurality of recessed grooves on the electrode-forming face of the substrate on which electrodes are formed on the entire display region, and coating a dielectric material on the remaining electrodes, and filling the dielectric material in the recessed grooves and firing them.
SOLUTION: The dielectric layer is formed on the entire glass substrate by the following method: namely, a plurality of recessed grooves are formed on an electrode-forming face of the glass substrate on which electrodes are formed on the entire display region, and a dielectric material is coated on the remaining electrodes, and in the state in which the dielectric material-coated surface of the glass substrate is kept upward, the dielectric material is fired at the temperatures at which the dielectric material is softened and a part of it flows into the recessed grooves.
COPYRIGHT: (C)2004,JPOAbstract translation: 要解决的问题：通过在整个显示区域上形成有电极的基板的电极形成面上形成多个凹槽，在整个基板上形成电介质层，并将电介质材料涂覆在 剩下的电极，并且将凹槽中的电介质材料填充并烧制。 解决方案：通过以下方法在整个玻璃基板上形成电介质层：即，在整个显示区域上形成有电极的玻璃基板的电极形成面上形成多个凹槽， 并且在其余电极上涂敷电介质材料，在玻璃基板的电介质材料被覆面向上方保持的状态下，在电介质材料软化的温度下烧成电介质材料， 它流入凹槽。 版权所有（C）2004，JPO
-
公开(公告)号：JP2002184318A
公开(公告)日：2002-06-28
申请号：JP2000382607
申请日：2000-12-15
Applicant: FUJITSU LTD
Inventor： KIBUNE MOTONARI , TOYODA OSAMU , HASHIMOTO YASUNOBU
Abstract: PROBLEM TO BE SOLVED: To provide a PDP that has small discharge current during main discharge and yet has a high luminance and high discharge efficiency. SOLUTION: The plasma display panel comprises, on a pair of glass substrates arranged opposed to each other, a plurality of barrier ribs that are formed in parallel on the inner side face of at least one of the substrates of the pair of glass substrates and a plurality of main electrodes that are arranged in parallel or in crossing direction with the barrier ribs on the substrate on which the plural partition walls are formed and have branch-shape electrodes extending to the side wall of the barrier ribs. It is so constructed that main discharge is generated between the branch electrodes of each main electrode opposing between the neighboring barrier ribs.
-
公开(公告)号：JP2002050289A
公开(公告)日：2002-02-15
申请号：JP2000237298
申请日：2000-08-04
Applicant: FUJITSU LTD
Inventor： TOYODA OSAMU , BETSUI KEIICHI , TOKAI AKIRA , KIBUNE MOTONARI , YAMADA HITOSHI
IPC: H01J9/26 , G09F9/00 , G09F9/40 , H01J11/12 , H01J11/18 , H01J11/22 , H01J11/24 , H01J11/26 , H01J11/34 , H01J11/48 , H04N5/66 , H01J11/02
Abstract: PROBLEM TO BE SOLVED: To obtain a large size PDP manufacturing method by assembling a plurality of substances which can be manufactured by the existing techniques. SOLUTION: A plurality of sub-back-substances which are a rectangle with a leading terminal on a side is jointed one substance to another on a no leading terminal side, under the above condition, they are settled on a back support substance for supporting them, then on the above jointed-back-substances, a jointed-front-substances formed with a plurality of sub-front-substances by the same method as the sub-bake-substances are jointed is placed. In addition, on which a front support substance is mounted.
-
公开(公告)号：JP2000208042A
公开(公告)日：2000-07-28
申请号：JP1097299
申请日：1999-01-19
Applicant: FUJITSU LTD
Inventor： TOKAI AKIRA , TOYODA OSAMU , BETSUI KEIICHI
IPC: H01J9/02 , H01J11/12 , H01J11/14 , H01J11/22 , H01J11/24 , H01J11/26 , H01J11/34 , H01J11/36 , H01J11/00 , H01J11/02
Abstract: PROBLEM TO BE SOLVED: To efficiently form ribs, and simplify manufacturing by hardening a determined part on the surface of a barrier-rib material layer by heating, by masking a hardened part to spray cut particles, and by baking barrier-rib materials after they are cut. SOLUTION: A barrier-rib material layer 3 contained low melting point glass as a main component is formed on a substrate 2. A determined part in a surface of the barrier-rib material layer 3 is heated to bake, and a hardened part 4 is formed. By using this hardened part 4 for a mask pattern, and cut particles are sprayed on the barrier-rib material layer 3 in a direction of A by a sand blasting method, etc., to cut the barrier-rib material layer 3. Thereafter, the barrier-rib material layer 3 is baked to form partitions 5 on the base 2. Various heat sources such as a laser, a lamp, and a heated metal mold can be used as the heat source K. Glass, quartz, and silicon, etc., are used as the substrate 2. PbO-B2O3-SiO2 glass whose a softening point is 300 to 600 deg.C can be used as low melting point glass powder used for barrier-rib materials.
-
Patent Agency Ranking
公开(公告)号：JPH09288966A
公开(公告)日：1997-11-04
申请号：JP9994196
申请日：1996-04-22
Applicant: FUJITSU LTD
Inventor： KOSAKA TADAYOSHI , NAMIKI FUMIHIRO , TOYODA OSAMU , BETSUI KEIICHI , TOKAI AKIRA
Abstract: PROBLEM TO BE SOLVED: To enhance the manufacturing yield of a high-definition display panel by preventing a patterning failure resulting from refinement of partitions. SOLUTION: In order to manufacture a display panel having a plurality of partitions in the form of strips on plan view, that extend in the same direction within a display area E1, a cutting mask 61 for a masking pattern corresponding to the partitions is provided on a partition material layer. In this case, to remove part of the partition material layer by spraying a cutting medium, the masking pattern is so formed that its stripe parts 611 to 613 corresponding to the partitions extend inside and outside of the display area E1 while the distance (d) between the longitudinal end 611a, 612a, 613a of each strip part 611 to 613 and the adjoining other strip part is smaller than the interval D between the strip parts located inside the display area E1.
-
公开(公告)号：JPH09167558A
公开(公告)日：1997-06-24
申请号：JP32670995
申请日：1995-12-15
Applicant: FUJITSU LTD
Inventor： TOYODA OSAMU , BETSUI KEIICHI , NAMIKI FUMIHIRO , KOSAKA TADAYOSHI
Abstract: PROBLEM TO BE SOLVED: To easily form a partition wall with its great aspect ratio and with its shape advantageous in view of mechanical strength. SOLUTION: During manufacture of a display panel provided with a partition wall for shielding a space in a display area, a first cut layer 290 and a second cut layer 300 are first formed on a base plate in order. Secondly, a cutting mask 62 is provided on the second cut layer 300. And, the second and first cut layers 300 and 290 are partly cut by means of sandblasting. Of the remaining first and second cut layers 291 and 301, the first cut layer 291 is selectively hardened. And, a partition wall 29 is formed by removing a second cut layer 302 in a non-hardened state.
-
公开(公告)号：JPH0817331A
公开(公告)日：1996-01-19
申请号：JP14991094
申请日：1994-06-30
Applicant: FUJITSU LTD
Inventor： NAKATANI TADASHI , BETSUI KEIICHI , FUKUDA SHINYA , TOYODA OSAMU
Abstract: PURPOSE:To stabilize an emission current, to decrease a takeout voltage, and to improve yield by piling up an insulating film having an opening and a gate electrode on top of an emitter electrode on a substrate, and making the inclination angle of the ridge of an upper-layer cathode film greater than that of a lower-layer cathode film, the upper-layer cathode film formed in the opening. CONSTITUTION:An emitter electrode 2 made of Mo siliside is laid on top of an insulating substrate 1 made of glass. An insulating film 3 made of SiO2 is laid on top of the emitter electrode 2. A gate electrode 4 made of Mo siliside is laid on top of the insulating film 3. A resist film is formed, and a resist pattern 5 having a 1-mum opening is formed in an area where a cathode film is to be formed later. The opening 6 is formed with the resist pattern 5 as a mask. A sacrificial layer 7 made of MgO is evaporated diagonally. Next, a lower-layer cathode film material 9 consisting of Mo is evaporated, and the evaporation is stopped before the opening 6 is completely blocked, to form a trapezoidal lower-layer cathode film 8 over the emitter electrode in the opening 6. Ni constituting an upper-layer cathode material 11 is evaporated on the material 9 until the opening is blocked, to form an upper-layer cathode film 10 over the film 8, the inclination angle of the film 10 being greater than that of the film 8. The layer 7 is dissolved in an acetic acid aqueous solution to lift off the films 9, 10.
-
公开(公告)号：JPH0765706A
公开(公告)日：1995-03-10
申请号：JP11530994
申请日：1994-05-27
Applicant: FUJITSU LTD
Inventor： TOYODA OSAMU , BETSUI KEIICHI , FUKUDA SHINYA , NAKATANI TADASHI
Abstract: PURPOSE:To cause electric field emission with the lowest possible voltage, concerning a cathode device and its manufacture. CONSTITUTION:This is equipped with a substrate 1, at least one emitter tip 2, which has a conical head 2A, and a gate electrode layer 4, which has an opening 4A to expose the head of that emitter tip 2, and the diameter of that opening 4A of that gate electrode layer is smaller than the diameter of the junction with that substrate of that emitter tip 2. In the manufacture, this is so arranged that the gate electrode material of the gate electrode layer 4 is stuck to the diffusion film on the surface of the conical head of the emitter tip 2, and that the inside periphery wall of the opening of the gate electrode layer 4 extends nearly parallel with the conical head of the emitter tip by the removal of that diffusion film.
-
公开(公告)号：JPH0620592A
公开(公告)日：1994-01-28
申请号：JP33439192
申请日：1992-12-15
Applicant: FUJITSU LTD
Inventor： TOYODA OSAMU , BETSUI KEIICHI , FUKUDA SHINYA , NAKATANI TADASHI
Abstract: PURPOSE:To provide a field emission cathode device where a resistance portion for negative feedback and an electron emission portion of low resistance are installed individually on an emission tip in a comparatively simple process, and to manufacture thereof. CONSTITUTION:A first material layer 40 to form cathode electrode film, a second material layer 42 to form the resistance portion 18b for negative feedback of an emitter tip 18 and a third material layer 44 to form the electron emission portion of the emitter tip 18 are formed. A mask 46 is installed at the position where the emitter tip 18 of the third material layer 44 is formed, and the material layer is etched until an undercut is made at the lower portion of the mask 46, and thereafter, an insulating film and a gate electrode film are formed.
-
-
-
-
-
-
-
-
-
Search Results
120
records
(took 0.025 seconds)
